$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-051/40
  • C09D-007/12
  • C09D-005/24
  • H01L-021/02
  • C09D-007/14
  • B82Y-030/00
  • C09D-011/52
  • C09D-011/101
  • B01J-019/12
  • H01L-031/00
  • C08K-003/08
  • C08K-003/36
  • C08K-009/02
출원번호 US-0070286 (2011-03-23)
등록번호 US-8895962 (2014-11-25)
발명자 / 주소
  • Chiruvolu, Shivkumar
  • Altman, Igor
  • Frey, Bernard M.
  • Li, Weidong
  • Liu, Guojun
  • Lynch, Robert B.
  • Pengra-Leung, Gina Elizabeth
  • Srinivasan, Uma
출원인 / 주소
  • NanoGram Corporation
대리인 / 주소
    Dardi & Herbert, PLLC
인용정보 피인용 횟수 : 3  인용 특허 : 74

초록

Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert

대표청구항

1. A dispersion comprising at least about 0.05 weight percent elemental silicon/germanium nanoparticles having an average primary particle size of no more than about 50 nm, from about 0.25 weight percent to about 15 weight percent of a first solvent having a boiling point from about 55° C. to about

이 특허에 인용된 특허 (74)

  1. Flagan, Richard C.; Boer, Elizabeth; Ostraat, Michele L.; Atwater, Harry A.; Bell, II, Lloyd D., Aerosol silicon nanoparticles for use in semiconductor device fabrication.
  2. Korgel, Brian A.; Thurk, Paul; Johnston, Keith P., Applications of light-emitting nanoparticles.
  3. Xiaoyang Zhu ; Hongjun Yang, Attachment chemistry for organic molecules to silicon.
  4. Umeya Kaoru (1-30-13 ; Yagiyamahon-cho ; Taihaku-ku Sendai-shi ; Miyagi-ken JPX) Yamada Yukiyoshi (Saitama JPX) Fuyuki Tadashi (Saitama JPX) Kuroda Eisuke (Saitama JPX) Akiyama Satoshi (Saitama JPX), Coated particles of inorganic or metallic materials and processes of producing the same.
  5. Bi, Xiangxin; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; Gardner, James T.; Lim, Seung M.; McGovern, William E., Coating formation by reactive deposition.
  6. Gaylord ; Norman G., Compatibilization of hydroxyl-containing fillers and thermoplastic polymers.
  7. Matsuki,Yasuo; Iwasawa,Haruo; Kato,Hitoshi, Composition for forming silicon film and method for forming silicon film.
  8. Drummond Timothy (Ann Arbor MI) Ginley David (Albuquerque NM), Direct write with microelectronic circuit fabrication.
  9. Bi Xiangxin ; Kambe Nobuyuki, Efficient production of particles by chemical reaction.
  10. Haering, Jochen; Kraenzler, Thomas; Scherber, Werner; Weller, Horst; Haase, Markus; Zum Felde, Ulf, Electrochromic element.
  11. Herb,Craig A.; Zhang,Libing, Electrophoretic ink composed of particles with field dependent mobilities.
  12. Nayfeh,Munir H.; Belomoin,Gennadey; Rao,Satish; Therrien,Joel; Chaieb,Sahraoui, Family of discretely sized silicon nanoparticles and method for producing the same.
  13. McGarry Frederick J. (Weston MA), Filler particles coated with reactive liquid polymers in a matrix resin.
  14. Angel Sanjurjo ; Kai Hung Lau, Fluidized bed reactor having a centrally positioned internal heat source.
  15. Yoon Poong (Seoul KRX) Song Yongmok (Chungnam KRX), Fluidized bed reactor with microwave heating system for preparing high-purity polycrystalline silicon.
  16. Yu Bin, Formation of highly conductive junctions by rapid thermal anneal and laser thermal process.
  17. Goldstein Avery N. (Midland MI), Group IV semiconductor thin films formed at low temperature using nanocrystal precursors.
  18. Kim Hee Y. (Daejeon KRX) Song Yong M. (Daejeon KRX) Jeon Jong Y. (Daejeon KRX) Kwon Dae H. (Daejeon KRX) Lee Kang M. (Daejeon KRX) Lee Jae S. (Daejeon KRX) Park Dong S. (Daejeon KRX), Heating of fluidized bed reactor by microwaves.
  19. Choy, Mark L., Ink compositions and methods of ink-jet printing on hydrophobic media.
  20. Satoh, Noriaki; Tanabe, Satoshi; Fujioka, Masaya, Ink for ink-jet recording and color ink set.
  21. Haubrich, Scott; Kunze, Klaus; Dunphy, James C; Gudeman, Chris; Rockenberger, Joerg; Zurcher, Fabio; Sleiman, Nassrin; Takashima, Mao; Spindt, Chris, Interface layer for the fabrication of electronic devices.
