Refractory object, glass overflow forming block, and process for glass object manufacture
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C04B-035/101
C03B-017/06
C04B-035/626
출원번호
US-0417118
(2012-03-09)
등록번호
US-9073773
(2015-07-07)
발명자
/ 주소
Citti, Olivier
Kazmierczak, Andrea
출원인 / 주소
SAINT-GOBAIN CERAMICS & PLASTICS, INC.
대리인 / 주소
Able Law Group, LLP
인용정보
피인용 횟수 :
3인용 특허 :
29
초록▼
A refractory object can include at least 10 wt % Al2O3. In an embodiment, the refractory object can further include a dopant including an oxide of a rare earth element, Ta, Nb, Hf, or any combination thereof. In another embodiment, the refractory object may have a property such that the averaged gra
A refractory object can include at least 10 wt % Al2O3. In an embodiment, the refractory object can further include a dopant including an oxide of a rare earth element, Ta, Nb, Hf, or any combination thereof. In another embodiment, the refractory object may have a property such that the averaged grain size does not increase more than 500% during sintering, an aspect ratio less than approximately 4.0, a creep rate less than approximately 1.0×10−5 μm/(μm×hr), or any combination thereof. In a particular embodiment, the refractory object can be in the form of a refractory block or a glass overflow forming block. The glass overflow forming block can be useful in forming an Al—Si—Mg glass sheet. In a particular embodiment, a layer including Mg—Al oxide can initially form along exposed surfaces of the glass overflow forming block when forming the Al—Si—Mg glass sheet.
대표청구항▼
1. A refractory object used in forming a glass object, wherein the refractory object comprises: at least 97 wt % Al2O3;at least 0.5 wt % and not greater than 3 wt % of a first dopant including Ta2O5;a second dopant including Zr, Hf, Y, Sc, Yb, Pr, Sm, Gd, La, Ce, Dy, or any combination thereof; andn
1. A refractory object used in forming a glass object, wherein the refractory object comprises: at least 97 wt % Al2O3;at least 0.5 wt % and not greater than 3 wt % of a first dopant including Ta2O5;a second dopant including Zr, Hf, Y, Sc, Yb, Pr, Sm, Gd, La, Ce, Dy, or any combination thereof; andnot greater than 0.5 wt. % TiO2. 2. The refractory object according to claim 1, wherein the amount of the first dopant is sufficient to keep an averaged grain size from increasing more than approximately 300% during a sintering operation. 3. The refractory object according to claim 1, wherein the refractory object includes grains in a size distribution having a plurality of modes, wherein a first mode includes a first set of grains having a first averaged grain size of at least approximately 0.5 μm. 4. The refractory object according to claim 3, wherein the size distribution has a second mode including a second set of grains having a second averaged grain size no greater than approximately 20 μm. 5. The refractory object according to claim 1, wherein a creep rate of the refractory object is no greater than approximately 1.0×10−5 μm/(μm×hr) as measured at a pressure of 2 MPa and a temperature of 1275° C. 6. A refractory object used in forming a glass object, the refractory object comprises: at least 93% by weight Al2O3;at least 0.5% by weight and not greater than 5% by weight of Ta2O5;a second dopant including Zr, Hf, Y, Sc, Yb, Pr, Sm, Gd, La, Ce, Dy, or any combination thereof; andnot greater than 0.5 wt. % TiO2;wherein the refractory object has a property including: a percentage of grains of the refractory object having an aspect ratio of at least 2.0 is no greater than approximately 30%; anda percentage area occupied by the grains having an aspect ratio of at least 2.0 is no greater than approximately 30%. 7. The refractory object according to claim 6, wherein: a D10 value of the aspect ratio is no greater than approximately 1.2;a D50 value of the aspect ratio is no greater than approximately 1.6;a D90 value of the aspect ratio is no greater than approximately 2.7; orany combination thereof. 8. The refractory object according to claim 6, wherein: a D10 value of a size of the grains is no greater than approximately 40 μm;a D50 value of a size of the grains is no greater than approximately 60 μm;a D90 value of a size of the grains is no greater than approximately 90 μm;or any combination thereof. 9. The refractory object according to claim 6, wherein the refractory object has a porosity of at least approximately 0.1 vol % and no greater than approximately 5.0 vol %.
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