Provided is a coating layer for cutting tools, as a hard coating layer stacked and formed in the sequence of a TiN layer, a TiCN layer, a bonding layer, an alumina (Al2O3) layer, and a cover layer from the bottom by using a chemical vapor deposition (CVD) method on a parent material, able to improve
Provided is a coating layer for cutting tools, as a hard coating layer stacked and formed in the sequence of a TiN layer, a TiCN layer, a bonding layer, an alumina (Al2O3) layer, and a cover layer from the bottom by using a chemical vapor deposition (CVD) method on a parent material, able to improve cutting performance, because surface residual stress of the coating layer may be maintained in a compressive stress state by adjusting a composition of the cover layer without using a separate additional process, such as a blasting operation, or a mixed process of CVD and physical vapor deposition (PVD), and simultaneously the cover layer may also be used as a wear-resistant layer.
대표청구항▼
1. A coating layer for cutting tools formed on a surface of a parent material by using a chemical vapor deposition (CVD) method comprising: an alumina layer formed of an α-phase, disposed on the parent material and composed of a composite structure having a columnar crystal structure and an equiaxed
1. A coating layer for cutting tools formed on a surface of a parent material by using a chemical vapor deposition (CVD) method comprising: an alumina layer formed of an α-phase, disposed on the parent material and composed of a composite structure having a columnar crystal structure and an equiaxed crystal structure mixed therein; anda cover layer formed of AlxTiySizCrwN (herein, x+y+z+w=1, x≧0.75, y≧0.2, 0≦z≦0.06, 0≦w≦0.08) and disposed on the alumina layer by a CVD method to be in a compressive stress state so that a residual stress of the alumina layer becomes compressive stress after coating the cover layer,wherein a thickness of the cover layer is in a range of 1.5 μm to 3.5 μm. 2. The coating layer for cutting tools formed on a surface of a parent material by using a CVD method of claim 1, wherein a bonding layer formed of TiCxOyNz (x+y+z=1, x,y,z>0, 0.4≦x≦0.5, 0.3≦y≦0.4, 0.15≦z≦0.25) is formed under the alumina layer by using a CVD method and the bonding layer is composed of a similar dendritic structure having a primary acicular structure grown in a thickness direction and a secondary acicular structure grown in an acicular shape on a surface of the primary acicular structure. 3. The coating layer for cutting tools formed on a surface of a parent material by using a CVD method of claim 1, wherein, among a texture coefficient (TC) of each crystal plane of the alumina layer calculated by the following Equation 1, TC(024) is 2.0 or more, TC(116) is less than 1.8, and TC(012), TC(104), TC(110), and TC(113) are all less than 1.3, TC(hkl)=I(hkl)/I0(hkl)×{(1/n)×ΣI(hkl)/I0(hkl)}−1 [Equation 1]I(hkl): diffraction intensity of a crystal planeI0(hkl): standard diffraction intensity of ASTM standard powder diffraction datan: the number of crystal planes used for calculation(hkl): (012), (104), (110), (113), (024), (116). 4. The coating layer for cutting tools formed on a surface of a parent material by using a CVD method of claim 1, wherein an upper portion of the alumina layer is doped with boron (B) at a content of 0.05 wt % or less.
Yamamoto, Kenji; Satou, Toshiki; Morikawa, Yasuomi; Hanaguri, Koji; Takahara, Kazuki, Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film.
Yamamoto, Kenji; Satou, Toshiki; Morikawa, Yasuomi; Hanaguri, Koji; Takahara, Kazuki, Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film.
Tamagaki, Hiroshi; Kohara, Toshimitsu; Sato, Toshiki, Methods of producing an alumina film mainly in alpha crystal structure and the multilayer film thereof.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.