  22. Suzuki Kazuhiko,JPX ; Watanabe Takayuki,JPX ; Kitahara Yasuhiro,JPX ; Ajioka Masanobu,JPX ; Ikado Shuhei,JPX, L-lactic acid polymer composition, molded product and film.
  23. Fujisawa, Katsuya; Ikari, Tokuo; Genda, Kazuo; Kumano, Atsushi; Oshima, Noboru; Matsuoka, Yoshiki; Eguchi, Toshimasa; Yamaoka, Shigenori; Ono, Yoshiyuki; Yonehara, Hisatomo; Takahashi, Tatsumi; Suzuki, Motoyuki; Tsukuda, Akimitsu; Sekine, Norimasa; Takechi, Kazushige; Sumiyoshi, Ken; Fujieda, Ichiro; Tsuruoka, Yasuo, Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film.
  24. Korgel, Brian A.; Johnston, Keith P., Light-emitting nanoparticles and method of making same.
  25. Huang Rong-Fong ; Sanchez Carlos A. ; Lombard James H., Low temperature cofireable dielectric paste.
  26. Alivisatos A. Paul (Berkeley CA) Goldstein Avery N. (Oakland CA), Low temperature thin films formed from nanocrystal precursors.
  27. Goldstein Avery N. (Midland MI), Method for depositing and patterning thin films formed by fusing nanocrystalline precursors.
  28. Goldstein Avery Nathan, Method for photolytic liquid phase synthesis of silicon and germanium nanocrystalline materials.
  29. Kauzlarich,Susan M.; Baldwin,Richard K., Method for preparing group IV nanocrystals with chemically accessible surfaces.
  30. Nayfeh, Munir H.; Therrien, Joel; Yamani, Zain H., Method for producing silicon nanoparticles.
  31. Li Jiang (Beijing CNX) Pan Xijin (Beijing CNX) You Shoudong (Beijing CNX) Huang Shixiong (Beijing CNX), Method for surface treating conductive copper powder with a treating agent and coupler.
  32. Kamata Atsushi,JPX ; Inagaki Hiroki,JPX ; Suenaga Seiichi,JPX ; Takeda Hiromitsu,JPX, Method of forming polycrystalline silicon thin layer.
  33. Goldstein Avery N. (Midland MI), Method of making large-area semiconductor thin films formed at low temperature using nanocrystal presursors.
  34. Notenboom, Gerardus J. A. M., Method of manufacturing a sintered structure on a substrate.
  35. Powell, Martin J., Method of manufacturing a transistor.
  36. Grabmaier Christa (Berg DEX) Otto Franz (Munich DEX) Thomann Helmut (Munich DEX), Method of producing plate- or tape-shaped silicon crystal bodies having crystalline pillar-like structures therein, equi.
  37. Lemmi, Francesco; Rogojina, Elena V.; Yu, Pingrong; Jurbergs, David; Antoniadis, Homer; Kelman, Maxim, Methods for creating a densified group IV semiconductor nanoparticle thin film.
  38. Saul Griffith ; Joseph M. Jacobson ; Scott Manalis, Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging.
  39. Shah, Sunil; Abbott, Malcolm, Methods of forming multi-doped junctions on a substrate.
  40. Lee, Howard Wing Hoon; Gao, Bingshen; Keshavarz, Majid, Methods of forming quantum dots of Group IV semiconductor materials.
  41. Linford Matthew B (Salt Lake City UT) Chidsey Christopher E. D. (San Francisco CA), Molecular layers covalently bonded to silicon surfaces.
  42. Rockenberger, Joerg; Zurcher, Fabio; Haubrich, Scott; Sleiman, Nassrin, Nanoparticle synthesis and the formation of inks therefrom.
  43. Bi,Xiangxin; Kambe,Nobuyuki; Horne,Craig R.; Gardner,James T.; Mosso,Ronald J.; Chiruvolu,Shivkumar; Kumar,Sujeet; McGovern,William E.; DeMascarel,Pierre J.; Lynch,Robert B., Nanoparticle-based power coatings and corresponding structures.
  44. Zurcher,Fabio; Ridley,Brent; Kunze,Klaus; Haubrich,Scott; Rockenberger,Joerg, Nanoparticles and method for making the same.
  45. Goldstein Avery Nathan, Narrow size distribution silicon and germanium nanocrystals.
  46. Black,Charles T.; Guarini,Kathryn Wilder, Nonvolatile memory device using semiconductor nanocrystals and method of forming same.
  47. Horne, Craig R.; DeMascarel, Pierre J.; Honeker, Christian C.; Chaloner-Gill, Benjamin; Lopez, Herman A.; Bi, Xiangxin; Mosso, Ronald J.; McGovern, William E.; Gardner, James T.; Kumar, Sujeet; Gilli, Optical materials and optical devices.
  48. Tsujimura, Takatoshi; Tanaka, Atsushi; Miwa, Kohichi; Morooka, Mitsuo, Organic LED device.
  49. Motoomi Arakawa JP; Kazuaki Sukata JP; Yasuyuki Agari JP; Masayuki Shimada JP, Organic-inorganic composite material and process for preparing the same.
