Systems, methods, and apparatuses for monitoring weld quality
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B23K-031/02
B23K-009/095
B23K-031/12
G09B-019/24
출원번호
US-0044986
(2013-10-03)
등록번호
US-8987628
(2015-03-24)
발명자
/ 주소
Daniel, Joseph A.
Chantry, Bruce J.
출원인 / 주소
Lincoln Global, Inc.
대리인 / 주소
Calfee, Halter & Griswold LLP
인용정보
피인용 횟수 :
21인용 특허 :
144
초록▼
An arc welder including an integrated monitor is disclosed. The monitor is capable of monitoring variables during a welding process and weighting the variables accordingly, quantifying overall quality of a weld, obtaining and using data indicative of a good weld, improving production and quality con
An arc welder including an integrated monitor is disclosed. The monitor is capable of monitoring variables during a welding process and weighting the variables accordingly, quantifying overall quality of a weld, obtaining and using data indicative of a good weld, improving production and quality control for an automated welding process, teaching proper welding techniques, identifying cost savings for a welding process, and deriving optimal welding settings to be used as pre-sets for different welding processes or applications.
대표청구항▼
1. A monitor for monitoring an electric arc welder as the electric arc welder performs a selected arc welding process by creating actual welding parameters between an advancing wire and a workpiece to form a weld, said selected arc welding process being defined by a series of rapidly repeating wave
1. A monitor for monitoring an electric arc welder as the electric arc welder performs a selected arc welding process by creating actual welding parameters between an advancing wire and a workpiece to form a weld, said selected arc welding process being defined by a series of rapidly repeating wave shapes of command signals for said parameters, each wave shape constituting a weld cycle with a cycle time, said monitor comprising: first logic for segmenting each of said wave shapes into a series of time segmented states;second logic for selecting a specific wave shape state;third logic for reading a plurality of selected weld parameters occurring in one or more of said states at an interrogation rate over a period of time repeated during the welding process;fourth logic for calculating a plurality of quality parameters for each of said states based on said selected weld parameters;fifth logic for comparing each of said quality parameters calculated for each period of time to a corresponding expected quality parameter to determine if a difference between said calculated quality parameter and said expected quality parameter exceeds a predetermined threshold; andsixth logic for weighting said calculated quality parameter with a magnitude weight based on said difference, and weighting said calculated quality parameter with a time contribution weight based on a time contribution of its state to the wave shape including said state, if said difference exceeds said threshold,wherein said quality parameters represent an overall quality measurement of said weld. 2. The monitor of claim 1, wherein said interrogation rate is 120 kHz. 3. The monitor of claim 1, wherein said period of time is approximately 250 ms. 4. The monitor of claim 1, wherein said selected weld parameters are read for all of said states. 5. The monitor of claim 1, further comprising: using said quality parameters in a metric to evaluate subsequent welds. 6. A monitor for monitoring an electric arc welder as the electric arc welder performs a selected arc welding process by creating actual welding parameters between an advancing wire and a workpiece to form a weld, said selected arc welding process being defined by a series of rapidly repeating wave shapes of command signals for said parameters, each wave shape constituting a weld cycle with a cycle time, said monitor comprising: first logic for segmenting each of said wave shapes into a series of time segmented states;second logic for selecting a specific wave shape state;third logic for reading a plurality of selected weld parameters occurring in one or more of said states at an interrogation rate over a period of time repeated during the welding process; andfourth logic for calculating a plurality of quality parameters for each of said states based on said selected weld parameters,wherein said selected weld parameters include, for each of said states, a count of said measurements taken for each of said selected weld parameters in said period of time, a mean voltage voltage in said period of time, a root mean square voltage RMSV in said period of time, a voltage variance Vvar in said period of time, a mean current current in said period of time, a root mean square current RMSI in said period of time, and a current variance Ivar in said period of time,wherein voltage=a sum of voltages measured in said period of time/said count of voltage measurements,wherein RMSV=∑i=1N(voltagei)2N,wherein Vvar=RMSV− voltage,wherein current=a sum of currents measured in said period of time/said count of current measurements,wherein RMSI=∑i=1N(currenti)2N,wherein Ivar=RMSI− current,wherein N is a total number of weld cycles in said period of time,wherein voltagei refers to a voltage measurement for a specific one of the weld cycles in said period of time,wherein currenti refers to a current measurement for a specific one of the weld cycles in said period of time, andwherein said quality parameters represent an overall quality measurement of said weld. 7. The monitor of claim 6, wherein said quality parameters include a quality count average QCA for each state calculated as: QCA=∑i=1NcountiN,wherein counti refers to said count of said measurements for a specific weld cycle in said period of time. 8. The monitor of claim 7, wherein said quality parameters include a quality count standard deviation QCSD for each state calculated as one of: QCSD=∑i=1N(counti-QCA)2N-1,andQCSD=∑i=1N(counti-QCA)2N. 9. The monitor of claim 6, wherein said quality parameters include a quality voltage average QVA for each state calculated as: QVA=∑i=1NvoltageiN. 10. The monitor of claim 9, wherein said quality parameters include a quality voltage standard deviation QVSD for each state calculated as one of: QVSD=∑i=1N(voltagei-QVA)2N-1,andQVSD=∑i=1N(voltagei-QVA)2N. 11. The monitor of claim 6, wherein said quality parameters include a quality current average QIA for each state calculated as: QIA=∑i=1NcurrentiN. 12. The monitor of claim 11, wherein said quality parameters include a quality current standard deviation QISD for each state calculated as one of: QISD=∑i=1N(currenti-QIA)2N-1,andQISD=∑i=1N(currenti-QIA)2N. 13. The monitor of claim 6, wherein said quality parameters include a quality voltage variance average QVVA for each state calculated as: QVVA=∑i=1NVvariN. 14. The monitor of claim 13, wherein said quality parameters include a quality voltage variance standard deviation QVVSD for each state calculated as one of: QVVSD=∑i=1N(Vvar1-QVVA)2N-1,andQVVSD=∑i=1N(Vvari-QVVA)2N-1. 15. The monitor of claim 6, wherein said quality parameters include a quality current variance average QIVA for each state calculated as: QIVA=∑i=1NVvariN. 16. The monitor of claim 15, wherein said quality parameters include a quality current variance standard deviation QIVSD for each state calculated as one of: QIVSD=∑i=1N(Ivari-QIVA)2N-1,andQIVSD=∑i=1N(Ivari-QIVA)2N.
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