Beam control assembly for ribbon beam of ions for ion implantation
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G21K-001/08
H01J-037/32
G21K-001/093
G21K-005/04
H01J-037/147
H01J-037/317
H01J-037/30
출원번호
US-0191364
(2014-02-26)
등록번호
US-8993979
(2015-03-31)
발명자
/ 주소
Chen, Jiong
출원인 / 주소
Advanced Ion Beam Technology, Inc.
대리인 / 주소
Morrison & Foerster LLP
인용정보
피인용 횟수 :
0인용 특허 :
16
초록▼
A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the fi
A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.
대표청구항▼
1. A beam control assembly to shape a ribbon beam of ions for ion implantation, the beam control assembly comprising: a first bar, wherein the ribbon beam has a beam width and travels in a beam direction, wherein a first dimension corresponds to the beam width and a second dimension corresponds to t
1. A beam control assembly to shape a ribbon beam of ions for ion implantation, the beam control assembly comprising: a first bar, wherein the ribbon beam has a beam width and travels in a beam direction, wherein a first dimension corresponds to the beam width and a second dimension corresponds to the beam direction of the ribbon beam, and wherein the first bar is located at a first position in the second dimension and extends into the first dimension;a first coil disposed on the first bar, wherein the first coil is the only coil disposed on the first bar, wherein the first coil includes windings of electrical wire, and wherein the first coil is fixed to a first position in the first dimension on the first bar, and wherein the first coil extends over less than the entire width of the ribbon beam in the first dimension;a second bar disposed opposite the first bar with a gap defined between the first bar and second bar, wherein the ribbon beam travels between the gap, wherein the second bar is located at a second position in the second dimension and extends into the first dimension, and wherein the first and second positions in the second dimension are different;a second coil disposed on the second bar, wherein the second coil is the only coil disposed on the second bar, wherein the second coil includes windings of electrical wire, wherein the second coil is fixed to a second position in the first dimension on the second bar, wherein the second coil extends over less than the entire width of the ribbon beam in the first dimension, and wherein the first and second positions in the first dimension are the same;a first electrical power supply connected to the first coil without being electrically connected to any other coil; anda second electrical power supply connected to the second coil without being electrically connected to any other coil. 2. The beam control assembly of claim 1, further comprising: a third bar, wherein the third bar is located at a third position in the second dimension and extends into the first dimension;a third coil disposed on the third bar, wherein the third coil is the only coil disposed on the third bar, wherein the third coil includes windings of electrical wire; anda third electrical power supply connected to the third coil without being electrically connected to any other coil. 3. The beam control assembly of claim 2, wherein the third coil is configured to move along the third bar to be located at different positions in the first dimension on the third bar. 4. The beam control assembly of claim 2, wherein the third coil is fixed to a third position in the first dimension on the third bar. 5. The beam control assembly of claim 1, wherein the first and second bars extend in the first dimension across the entire beam width. 6. The beam control assembly of claim 5, wherein the first and second bars extend from one side of the beam control assembly. 7. The beam control assembly of claim 1, wherein the first and second bars extend in the first dimension across a portion of the beam width. 8. The beam control assembly of claim 7, wherein the first bar extends from one side of the beam control assembly, and wherein the second bar extends from an opposite side of the beam control assembly as the first bar. 9. The beam control assembly of claim 1, wherein a portion of the ribbon beam adjacent to the first coil overlaps with a portion of the ribbon beam adjacent to the second coil. 10. An ion implanter to implant ions using a ribbon beam of ions, comprising: an ion source;an accelerator configured to accelerate the ion disposed adjacent to the ion source;a beam control assembly disposed adjacent to the accelerator, the beam control assembly comprising: a first bar, wherein the ribbon beam has a beam width and travels in a beam direction, wherein a first dimension corresponds to the beam width and a second dimension corresponds to the beam direction of the ribbon beam, and wherein the first bar is located at a first position in the second dimension and extends into the first dimension;a first coil disposed on the first bar, wherein the first coil is the only coil disposed on the first bar, wherein the first coil includes windings of electrical wire, and wherein the first coil is fixed to a first position