Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-051/40
C09D-007/12
C09D-005/24
H01L-021/02
C09D-007/14
B82Y-030/00
C09D-011/52
C09D-011/101
B01J-019/12
H01L-031/00
C08K-003/08
C08K-003/36
C08K-009/02
출원번호
US-0070286
(2011-03-23)
등록번호
US-8895962
(2014-11-25)
발명자
/ 주소
Chiruvolu, Shivkumar
Altman, Igor
Frey, Bernard M.
Li, Weidong
Liu, Guojun
Lynch, Robert B.
Pengra-Leung, Gina Elizabeth
Srinivasan, Uma
출원인 / 주소
NanoGram Corporation
대리인 / 주소
Dardi & Herbert, PLLC
인용정보
피인용 횟수 :
3인용 특허 :
74
초록▼
Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert
Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.
대표청구항▼
1. A dispersion comprising at least about 0.05 weight percent elemental silicon/germanium nanoparticles having an average primary particle size of no more than about 50 nm, from about 0.25 weight percent to about 15 weight percent of a first solvent having a boiling point from about 55° C. to about
1. A dispersion comprising at least about 0.05 weight percent elemental silicon/germanium nanoparticles having an average primary particle size of no more than about 50 nm, from about 0.25 weight percent to about 15 weight percent of a first solvent having a boiling point from about 55° C. to about 160° C., and from about 65 weight percent to about 94.75 weight percent of a second solvent having a boiling point of at least about 175° C., wherein the nanoparticles are stably dispersed and wherein the dispersion has a viscosity of at least about 500 cP (0.5 Pa·s). 2. The dispersion of claim 1 wherein the second solvent comprises N-methyl pyrrolidone, ethylene glycol, propylene glycol, terpineol, 2-(2-ethoxyethoxy)ethanol (Carbitol), butyl cellosolve, or combinations thereof. 3. The dispersion of claim 1 wherein the first solvent comprises isopropyl alcohol, acetone, dimethylformamide, cyclohexanone or combinations thereof. 4. The dispersion of claim 1 wherein the elemental silicon nanoparticles comprise at least 0.5 atomic percent of a dopant. 5. The dispersion of claim 1 having a viscosity from about 50 Pa·s to about 250 Pa·s. 6. The dispersion of claim 1 wherein the nanoparticles have an total metal contamination of level of no more than about 5 parts per million. 7. The dispersion of claim 1 wherein the nanoparticles have no more than about 1 part per million by weight of iron. 8. The dispersion of claim 1 having a viscosity at a shear rate of 2 s−1 from about 10 Pa·s to about 300 Pa·s. 9. The dispersion of claim 1 comprising from about 0.5 weight percent to about 15 weight percent elemental silicon/germanium nanoparticles. 10. The dispersion of claim 1 wherein the elemental silicon/germanium nanoparticles are doped with phosphorous or boron. 11. A paste comprising at least about 0.05 weight percent elemental silicon/germanium nanoparticles having an average primary particle size of no more than about 50 nm, from about 0.25 weight percent to about 15 weight percent of a first solvent having a boiling point from about 55° C. to about 160° C., and from about 65 weight percent to about 94.75 weight percent of a second solvent having a boiling point of at least about 175° C., wherein the nanoparticles are stably dispersed wherein the elemental silicon/germanium nanoparticles are free of non-solvent based chemically bonded organic surface modification. 12. The paste of claim 11 wherein the elemental silicon/germanium nanoparticles are doped with phosphorous or boron. 13. The paste of claim 11 wherein the second solvent comprises N-methyl pyrrolidone, ethylene glycol, propylene glycol, terpineol, 2-(2-ethoxyethoxy)ethanol (Carbitol), butyl cellosolve, or combinations thereof. 14. The paste of claim 11 wherein the first solvent comprises isopropyl alcohol, acetone, dimethylformamide, cyclohexanone or combinations thereof. 15. The paste of claim 11 wherein the elemental silicon nanoparticles comprise at least 0.5 atomic percent of a dopant. 16. The paste of claim 11 having a viscosity from about 50 Pa·s to about 250 Pa·s. 17. The paste of claim 11 wherein the nanoparticles have an total metal contamination of level of no more than about 5 parts per million. 18. The paste of claim 11 wherein the nanoparticles have no more than about 1 part per million by weight of iron. 19. The paste of claim 11 having a viscosity at a shear rate of 2 s−1 from about 10 Pa·s to about 300 Pa·s. 20. The paste of claim 11 comprising from about 0.5 weight percent to about 15 weight percent elemental silicon/germanium nanoparticles.
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