Method for printing a material onto a substrate
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B41M-001/04
B41M-003/00
G03F-007/20
G02F-001/1337
출원번호
US-0320831
(2010-07-01)
등록번호
US-8899148
(2014-12-02)
국제출원번호
PCT/US2010/040723
(2010-07-01)
§371/§102 date
20111116
(20111116)
국제공개번호
WO2011/002967
(2011-01-06)
발명자
/ 주소
Rudolph, Michael Lee
출원인 / 주소
E I du Pont de Nemours and Company
인용정보
피인용 횟수 :
1인용 특허 :
57
초록▼
The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the
The invention provides a method for printing a material onto a substrate with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask having a line screen resolution equal to or greater than 250 lines per inch on the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form a relief structure having a plurality of raised surfaces with a line screen resolution equal to or greater than 250 lines per inch. Printing is accomplished by applying an imaging material to the plurality of raised surfaces and contacting to transfer the imaging material to the substrate. The method is suitable for printing high resolution graphic images, as well as for forming a uniform layer of imaging material on the substrate.
대표청구항▼
1. A method for printing a material onto a substrate comprising: a) providing a relief printing form from a photosensitive element comprising a layer of a photopolymerizable composition containing a binder, an ethylenically unsaturated compound, and a photoinitiator, with steps comprising: i) formin
1. A method for printing a material onto a substrate comprising: a) providing a relief printing form from a photosensitive element comprising a layer of a photopolymerizable composition containing a binder, an ethylenically unsaturated compound, and a photoinitiator, with steps comprising: i) forming an in-situ mask having a plurality of openings through an area opaque to actinic radiation adjacent the photopolymerizable layer, the openings having a line screen resolution equal to or greater than 250 lines per inch;ii) exposing the photopolymerizable layer to actinic radiation through the mask openings in an environment having an inert gas and a concentration of oxygen between 190,000 parts per million (ppm) and 100 ppm; andiii) treating the element resulting from step ii) to form a relief structure having a plurality of raised surfaces with a line-screen resolution equal to or greater than 250 lines per inch;b) applying the material to the plurality of raised surfaces; andc) contacting the material from the plurality of raised surfaces to the substrate thereby transferring the material to the substrate. 2. The method of claim 1 wherein the contacting step forms a layer of the material on the substrate. 3. The method of claim 2 wherein a pattern of two or more regions of the layer of the material is formed on the substrate. 4. The method of claim 1 wherein the material on the substrate has a thickness of 50 to 5000 angstroms. 5. The method of claim 2 wherein the layer of material on the substrate has a thickness of about 200 to 1500 angstroms. 6. The method of claim 2 wherein the openings in the mask have a dot area that is between 20 to 80% of a total pixel area. 7. The method of claim 1 wherein the contacting step creates a graphic image of the material on the substrate, the graphic image selected from the group consisting of halftone illustrations, text, line features, and combinations thereof. 8. The method of claim 1 wherein the material is a liquid crystal alignment material. 9. The method of claim 1 wherein the material is a polyimide. 10. The method of claim 1 wherein the material is selected from the group consisting of varnishes, inks, and adhesives. 11. A method for preparing a relief printing form having an elastomeric layer with a relief structure comprising a plurality of raised surfaces with a line-screen resolution equal to or greater than 250 lines per inch, comprising: a) providing a photosensitive element comprising an elastomeric layer of a photopolymerizable material comprising a binder, an ethylenically unsaturated compound, and a photoinitiator;b) forming an in-situ mask having a plurality of openings through an area opaque to actinic radiation adjacent to the photopolymerizable layer, the openings having a line-screen resolution equal to or greater than 250 lines per inch;c) exposing the photopolymerizable layer to actinic radiation through the mask openings in an environment having an inert gas and a concentration of oxygen between 190,000 parts per million (ppm) and 100 ppm; andd) treating the element resulting from step c) to form the relief structure having a plurality of raised surfaces with a line-screen resolution of equal to or greater than 250 lines per inch. 12. The method of claim 1 or 11 wherein the line-screen resolution of the plurality of raised surfaces of the relief structure is the same or substantially the same as the line-screen resolution of the mask. 13. The method of claim 1 or 11 wherein the resolution of the mask openings is selected from the group consisting of 250 lines per inch (LPI), 300 LPI, 350 LPI, 400 LPI, and 600 LPI. 14. The method of claim 1 or 11 wherein the resolution of the raised surfaces equals or is greater than 400 lines per inch. 15. The method of claim 1 or 11 wherein each raised surface has a top surface having a diameter between about 10 and about 90 micrometers. 16. The method of claim 1 or 11 wherein the concentration of oxygen in the environment is less than or equal to 80,000 ppm. 17. The method of claim 1 or 11 wherein the inert gas is selected from the group consisting of argon, helium, neon, krypton, xenon, nitrogen, carbon dioxide, and combinations thereof. 18. The method of claim 1 or 11 wherein a layer of an actinic radiation opaque material is disposed on or adjacent the photopolymerizable layer, and step i) comprises imagewise exposing the actinic radiation opaque layer with laser radiation forming the in-situ mask. 19. The method of claim 18 wherein the imagewise exposing with laser radiation is selected from the group consisting of (a) selectively ablating the actinic radiation opaque layer from the photopolymerizable layer, and (b) selectively transferring portions of the actinic radiation opaque layer to the photopolymerizable layer. 20. The method of claim 1 or 11 wherein the treating step iii) is selected from the group consisting of: a) processing the element of step ii) with at least one washout solution selected from the group consisting of solvent solution, aqueous solution, semi-aqueous solution, and water; andb) heating the element of step ii) to a temperature sufficient to cause areas to melt, flow, or soften, and removing the areas.
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Heinz Gerhard (Weisenheim DEX) Richter Peter (Frankenthal DEX) Mueller Wolfgang F. (Neustadt DEX), Photopolymerizable mixtures containing elastomeric block polymers and photocurable elements produced therefrom.
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