in the first dimension on the first bar, and wherein the first coil extends over less than the entire width of the ribbon beam in the first dimension;a second bar disposed opposite the first bar with a gap defined between the first bar and second bar, wherein the ribbon beam travels between the gap, wherein the second bar is located at a second position in the second dimension and extends into the first dimension, and wherein the first and second positions in the second dimension are different;a second coil disposed on the second bar, wherein the second coil is the only coil disposed on the second bar, wherein the second coil includes windings of electrical wire, wherein the second coil is fixed to a second position in the first dimension on the second bar, wherein the second coil extends over less than the entire width of the ribbon beam in the first dimension, and wherein the first and second positions in the first dimension are the same;a first electrical power supply connected to the first coil without being electrically connected to any other coil; anda second electrical power supply connected to the second coil without being electrically connected to any other coil; anda target area disposed adjacent to the beam control assembly, the target area configured to position a work piece. 11. A method of controlling a ribbon beam of ions, the method comprising: applying an electrical charge to a first coil using a first electrical power supply, wherein the first electrical power supply is connected to the first coil without being electrically connected to any other coil, wherein the first coil is disposed on a first bar, wherein the ribbon beam has a beam width and travels in a beam direction, wherein a first dimension corresponds to the beam width and a second dimension corresponds to the beam direction of the ribbon beam, wherein the first bar is located at a first position in the second dimension and extends into the first dimension, wherein the first coil is the only coil disposed on the first bar, wherein the first coil includes windings of electrical wire, and wherein the first coil is fixed to a first position in the first dimension on the first bar, and wherein the first coil extends over less than the entire width of the ribbon beam in the first dimension; andapplying an electrical charge to a second coil using a second electrical power supply, wherein the second electrical power supply is connected to the second coil without being electrically connected to another other coil, wherein the second coil is disposed on a second bar, wherein the second bar is located at a second position in the second dimension and extends into the first dimension, wherein the first and second positions in the second dimension are different, wherein the second coil is the only coil disposed on the second bar, wherein the second coil includes windings of electrical wire, wherein the second coil is fixed to a second position in the first dimension on the second bar, wherein the second coil extends over less than the entire width of the ribbon beam in the first dimension, wherein the first and second positions in the first dimension are the same, and wherein the second bar is disposed opposite the first bar with a first gap defined between the first bar and second bar, and wherein the ribbon beam travels between the first gap. 12. The ion implanter of claim 10, further comprising: a third bar, wherein the third bar is located at a third position in the second dimension and extends into the first dimension;a third coil disposed on the third bar, wherein the third coil is the only coil disposed on the third bar, wherein the third coil includes windings of electrical wire; anda third electrical power supply connected to the third coil without being electrically connected to any other coil. 13. The ion implanter of claim 12, wherein the third coil is configured to move along the third bar to be located at different positions in the first dimension on the third bar. 14. The ion implanter of claim 12, wherein the third coil is fixed to a third position in the first dimension on the third bar. 15. The ion implanter of claim 10, wherein the first and second bars extend in the first dimension across the entire beam width. 16. The ion implanter of claim 15, wherein the first and second bars extend from one side of the beam control assembly. 17. The ion implanter of claim 10, wherein the first and second bars extend in the first dimension across a portion of the beam width. 18. The ion implanter of claim 17, wherein the first bar extends from one side of the beam control assembly, and wherein the second bar extends from an opposite side of the beam control assembly as the first bar. 19. The ion implanter of claim 10, wherein a portion of the ribbon beam adjacent to the first coil overlaps with a portion of the ribbon beam adjacent to the second coil.
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이 특허에 인용된 특허 (16)
Chen,Jiong; White,Nicholas R., Apparatus and methods for ion beam implantation.
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