최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
DataON 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Edison 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0419002 (2012-03-13) |
등록번호 | US-9023436 (2015-05-05) |
발명자 / 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 | 피인용 횟수 : 0 인용 특허 : 340 |
Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selec
Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selectively irradiating a first portion of the molecules on the microfeature workpiece in the reaction chamber with a selected radiation without irradiating a second portion of the molecules on the workpiece with the selected radiation. The first portion of the molecules can be irradiated to activate the portion of the molecules or desorb the portion of the molecules from the workpiece. The first portion of the molecules can be selectively irradiated by impinging the first portion of the molecules with a laser beam or other energy source.
1. A system for forming features on a microfeature workpiece by depositing materials onto a surface of the microfeature workpiece, the system comprising: a gas supply assembly having a gas source;a gas phase reaction chamber for carrying the microfeature workpiece;a gas distributor carried by the re
1. A system for forming features on a microfeature workpiece by depositing materials onto a surface of the microfeature workpiece, the system comprising: a gas supply assembly having a gas source;a gas phase reaction chamber for carrying the microfeature workpiece;a gas distributor carried by the reaction chamber and coupled to the gas supply assembly;an energy source positioned to selectively irradiate portions of the microfeature workpiece, wherein the energy source comprises a laser configured for producing a laser beam; anda controller operably coupled to the energy source and the gas supply assembly, the controller having a computer-readable medium containing instructions and configured to perform a method comprising—depositing a monolayer or approximately a monolayer of molecules of a gas onto the microfeature workpiece in the reaction chamber, wherein the molecules of the gas comprise a plurality of first molecules of a first gas;selectively irradiating a first portion of the first molecules on the microfeature workpiece in the reaction chamber with a laser beam having a selected radiation without irradiating a second portion of the first molecules on the workpiece with the selected radiation, wherein selectively irradiating the first portion comprises desorbing the first portion of the first molecules from the workpiece;depositing second molecules of a second gas onto the second portion of the first molecules, wherein the first gas and the second gas have different compositions; andrepeating the depositing and selectively irradiating to form a feature on the workpiece. 2. The system of claim 1, further comprising a positioning device coupled to the laser, wherein the positioning device is configured to move the laser to selectively direct the laser beam toward the first portion of the microfeature workpiece. 3. The system of claim 1, further comprising a reflector positioned in the path of the laser beam to reflect the laser beam toward the microfeature workpiece. 4. The system of claim 1 wherein the system further comprises: a reflector positioned in the path to reflect the laser beam toward the microfeature workpiece; anda positioning device coupled to the reflector for moving the reflector so that the reflector directs the laser beam toward the first portion of the microfeature workpiece. 5. The system of claim 1 wherein the system further comprises: a workpiece support for carrying the microfeature workpiece; anda positioning device coupled to the workpiece support for moving the support to align the microfeature workpiece with the laser beam. 6. The system of claim 5 wherein the workpiece support is further configured to heat the workpiece to a desired temperature during operation. 7. The system of claim 1 wherein the gas source of the gas supply assembly comprises a first gas source configured to supply the first gas, and wherein the gas supply assembly further comprises a second gas source configured to provide the second gas. 8. The system of claim 7 wherein the first gas comprises a first precursor and the second gas comprises a second precursor. 9. The system of claim 8 wherein the gas supply assembly further comprises a third gas source configured to provide a third gas, and wherein the third gas comprises a purge gas.
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