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RF plasma reactor having a distribution chamber with at least one grid

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/507
  • C23C-016/509
  • H01J-001/00
  • C23F-001/00
  • C23C-016/455
  • H01J-037/32
  • C23C-016/06
  • C23C-016/22
출원번호 US-0877419 (2007-10-23)
등록번호 US-9045828 (2015-06-02)
발명자 / 주소
  • Turlot, Emmanuel
  • Chevrier, Jean-Baptiste
  • Schmitt, Jacques
  • Barreiro, Jean
출원인 / 주소
  • TEL Solar AG
대리인 / 주소
    Crowell & Moring LLP
인용정보 피인용 횟수 : 1  인용 특허 : 69

초록

A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extend

대표청구항

1. A plasma reactor comprising a reactor vessel and therein a pair of electrodes consisting of spaced apart and oppositely disposed metallic surfaces defining a plasma discharge space, at least one of said metallic surfaces being the surface of a metallic plate having a multitude of gas feed opening

이 특허에 인용된 특허 (69)

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이 특허를 인용한 특허 (1)

  1. Shah, Kartik; Prasad, Chaitanya A.; Bautista, Kevin Joseph; Tobin, Jeffrey; Kelkar, Umesh M.; Hawrylchak, Lara, Showerhead design.
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