Preloaded dual purpose cleaning and sanitizing wipe
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C11D-001/37
C11D-003/48
C11D-017/04
C11D-007/32
C11D-007/50
출원번호
US-0449021
(2014-07-31)
등록번호
US-9096821
(2015-08-04)
발명자
/ 주소
Hope, Janiece
Falk, Nancy A.
Zhang, Wenyu
Heymann, Jared
Knock, Mona Marie
Kinsinger, Mike
Hill, Bernard
Ananth, Vidya
출원인 / 주소
The Clorox Company
대리인 / 주소
Collins, Erin
인용정보
피인용 횟수 :
1인용 특허 :
58
초록▼
The invention relates to preloaded cleaning and sanitizing wipes comprising a nonwoven substrate, and a cleaning formulation loaded onto or within the nonwoven substrate. The cleaning composition may include about 0.001% to about 10% by weight of an antimicrobial compound comprising a quaternary amm
The invention relates to preloaded cleaning and sanitizing wipes comprising a nonwoven substrate, and a cleaning formulation loaded onto or within the nonwoven substrate. The cleaning composition may include about 0.001% to about 10% by weight of an antimicrobial compound comprising a quaternary ammonium compound, less than about 4% by weight of an alcohol solvent containing a single hydroxyl group, a preservative, about 0.05% to about 10% by weight of a glycol solvent (e.g., preferably a glycol ether solvent), about 0.05% to about 10% of one or more surfactants, and water. The composition may have a pH from about 4 to about 8.
대표청구항▼
1. A preloaded cleaning and sanitizing wipe comprising: (A) a nonwoven substrate;(B) a cleaning composition loaded onto or within said nonwoven substrate, said cleaning composition consisting of; (a) about 0.001-10.0% by weight of a quaternary ammonium compound; and(b) about 0.05%-4% by weight of an
1. A preloaded cleaning and sanitizing wipe comprising: (A) a nonwoven substrate;(B) a cleaning composition loaded onto or within said nonwoven substrate, said cleaning composition consisting of; (a) about 0.001-10.0% by weight of a quaternary ammonium compound; and(b) about 0.05%-4% by weight of an alcohol solvent containing a single hydroxyl group;(c) about 0.01-10% by weight of a glycol solvent selected from the group consisting of: diethylene glycol, triethylene glycol, propylene glycol, tripropylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether and any combinations or mixtures thereof;(d) about 0.01-10% by weight of one or more anionic surfactants;(e) optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, builders, stabilizers, defoamers, thickeners, hydrotropes, biocide release agents, water, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, nonionic surfactants, amphoteric surfactants and preservatives; and(f) water. 2. A cleaning and sanitizing wipe according to claim 1, wherein said quaternary ammonium compound is selected from the group consisting of: benzethonium chloride, benzalkonium chloride, methylbenzethonium chloride, and any combinations or mixtures thereof. 3. A cleaning and sanitizing wipe according to claim 1, wherein said anionic surfactant is selected from the group consisting of: sulfates, sulfonates, disulfonates, carboxylates, sulfosuccinates, isethionates, glutamates sarcosinates, ether derivatives, and any combinations or mixtures thereof. 4. A cleaning and sanitizing wipe according to claim 1, wherein said cleaning composition comprises an amphoteric surfactant selected from the group consisting of: amine oxides, betaines, imidazoline derivatives, glycinates, propionates, and amino propionic acids, and any combinations, derivatives, or mixtures thereof. 5. A cleaning and sanitizing wipe according to claim 1, wherein said cleaning composition comprises about 0.05-1% by weight of an alcohol solvent containing a single hydroxyl group selected from the group consisting of: ethanol, isopropanol, n-propanol, butanol, and any mixtures or combinations thereof. 6. A cleaning and sanitizing wipe according to claim 1, wherein said glycol solvent is selected from the group consisting of: diethylene glycol, triethylene glycol, propylene glycol, tripropylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether and any combinations or mixtures thereof. 7. A cleaning and sanitizing wipe according to claim 1, wherein said cleaning composition comprises a nonionic surfactant selected from the group consisting of: ethoxylates, propoxylates, glycosides, esters, amides, and any combinations or mixtures thereof. 8. A cleaning and sanitizing wipe according to claim 1, wherein said cleaning composition contains a preservative is selected from the group consisting of: iodopropynyl butylcarbamate, phenoxyethanol, chlorphenesin, gluconolactone and any mixtures or combinations thereof. 