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Plastic soft composition for polishing and for surface protective material application 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C09K-003/14
  • B24D-003/34
  • B24D-003/28
  • B24D-011/00
  • B24D-013/12
  • B24D-013/14
  • B24D-015/04
출원번호 US-0636481 (2009-12-11)
등록번호 US-8992644 (2015-03-31)
우선권정보 JP-2009-89001 (2009-04-01)
발명자 / 주소
  • Kodate, Tadao
출원인 / 주소
  • Joybond Co., Ltd.
대리인 / 주소
    Meyertons, Hood, Kivlin, Kowert & Goetzel, P.C.
인용정보 피인용 횟수 : 1  인용 특허 : 45

초록

A plastic soft composition is formed of soft base material constantly provided with plasticity, porous fine particles for polishing contained in the base material, and the like, and a polishing process and a coating process are performed to a painted surface and the like using the plastic soft compo

대표청구항

1. A plastic soft composition for polishing and for surface protective material application comprising: a soft base material with plasticity;porous fine particles for polishing mixed in the soft base material, wherein each of the fine particles for polishing has hole portions;a surface protective ag

이 특허에 인용된 특허 (45)

  1. Van Loc X. ; Miller Eugene J. ; Nelson Leonard E., Abrasive articles and method for the manufacture of same.
  2. Elepano Normita P. (Woodbury MN), Buffing composition.
  3. Foris ; Peter L. ; Brown ; Robert W. ; Phillips ; Jr. ; Paul S., Capsule manufacture.
  4. Foris ; Peter L. ; Brown ; Robert W. ; Phillips ; Jr. ; Paul S., Capsule manufacture.
  5. Foris Peter L. (Appleton WI) Brown Robert W. (Appleton WI) Phillips ; Jr. Paul S. (Appleton WI), Capsule manufacture.
  6. Henry James M. (McEwen TN), Cleaning cloth composition.
  7. Busch ; Jr. Francis W. (Southbury CT) Pallone Thomas J. (Monroe CT) Berube Gene R. (Cheshire CT) Vyas Ambrish H. (Greenville NC) Faryniarz Joseph R. (Ansonia CT) Russo John A. (Westport CT), Compositions, articles and methods for polishing surfaces.
  8. Charvat Vernon K. (Bay Village OH), Cushioned abrasive articles, and method of manufacture.
  9. Locko George A. (Savannah GA), Device for dispensing volatile fragrances.
  10. Wong, Michael Y. M.; Pohl, Stanley, Dye compositions.
  11. Charles J Molnar, Finishing semiconductor wafers with a fixed abrasive finishing element.
  12. Charvat ; Vernon K., Flexible polishing wheel and method for producing same.
  13. Smith, James A.; Murphy, Betty J., Floor cleaning and waxing composition.
  14. Caserta Richard T. (Lansdale PA) Zimmerman Roy E. (Lansdale PA), Grinding wheel containing dissolvable granular material.
  15. Morita Shuichi (Yatsushiro JPX) Sueoka Koji (Yatsushiro JPX) Horita Fumio (Yatsushiro JPX) Oyama Toshikatsu (Yatsushiro JPX) Isozaki Hideo (Yatsushiro JPX), Heat shrinkable polyolefin laminate film.
  16. Perry Winfield B. (Lexington MA), Honing media.
  17. Payne Charles C. (Aurora IL), Lapping slurry compositions with improved lap rate.
  18. Sung Chien-Min,TWX, Metal bond diamond tools that contain uniform or patterned distribution of diamond grits and method of manufacture thereof.
  19. Talbot Milford C. (17011 Pinehurst St. Huntington Beach CA 92647), Method and composition for an improved cleaning and polishing compound having a solid form.
  20. Kodate Tadao (2-30-1 Miyahara ; Ohmiya-Shi ; Saitama-Ken JPX), Method and composition for polishing painted surfaces.
  21. Kolinsky Jay N. (P.O. Box 300 ; 103 Old Stone Hill Rd. Pound Ridge NY 10576), Method for applying a surface treatment agent onto a surface.
  22. Kucala ; III John T., Method for cleaning exterior surfaces of automotive vehicles.
  23. Hasegawa Fumihiko,JPX ; Ohtani Tatsuo,JPX ; Kuroda Yasuyoshi,JPX ; Ichikawa Koichiro,JPX ; Inada Yasuo,JPX, Method for mirror-polishing chamfered portion of wafer and mirror-polishing apparatus.
  24. Marabella Charles P. (Woodbury MN), Method for producing microcapsules and photosensitive microcapsules produced thereby.
  25. Perry ; Kenneth E., Method of abrading or having a restricted passage surface.
  26. Johnson David E. ; Mann Lawrence J. ; Mevissen Scott M. ; Pihl Richard M. ; Roeker David C., Molded brush.
  27. Ionta Richard ; Bange Donna W. ; Johnson David E. ; Liepa Mara E. ; Pihl Richard M. ; Roeker David C., Molded brush segment.
  28. Sandvick Paul E. (Racine WI), Non-homogenized multi-surface polish compositions.
  29. Kodate Tadao (85-1 ; Nisshin-cho 1-chome Ohmiya-shi ; Saitama JPX), Plastic flexible grinding stone.
  30. Kodate Tadao,JPX, Plastic flexible grinding stone.
  31. Kurt W. Fisher, Polish and applying buffing mitt, kit and method.
  32. Conrad, Gregory S.; Besse, Michael E.; Klos, Terry J., Polish compositions for gloss enhancement, and method.
  33. Cifuentes Martin E. (Midland MI) Selley David B. (Midland MI), Polish containing derivatized amine functional organosilicon compounds.
  34. Cifuentes Martin E. (Midland County MI) Greenleaf Suzanne M. (Midland County MI), Polish containing micronized wax particles.
  35. Kasprzak Kenneth A. (Saginaw MI), Polish formulations.
  36. Healy Denis J. ; Kornhaber Harvey ; Talwar Maharaj, Polishing composition including water soluble polishing agent.
  37. Lombardo, Brian; Bajaj, Rajeev, Polishing pad with reduced moisture absorption.
  38. Knudson ; Jr. Milburn I. (Gonzales TX) Jones Thomas R. (St. Austell GB2), Process for manufacturing organoclays having enhanced gelling properties.
  39. Hoshi Yoshiyuki (Fujinomiya JPX) Matsukawa Hiroharu (Fujinomiya JPX), Process for the production of microcapsules.
  40. Frank Wang TW, Structure of a wax-polishing machine.
  41. Gupta D. V. Satyanarayana (The Woodlands TX), Surface coating composition.
  42. Miller ; III Paul D. ; Dehn Dennis L., Surface polishing applicator system and method.
  43. Miller, III, Paul David; Dehn, Dennis L., Surface polishing applicator system and method.
  44. Miller Paul David, Surface polishing method and system.
  45. Miller Paul David, Surface polishing method and system.

이 특허를 인용한 특허 (1)

  1. Kucala, John T., System and tools for removing strongly adhered foreign matter from a work surface.
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