[특허]Methods for cleaning distilling columns

Methods for cleaning distilling columns 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C07C-041/42 B01D-003/34 C23G-001/02 F28G-009/00 B08B-003/04
출원번호	US-0705956 (2010-02-15)
등록번호	US-9102604 (2015-08-11)
발명자 / 주소	Rozov, Leonid A. Kudzma, Linas Lee, Hong-Chang Bell, Ronald
출원인 / 주소	BAXTER INTERNATIONAL INC.
대리인 / 주소	Marshall, Gerstein & Borun LLP
인용정보	피인용 횟수 : 0 인용 특허 : 25

초록

A method for cleaning a distilling column includes providing a distilling column including a packing containing nickel and adding hydrochloric acid to the distilling column to wash at least a portion of the packing, thereby cleaning the distilling column.

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1. A method for cleaning a distilling column comprising: providing a distilling column including a packing comprising nickel;adding hydrochloric acid to the distilling column to wash at least a portion of the packing, thereby cleaning the distilling column; and,distilling at least one sample containing sevoflurane in the distilling column before adding the hydrochloric acid. 2. The method according to claim 1, wherein the packing comprises a nickel-containing alloy. 3. The method according to claim 1, wherein the packing comprises at least 30 weight percent nickel. 4. The method according to claim 1, wherein the packing comprises a nickel containing alloy comprising at least one element selected from the group consisting of molybdenum, chromium, cobalt, and iron. 5. The method according to claim 1, wherein the packing comprises nickel metal. 6. The method according to claim 1, wherein the hydrochloric acid has a concentration between about 0.02 molar and about 0.50 molar. 7. The method according to claim 1, wherein the hydrochloric acid has a concentration between about 0.03 molar and about 0.30 molar. 8. The method according to claim 1, wherein the hydrochloric acid has a concentration between about 0.05 molar and about 0.20 molar. 9. A method for cleaning a distilling column comprising: providing a distilling column including a packing comprising nickel;adding hydrochloric acid to the distilling column to wash at least a portion of the packing, thereby cleaning the distilling column; and,distilling at least one sample containing sevoflurane in the distilling column after adding the hydrochloric acid. 10. A method for distilling sevoflurane comprising: adding at least one sample containing sevoflurane to a distilling column, said distilling column including a packing comprising nickel;distilling the sample to obtain purified sevoflurane;washing at least a portion of the packing with hydrochloric acid;adding at least one additional sample containing sevoflurane to the distilling column; and,distilling the additional sample to obtain additional purified sevoflurane. 11. The method according to claim 10, wherein the washing includes adding to the distilling column a quantity of the hydrochloric acid sufficient to submerge a portion of the packing. 12. The method according to claim 11, further comprising draining the acid from the distilling column. 13. The method according to claim 12, further comprising adding a base to the distilling column after the washing step. 14. The method according to claim 13, further comprising adding to the distilling column a quantity of water sufficient to submerge the portion of the packing after the washing step. 15. The method according to claim 14, further comprising draining the water, and adding additional water to the distilling column when the drained water is acidic. 16. The method according to claim 10, wherein the washing step is performed after analysis of the purified sevoflurane demonstrates unacceptable levels of at least one of hexafluoroisopropanol and acidity. 17. The method according to claim 10, wherein the packing is contaminated with deposits prior to the washing step. 18. The method according to claim 10, wherein the packing comprises a nickel-containing alloy. 19. The method according to claim 10, wherein the packing comprises at least 30 weight percent nickel. 20. The method according to claim 10, wherein the packing comprises a nickel containing alloy comprising at least one element selected from the group consisting of molybdenum, chromium, cobalt, and iron. 21. The method according to claim 10, wherein the packing comprises nickel metal. 22. The method according to claim 10, wherein the hydrochloric acid has a concentration between about 0.02 molar and about 0.50 molar. 23. The method according to claim 10, wherein the hydrochloric acid has a concentration between about 0.03 molar and about 0.30 molar. 24. The method according to claim 10, wherein the hydrochloric acid has a concentration between about 0.05 molar and about 0.20 molar.