9. A cleaning and sanitizing wipe comprising: (A) a nonwoven substrate;(B) a cleaning composition loaded onto or within said nonwoven substrate, said cleaning composition consisting of; (a) about 0.001-10% by weight of an antimicrobial compound comprising a quaternary ammonium compound;(b) about 0.05%-4% by weight of an alcohol solvent containing a single hydroxyl group;(c) a preservative selected from the group consisting of: iodopropynyl butylcarbamate, phenoxyethanol, chlorphenesin, gluconolactone and any mixtures or combinations thereof;(d) about 0.01-10% of a glycol ether solvent;(e) an anionic surfactant;(f) optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, builders, stabilizers, defoamers, thickeners, hydrotropes, biocide release agents, water, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, nonionic surfactants, and amphoteric surfactants; and(g) water. 10. A cleaning and sanitizing wipe according to claim 9, wherein said quaternary ammonium compound is selected from the group consisting of: benzethonium chloride, benzalkonium chloride and any combinations or mixtures thereof. 11. A cleaning and sanitizing wipe according to claim 9, wherein said anionic surfactant is selected from the group consisting of: sulfates, sulfonates, disulfonates, carboxylates, sulfosuccinates, isethionates, glutamates, sarcosinates, and any combinations or mixtures thereof. 12. A cleaning and sanitizing wipe according to claim 9, wherein said anionic surfactant is selected from the group consisting of: sodium lauryl sulfate, ammonium lauryl sulfate, sodium laureth sulfate, ammonium laureth sulfate, sodium coco-sulfate, ammonium cocoyl isethionate, sodium cocoyl isethionate, disodium cocoyl glutamate, sodium lauryl glucose carboxylate, sodium dodecyl sulfate, sodium lauryl ether sulfate, sodium myreth sulfate, and any combinations or mixtures thereof. 13. A cleaning and sanitizing wipe according to claim 9, wherein said cleaning composition comprises an amphoteric surfactant selected from the group consisting of: amine oxides, betaines, imidazoline derivatives, glycinates, propionates, amino propionic acids, and any combinations or mixtures thereof. 14. A cleaning and sanitizing wipe according to claim 9, wherein said glycol ether solvent is selected from the group consisting of: diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether and any combinations or mixtures thereof. 15. A cleaning and sanitizing wipe according to claim 9, wherein said an anionic surfactant is selected from the group consisting of: sulfates, sulfonates, disulfonates, carboxylates, sulfosuccinates, isethionates, glutamates sarcosinates, ether derivatives, and any combinations or mixtures thereof. 16. A method of using a cleaning and sanitizing wipe to clean skin and a hard surface comprising the steps of: (A) providing a user with a pre-loaded nonwoven substrate loaded with a cleaning composition consisting of: (a) about 0.05-0.5% by weight of a quaternary ammonium compound;(b) about 0.05-1% by weight of an alcohol solvent;(c) a preservative;(d) about 0.05-5% of one or more glycol solvents;(e) optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, buffers, builders, stabilizers, defoamers, thickeners, hydrotropes, biocide release agents, water, anti-microbial compounds, enzymes, bleaching agents, cloud point modifiers, nonionic surfactants, anionic surfactants and amphoteric surfactants; and(e) water;(B) contacting the skin with the pre-loaded substrate to sanitize the skin;(C) allowing the sanitized area of the skin to dry; and(D) wiping one or more hard surfaces with the pre-loaded substrate. 17. The method according to claim 16, wherein said quaternary ammonium compound is selected from the group consisting of: benzethonium chloride, benzalkonium chloride and any combinations or mixtures thereof. 18. The method according to claim 16, wherein said glycol solvent is selected from the group consisting of: diethylene glycol, triethylene glycol, propylene glycol, tripropylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether and any combinations or mixtures thereof. 19. The method according to claim 16, wherein said preservative is selected from the group consisting of: iodopropynyl butylcarbamate, phenoxyethanol, chlorphenesin, gluconolactone and any mixtures or combinations thereof.
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이 특허에 인용된 특허 (58)
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