An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for freque
An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber.
대표청구항▼
1. An arc detection system, comprising: a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal; anda signal analyzer that receives the signal, monitors the si
1. An arc detection system, comprising: a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal; anda signal analyzer that receives the signal, monitors the signal for frequency components at at least one harmonic frequency of a fundamental frequency of the RF signal, and that generates an output signal based on the frequency components wherein the output signal indicates that an arc is occurring in the RF plasma chamber. 2. The arc detection system of claim 1 wherein the frequency components include at least one or more of a second harmonic through ninth harmonic of the fundamental frequency. 3. The arc detection system of claim 1 wherein the signal analyzer generates the output signal based on a phase of the signal. 4. The arc detection system of claim 1 wherein the signal analyzer compares an amplitude of the signal to a first predetermined amplitude. 5. The arc detection system of claim 4 wherein the signal analyzer compares a rate of change of the signal to a predetermined rate of change. 6. The arc detection system of claim 5 wherein the signal analyzer generates the output signal when the rate of change of the signal exceeds the predetermined rate of change and the amplitude of the signal is between the first predetermined amplitude and a second predetermined amplitude. 7. The arc detection system of claim 1 further comprising a high-pass filter that filters the signal that is communicated to the signal analyzer. 8. The arc detection system of claim 7 wherein the high-pass filter is a modified Chebyshev filter. 9. The arc detection system of claim 1 wherein the signal analyzer generates the output signal further based on a signal-to-noise ratio of the signal. 10. An arc detection system, comprising: a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal;an analog to digital converter that converts the signal to a digital signal; anda signal analyzer that receives the digital signal, monitors the digital signal for frequency components of the RF signal at at least one harmonic frequency, ignoring frequencies intermediate to fundamental and harmonic frequencies of the RF signal, and that generates an output signal based on the frequency components wherein the output signal indicates that an arc is occurring in the RF plasma chamber. 11. The arc detection system of claim 10 wherein the frequency components include at least one of the first nine harmonics of the fundamental frequency. 12. The arc detection system of claim 10 wherein the signal analyzer generates the output signal based on a phase of the RF signal as indicated by the digital signal. 13. The arc detection system of claim 10 wherein the signal analyzer compares an amplitude of the RF signal, as indicated by the digital signal, to a predetermined threshold. 14. The arc detection system of claim 13 wherein the signal analyzer compares a rate of change of the RF signal, as indicated by the digital signal, to a predetermined rate of change. 15. The arc detection system of claim 14 wherein the signal analyzer generates the output signal when the rate of change of the RF signal exceeds the predetermined rate of change and the RF signal amplitude is between the first predetermined threshold and a second predetermined threshold. 16. The arc detection system of claim 10 wherein the signal analyzer performs a fast-Fourier transform on the digital signal. 17. The arc detection system of claim 16 wherein the FFT generates a plurality of signals that represent corresponding harmonic frequencies of the RF signal. 18. The arc detection system of claim 17 wherein the signal analyzer generates the output signal when amplitudes of the signals exceed corresponding predetermined amplitudes. 19. The arc detection system of claim 16 wherein the FFT is a sliding-window FFT. 20. The arc detection system of claim 19 wherein the sliding-window FFT includes a window size between 3 and 5 cycles of the RF signal, inclusive. 21. The arc detection system of claim 10 further comprising a digital high-pass filter that filters the digital signal that is received by the signal analyzer. 22. The arc detection system of claim 21 wherein the digital filter is an infinite impulse response (IIR) filter. 23. The arc detection system of claim 22 wherein the IIR filter is sixth-order. 24. A method of detecting an arc in a RF plasma processing system, comprising: sensing a RF signal at an input of a RF plasma chamber;generating a signal based on at least one of the voltage, current, and power of the RF signal;monitoring the signal for frequency components substantially at a harmonic frequency of a selected fundamental frequency within the RF signal; andgenerating an output signal based on the frequency components wherein the output signal indicates that an arc is occurring in the RF plasma chamber. 25. The method of claim 24 wherein the frequency components include at least one of a first harmonic through ninth harmonic of the fundamental frequency. 26. The method of claim 24 further comprising generating the output signal based on a phase of the signal. 27. The method of claim 24 further comprising comparing an amplitude of the signal to a first predetermined threshold. 28. The method of claim 27 further comprising comparing a rate of change of the signal to a predetermined rate of change. 29. The method of claim 28 wherein generating the output signal occurs when the rate of change of the signal exceeds the predetermined rate of change and the amplitude of the signal is between the first predetermined threshold and a second predetermined amplitude. 30. The method of claim 24 further comprising high-pass filtering the signal that is communicated to the signal analyzer. 31. The method of claim 24 further comprising generating the output signal based on a signal-to-noise ratio of the signal. 32. A method of detecting an arc in a RF plasma processing system, comprising: sensing a RF signal at an input of a RF plasma chamber;generating a signal based on at least one of the voltage, current, and power of the RF signal;converting the signal to a digital signal;monitoring the digital signal for frequency components of the RF signal at a harmonic frequency of a fundamental frequency of the RF signal; andgenerating an output signal based on the frequency components wherein the output signal indicates that an arc is occurring in the RF plasma chamber. 33. The method of claim 32 wherein the frequency components include at least one of a harmonic of the fundamental frequency. 34. The method of claim 32 further comprising generating the output signal based on a phase of the RF signal as indicated by the digital signal. 35. The method of claim 32 further comprising comparing an amplitude of the RF signal, as indicated by the digital signal, to a predetermined threshold. 36. The method of claim 35 further comprising comparing a rate of change of the RF signal, as indicated by the digital signal, to a predetermined rate of change. 37. The method of claim 36 further comprising generating the output signal when the rate of change of the RF signal exceeds the predetermined rate of change and the RF signal amplitude is between the first predetermined threshold and a second predetermined threshold. 38. The method of claim 32 further comprising performing a fast-Fourier transform on the digital signal. 39. The method of claim 38 wherein the FFT generates a plurality of signals that represent corresponding harmonic frequencies of the RF signal. 40. The method of claim 39 further comprising generating the output signal when amplitudes of the signals exceed corresponding predetermined amplitudes. 41. The method of claim 38 wherein the FFT is a sliding-window FFT. 42. The method of claim 41 wherein the sliding-window FFT includes a window size between 3 and 5 cycles of the RF signal, inclusive. 43. The method of claim 32 further comprising digitally filtering the digital signal that is received by the signal analyzer. 44. The method of claim 43 wherein the digital filtering is infinite impulse response (IIR) filtering. 45. The method of claim 44 wherein the IIR filtering is sixth-order.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (13)
Buda, Paul R., Apparatus and method for arc detection.
Moslehi Mehrdad M. (Dallas TX), Electromagnetic wave measurement of conductive layers of a semiconductor wafer during processing in a fabrication chambe.
Mahoney, Leonard J.; Almgren, Carl W.; Roche, Gregory A.; Saylor, William W.; Sproul, William D.; Walde, Hendrik V., Sensor array for measuring plasma characteristics in plasma processing environments.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.