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Method of transferring a laminate and method of manufacturing a semiconductor device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B32B-038/10
  • H01L-021/762
  • H01L-021/20
출원번호 US-0502428 (2009-07-14)
등록번호 US-8945331 (2015-02-03)
우선권정보 JP-2002-143797 (2002-05-17)
발명자 / 주소
  • Takayama, Toru
  • Goto, Yuugo
  • Maruyama, Junya
  • Ohno, Yumiko
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Robinson, Eric J.
인용정보 피인용 횟수 : 1  인용 특허 : 47

초록

An object of the present invention is to provide a method of transferring an object to be peeled onto a transferring member in a short time without imparting damage to the object to be peeled within a laminate. Also, another object of the present invention is to provide a method of manufacturing a s

대표청구항

1. A method for manufacturing a semiconductor device comprising: forming a semiconductor element over a first substrate with a peeling layer interposed therebetween;bonding a support to the semiconductor element with a two-sided tape interposed therebetween;peeling the semiconductor element from the

이 특허에 인용된 특허 (47)

  1. Takahashi Satoshi (Tochigi JPX) Mitushima Ikuo (Tochigi JPX), Adhesive and double-sided adhesive tape.
  2. Michael S. Sylvester, Double-sided self-adhesive reinforced foam tape.
  3. Shimoda, Tatsuya; Inoue, Satoshi; Miyazawa, Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device and liquid crystal display device produced by the same.
  4. Shimoda, Tatsuya; Inoue, Satoshi; Miyazawa, Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
  5. Shimoda,Tatsuya; Inoue,Satoshi; Miyazawa,Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
  6. Shimoda,Tatsuya; Inoue,Satoshi; Miyazawa,Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
  7. Shimoda,Tatsuya; Inoue,Satoshi; Miyazawa,Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
  8. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Mansfield MA), Liquid crystal display having essentially single crystal transistors pixels and driving circuits.
  9. Inoue Satoshi,JPX ; Shimoda Tatsuya,JPX, Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device.
  10. Inoue, Satoshi; Shimoda, Tatsuya, Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device.
  11. Inoue,Satoshi; Shimoda,Tatsuya, Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device.
  12. Hiroshi Tayanaka JP, Method for making thin film semiconductor.
  13. Tayanaka Hiroshi,JPX, Method for making thin film semiconductor.
  14. Tayanaka Hiroshi,JPX, Method for making thin film semiconductor.
  15. Tayanaka Hiroshi,JPX, Method for making thin film semiconductor.
  16. Inoue, Satoshi; Shimoda, Tatsuya, Method for making three-dimensional device.
  17. Yamazaki Shunpei,JPX ; Nakajima Setsuo,JPX ; Arai Yasuyuki,JPX, Method for producing display device.
  18. Matsushita Takeshi,JPX ; Tayanaka Hiroshi,JPX, Method for separating a device-forming layer from a base body.
  19. Cavasin Daniel (Austin TX), Method for thinning a semiconductor wafer.
  20. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Norton MA), Method of fabricating single crystal silicon arrayed devices for display panels.
  21. Inoue, Satoshi; Shimoda, Tatsuya, Method of separating thin film device, method of transferring thin film device, thin film device, active matrix substrate and liquid crystal display device.
  22. Inoue, Satoshi; Shimoda, Tatsuya, Method of separating thin-film device, method of transferring thin-film device, thin-film device, active matrix substrate, and liquid crystal display device.
  23. Takayama,Toru; Goto,Yuugo; Maruyama,Junya; Ohno,Yumiko, Method of transferring a laminate and method of manufacturing a semiconductor device.
  24. Sullivan Gerard J. (Thousand Oaks CA) Szwed Mary K. (Huntington Beach CA) Chang Mau-Chung F. (Thousand Oaks CA), Method of transferring a thin film to an alternate substrate.
  25. Paul M. Zavracky ; John C. C. Fan ; Robert McClelland ; Jeffrey Jacobsen ; Brenda Dingle, Method of transferring semiconductors.
  26. Zavracky Paul M. ; Fan John C. C. ; McClelland Robert ; Jacobsen Jeffrey ; Dingle Brenda, Method of transferring semiconductors.
  27. Delgado Joaquin ; Silver Spencer F., Pressure sensitive adhesive film having differential adhesive properties and method of making the same.
  28. Peloquin Richard L. ; Everaerts Albert I. ; Wilson Kenneth D. ; Galick Stephen J., Pressure sensitive adhesives for use on low energy surfaces.
  29. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX ; Nishida Shoji,JPX ; Yamagata Kenji,JPX, Process for producing semiconductor article.
  30. Sakaguchi, Kiyofumi; Yonehara, Takao; Nishida, Shoji; Yamagata, Kenji, Process for producing semiconductor article.
  31. Yamamoto Shoji,JPX ; Yamamoto Kazuhiko,JPX, Protective member for semiconductor wafer.
  32. Nakao Koshiro,JPX, Seal construction and seal member.
  33. Sylvester Michael S., Self-adhesive reinforced foam gasket.
  34. Sylvester, Michael S., Self-adhesive reinforced foam gasket.
  35. Maruyama,Junya; Takayama,Toru; Goto,Yuugo, Semiconductor device and method of manufacturing the same.
  36. Toshiyuki Sameshima JP, Semiconductor element forming process having a step of separating film structure from substrate.
  37. Tatsuya Shimoda JP; Satoshi Inoue JP; Wakao Miyazawa JP, Separating method, method for transferring thin film device, thin film device, thin film integrated circuit device, and liquid crystal display device manufactured by using the transferring method.
  38. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Norton MA), Single crystal silicon arrayed devices for display panels.
  39. Zavracky Paul M. ; Fan John C. C. ; McClelland Robert ; Jacobsen Jeffrey ; Dingle Brenda, Single crystal silicon arrayed devices for display panels.
  40. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Norton MA), Single crystal silicon transistors for display panels.
  41. Sakaguchi Kiyofumi,JPX ; Sato Nobuhiko,JPX, Substrate and production method thereof.
  42. Sakaguchi, Kiyofumi; Sato, Nobuhiko, Substrate and production method thereof.
  43. Inoue, Satoshi; Shimoda, Tatsuya; Miyazawa, Wakao, Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus.
  44. Inoue, Satoshi; Shimoda, Tatsuya; Miyazawa, Wakao, Thin film device transfer method, thin film device, thin film integrated circuit device, active matrix board, liquid crystal display, and electronic apparatus.
  45. Tayanaka Hiroshi,JPX, Thin film semiconductor and method for making thin film semiconductor.
  46. Hodges Joe (Boise ID), UV light sensitive die-pac for securing semiconductor dies during transport.
  47. Warner Joseph, Vehicle camouflage conversion kit and method of using same.

이 특허를 인용한 특허 (1)

  1. Eguchi, Shingo; Oikawa, Yoshiaki; Okazaki, Kenichi; Maruyama, Hotaka, Light-emitting device and manufacturing method thereof.
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