An inorganic nanolayer surface coated polymer film product is disclosed with enhancements such as improved metallization capability, low cost, low polymer additives and modifiers, improved recyclability, and good web properties. Also method for priming a flexible film substrate to enhance the reacti
An inorganic nanolayer surface coated polymer film product is disclosed with enhancements such as improved metallization capability, low cost, low polymer additives and modifiers, improved recyclability, and good web properties. Also method for priming a flexible film substrate to enhance the reactivity or wettability of the substrate for metallization is disclosed. A substrate film is coated with one or more nanolayers of a metal or metal oxide applied by CCVD and/or PECVD at open atmosphere. The deposited coating acts to enhance the surface energy of the film substrate and to and reduce the surface gauge variation of the substrate or supporting film, thereby enhancing the wettability of the film substrate for metallization and/or to improve the anti-block characteristics of the film. The deposited coatings may also act as a barrier layer for lowering the permeability of light, gas and vapor transmission through the substrate.
대표청구항▼
1. A method comprising: a) forming a coextruded organic film substrate by a co-extrusion process;b) depositing a first inorganic nanocoating layer directly on to a surface of the film substrate at open atmosphere to enhance the wettability of the film substrate for metallization, wherein the first i
1. A method comprising: a) forming a coextruded organic film substrate by a co-extrusion process;b) depositing a first inorganic nanocoating layer directly on to a surface of the film substrate at open atmosphere to enhance the wettability of the film substrate for metallization, wherein the first inorganic nanocoating layer is silica, and wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate prior to all winding and deposited in a process that is inline with the coextrusion process, wherein the inorganic nanocoating layer is less than 8 nm in average thickness; and wherein the surface roughness of the inorganic nanocoating layer is characterized by root mean square value of less than about 5 nm; andc) depositing a metal layer directly on the first inorganic nanocoating layer by a vacuum metallization process to produce a coated film substrate, wherein the metal layer is not a metal oxide layer, wherein the metal layer is aluminum, and wherein the metal layer has a thickness from about 5 to about 50 nm. 2. The method of claim 1 wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate by combustion chemical vapor deposition. 3. The method of claim 1 wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate by plasma enhanced chemical vapor deposition. 4. The method of claim 1 wherein the inorganic nanocoating layer is substantially deposited by redirection of a flame. 5. The method of claim 1 wherein the inorganic nanocoating layer is substantially deposited by electro-redirection of a plasma field. 6. The method of claim 1 wherein the film substrate is a cast, monoaxially, or biaxially oriented cast film. 7. The method of claim 1 wherein the film substrate is a blown film. 8. The method of claim 1 wherein the film substrate is a biaxial film. 9. The method of claim 1 wherein the film substrate is a bio-based polymer film. 10. The method of claim 1 wherein the film substrate comprises a core polymer layer selected from the group consisting of polyethylene, polypropylene, polystyrene, polylactic acid, polyethylene terephthalate, polyesters, and copolymers thereof and mixtures thereof. 11. The method of claim 1 wherein the coated film substrate has a moisture vapor transmission rate of 2.0 g/m2/day or less. 12. The method of claim 1 wherein the coated film substrate has an oxygen transmission rate of 10 cc/m2·day or less. 13. The method of claim 1 wherein at least one additional inorganic nanocoating layer is applied to form a transparent barrier layer. 14. The method of claim 1, wherein between the depositing a first inorganic nanocoating layer step and the depositing a metal layer step, the coated film substrate is wound. 15. A method comprising: a) forming a coextruded organic film substrate by a co-extrusion process;b) depositing a first inorganic nanocoating layer directly on to a surface of the film substrate at open atmosphere to substantially inhibit blocking of the film substrate, wherein the first inorganic nanocoating layer is silica, and wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate prior to all winding and deposited in a process that is inline with the coextrusion process, wherein the inorganic nanocoating layer is less than 8 nm in average thickness; and wherein the surface roughness of the inorganic nanocoating layer is characterized by a root mean square value of less than about 5 nm; andc) depositing a metal layer directly on the first inorganic nanocoating layer by a vacuum metallization process, wherein the metal layer is not a metal oxide layer, wherein the metal layer is aluminum, and wherein the metal layer has a thickness from about 5 to about 50 nm. 16. The method of claim 15 wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate by combustion chemical vapor deposition. 17. The method of claim 15 wherein the inorganic nanocoating layer is substantially deposited on to at least one surface of the film substrate by plasma enhanced chemical vapor deposition. 18. The method of claim 15 wherein the inorganic nanocoating layer is substantially deposited by redirection of a flame. 19. The method of claim 15 wherein the inorganic nanocoating layer is substantially deposited by electro-redirection of a plasma field. 20. The method of claim 15 wherein the inorganic nanocoating layer is substantially deposited on to at least one surface of the film substrate prior to lamination. 21. The method of claim 15 wherein the film substrate is a cast, monoaxially, or biaxially oriented cast film. 22. The method of claim 15 wherein the film substrate is a blown film. 23. The method of claim 15 wherein the film substrate is a bio-based polymer film. 24. The method of claim 15 wherein the film substrate comprises a core polymer layer selected from the group consisting of polyethylene, polypropylene, polystyrene, polylactic acid, polyethylene terephthalate, polyesters, and copolymers thereof and mixtures thereof. 25. The method of claim 15, wherein between the depositing a first inorganic nanocoating layer step and the depositing a metal layer step, the coated film substrate is wound.
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