이 특허에 인용된 특허 (25)

Godbille Etienne (Villemonble FRX), Apparatus to concentrate solutions and to recover solvents.
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Jones,Barry; Khrimian,Ashot; Swinson,Joel; Cross,Paul, Chromatographic method for the analysis of both in process and finished sevoflurane.
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Flament-Garcia, Mary Jane; Cromack, Keith R.; Loffredo, David; Raghavan, Rajagopalan; Ramsay, George M.; Speicher, Earl R., Container for an inhalation anesthetic.
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Kennedy ; Jr. Weldon C. (Tulsa OK), Corrosion inhibitors for cleaning solutions.
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le Grand Ferdinand (Gainesville FL) Odio Carlos E. (Clearwater FL), Distillation column.
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Bieniarz Christopher ; Chang Steve H. ; Cromack Keith R. ; Huang Shuyen L. ; Kawai Toshikazu,JPX ; Kobayashi Manami,JPX ; Loffredo David ; Raghavan Rajagopalan ; Speicher Earl R. ; Stelmach Honorate , Fluoroether compositions and methods for inhibiting their degradation in the presence of a Lewis acid.
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Bieniarz Christopher ; Chang Steve H. ; Cromack Keith R. ; Huang Shuyen L. ; Kawai Toshikazu,JPX ; Kobayashi Manami,JPX ; Loffredo David ; Raghavan Rajagopalan ; Speicher Earl R. ; Stelmach Honorate , Fluoroether compositions and methods for inhibiting their degradation in the presence of a Lewis acid.
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Bieniarz, Christopher; Chang, Steve H.; Cromack, Keith R.; Huang, Shuyen L.; Kawai, Toshikazu; Kobayashi, Manami; Loffredo, David; Raghavan, Rajagopalan; Speicher, Earl R.; Stelmach, Honorats A., Fluoroether compositions and methods for inhibiting their degradation in the presence of a Lewis acid.
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Christopher Bieniarz ; Steve H. Chang ; Keith R. Cromack ; Shuyen L. Huang ; Toshikazu Kawai JP; Manami Kobayashi JP; David Loffredo ; Rajagopalan Raghavan ; Earl R. Speicher ; Honorate A. S, Fluoroether compositions and methods for inhibiting their degradation in the presence of a Lewis acid.
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Kawai Toshikazu (Tsurugashima JPX) Yoshimura Takaaki (Ube JPX) Watanabe Mineo (Kawagoe JPX) Kamakura Manami (Miyoshi JPX), Gas chromatographic analysis of fluoromethyl-1,1,1,3,3,3-hexafluoroisopropyl ether.
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Terrell Ross C., Method for the preparation of sevoflurane.
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Kawai Toshikazu,JPX ; Watanabe Mineo,JPX, Method of producing fluoromethyl 1,1,1,3,3,3-hexafluoroisopropyl ether.
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Kawai Toshikazu (Kawagoe JPX) Yoshimura Takaaki (Kawagoe JPX) Kumakura Manami (Kawagoe JPX) Watanabe Mineo (Kawagoe JPX), Method of purifying fluoromethyl-1,1,1,3,3,3-hexafluoroisopropyl ether.
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Coon Clifford L. (Fremont CA) Simon Robert L. (San Carlos CA), Method of synthesizing fluoromethylhexafluoroisopropyl ether.
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Grant Donald C. (Excelsior MN), Point-of-use recycling of wafer cleaning substances.
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Chang Steve H. ; Cromack Keith R. ; Flament-Garcia Mary Jane ; Garapolo Joan ; Loffredo David ; Raghavan Rajagopalan ; Ramsay George M. ; Rice Patrick ; Setesak Jeffrey, Polymethylpentene container for an inhalation anesthetic.
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Lemmens,Joannes Albertus Wilhelmus J. A. W.; Smeets,Theodorus Maria T. M.; Brandts,Paul Maria P. M.; Ceyssens,Koen Harry Maria K. H. M., Process for purifying caprolactam.
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Martin John S. (Northwich GB2) Ryan Thomas A. (Kelsall GB2) Spooncer Rachel A. (Manley GB3), Process for the production of bis(fluoromethyl)ether and difluoromethane.
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Heubusch Henry P. (Buffalo NY), Treatment of stainless steel apparatus used in the manufacture, transport or storage of nitrogen oxides.
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