  50. Yamamura Ryuji (Kyoto JPX) Tsuboi Mikio (Kyoto JPX) Kitagawa Keishi (Kyoto JPX) Abe Masaru (Kyoto JPX), Packaging material for high pressure liquid chromatography and method of making the same.
  51. Gardner James T. ; Phillips Samuel R. ; Bi Xiangxin, Particle collection apparatus and associated methods.
  52. Boehm Marcus (Plainsboro NJ), Particulate semiconductor devices and methods.
  53. Sugawara, Shin; Kyoda, Takeshi; Arimune, Hisao, Photoelectric conversion device and manufacturing method thereof.
  54. Wong Sui-Ming (Collegeville PA) Cooper Eugene R. (Berwyn PA) Xu Shugian (Exton PA), Polyalkylene block copolymers as surface modifiers for nanoparticles.
  55. Kambe, Nobuyuki; Blum, Yigal Do; Chaloner-Gill, Benjamin; Chiruvolu, Shivkumar; Kumar, Sujeet; MacQueen, David Brent, Polymer-inorganic particle composites.
  56. Kambe, Nobuyuki; Blum, Yigal Dov; Chaloner-Gill, Benjamin; Chiruvolu, Shivkumar; Kumar, Sujeet; MacQueen, David Brent, Polymer-inorganic particle composites.
  57. Brownscombe Thomas F. (Houston TX), Polymer-reinforcing compositions and their preparation.
  58. Blackburn, Gary; Creager, Stephen E.; Fraser, Scott; Irvine, Bruce D.; Meade, Thomas J.; O'Connor, Stephen D.; Terbrueggen, Robert H.; Vielmetter, Jost G.; Welch, Thomas W., Printed circuit boards with monolayers and capture ligands.
  59. Lee Jung D. (Soowon KRX) Yoo Chang J. (Soowon KRX) Lee Moon Y. (Soowon KRX), Process for preparing a low stress agent & an epoxy composition containing the agent.
  60. Schreieder Franz,DEX ; Kim Hee Young,KRX, Process for preparing highly pure silicon granules.
  61. Talbot, Peter Cade; Alarco, Jose Antonio; Edwards, Geoffrey Alan, Production of metal oxide particles with nano-sized grains.
  62. Weidhaus,Dieter; Hayduk,Alexander, Radiation-heated fluidized-bed reactor.
  63. Kratel Gnter (Durach-Bechen DEX) Stohr Gnter (Durach-Bechen DEX) Scherer Heinz (Burghausen DEX), Room temperature vulcanizable organopolysiloxane compositions.
  64. Shiho,Hiroshi; Kato,Hitoshi, Silane composition, silicon film forming method and solar cell production method.
  65. Shiho,Hiroshi; Kato,Hitoshi, Silane composition, silicon film forming method and solar cell production method.
  66. Dahlberg Reinhard (Flein DEX), Silicon layer solar cell and method of producing it.
  67. Graiver Daniel (Midland MI) Pernisz Udo C. (Midland MI) El-Shall Mohamed Samy Sayed (Richmond VA), Silicon nanoparticles.
  68. Halik,Marcus; Schmid,G체nter; Klauk,Hagen, Silicon particles as additives for improving charge carrier mobility in organic semiconductors.
  69. Priesemuth Wolfgang,DEX, Solar cell and method of producing same.
  70. Mitsuhiro Maruyama,JPX ; Yasuhiro Maruyama,JPX, Substrate for producing semiconductor device, method for producing the substrate, photoelectric conversion device and method for producing the photoelectric conversion device.
  71. Yudasaka,Ichio; Shimoda,Tatsuya; Kanbe,Sadao; Miyazawa,Wakao, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device.
  72. Yudasaka,Ichio; Shimoda,Tatsuya; Kanbe,Sadao; Miyazawa,Wakao, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device.
  73. Smith,David D.; Cudzinovic,Michael J.; McIntosh,Keith R.; Mehta,Bharatkumar Gamanlal, Use of doped silicon dioxide in the fabrication of solar cells.
  74. Smith,David D.; Cudzinovic,Michael J.; McIntosh,Keith R.; Mehta,Bharatkumar Gamanlal, Use of doped silicon dioxide in the fabrication of solar cells.

이 특허를 인용한 특허 (3)

  1. Yin, Qinghua; Qi, Xiwang; Biberger, Maximilian A., Catalyst design for heavy-duty diesel combustion engines.
  2. Layman, Frederick P., Fluid recirculation system for use in vapor phase particle production system.
  3. Biberger, Maximilian A.; Lehman, Jr., Stephen Edward; Kevwitch, Robert Matthew; Yin, Qinghua; Kingsley, Jesudos J., Method and system for forming plug and play metal catalysts.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트