Non-evaporable getter alloys particularly suitable for hydrogen and nitrogen sorption
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01J-007/18
H01J-035/20
H01K-001/56
C22C-014/00
C22C-016/00
출원번호
US-0348350
(2013-05-13)
등록번호
US-8961816
(2015-02-24)
우선권정보
IT-MI2012A0872 (2012-05-21)
국제출원번호
PCT/IB2013/053874
(2013-05-13)
국제공개번호
WO2013/175340
(2013-11-28)
발명자
/ 주소
Coda, Alberto
Gallitognotta, Alessandro
Bonucci, Antonio
Conte, Andrea
출원인 / 주소
Saes Getters S.p.A.
대리인 / 주소
Steinfl & Bruno LLP
인용정보
피인용 횟수 :
1인용 특허 :
7
초록
Getter devices based on powders of alloys particularly suitable for hydrogen and nitrogen sorption are described. Such alloys have a composition including zirconium, vanadium, titanium and, optionally, one or more elements selected from iron, chromium, manganese, cobalt, nickel and aluminum.
대표청구항▼
1. A getter device containing non-evaporable getter alloy powders having high gas sorption efficiency, particularly for hydrogen and nitrogen, said alloy powders comprising as compositional elements zirconium, vanadium and titanium and having an atomic percentage composition of said elements which c
1. A getter device containing non-evaporable getter alloy powders having high gas sorption efficiency, particularly for hydrogen and nitrogen, said alloy powders comprising as compositional elements zirconium, vanadium and titanium and having an atomic percentage composition of said elements which can vary within the following ranges: zirconium from 42% to 85%;vanadium from 8% to 50%;titanium from 5% to 30%, said atomic percentage ranges being considered respect to a sum of zirconium, vanadium and titanium in the non-evaporarable getter alloy that can further comprise as compositional elements one or more metals selected from the group consisting of iron, chromium, manganese, cobalt, nickel and aluminum, wherein other chemical elements can be present in the alloy composition only if their overall percentage is less than 1% by atomic percentage with respect to the total of the alloy composition. 2. The getter device according to claim 1, wherein the atomic percentage of vanadium is comprised between 30% and 47%. 3. The getter device according to claim 2, wherein the atomic percentage of vanadium is comprised between 37% and 47%. 4. The getter device according to claim 1, wherein the atomic percentage of vanadium is comprised between 28% and 30%. 5. The getter device according to claim 1, wherein the atomic percentage of vanadium is comprised between 8% and 23%. 6. The getter device according to claim 1, wherein said alloy further comprises in its composition one or more additional elements selected from the group consisting of iron, chromium, manganese, cobalt or nickel in an atomic percentage composition comprised between 0.1% and 7%, more preferably between 0.1% and 5%, with respect to the total alloy composition. 7. The getter device according to claim 1, wherein said alloy further comprises in its composition aluminum as additional element in an atomic percentage composition comprised between 0.1% and 12% more preferably between 0.1% and 10%, with respect to the total alloy composition. 8. The getter device according to claim 1, wherein said getter alloy powders are mixed with metal powders, said metal powders being preferably selected between titanium and zirconium or mixtures thereof. 9. The getter device according to claim 1, wherein said alloy powders have a particle size lower than 500 μm, preferably lower than 300 μm. 10. A hydrogen-sensitive device containing the getter device according to claim 1.
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이 특허에 인용된 특허 (7)
Conte Andrea,ITX, Getter pump with high gas sorption velocity.
Briesacher Jeffrey L. (Pismo Beach CA) Applegarth Charles H. (San Luis Obispo CA) Lorimer D\Arcy H. (Pismo Beach CA), Method and apparatus for removing residual hydrogen from a purified gas.
Reutova Nina Pavlovna,RUX ; Manegin Sergei Jurievich,RUX ; Pustovoit Jury Mikhailovich,RUX ; Stolyarov Vladimir Leonidovich,RUX, Non-vaporizing getter and method of obtaining the same.
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