초록 ▼

A substrate processing system including a processing section arranged to hold a processing atmosphere therein, a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell being configured to allow the internal volume to be

A substrate processing system including a processing section arranged to hold a processing atmosphere therein, a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell being configured to allow the internal volume to be pumped down to a predetermined vacuum pressure that is different than an exterior atmosphere outside the substrate processing system, and a load port communicably connected to the processing section to isolate the processing atmosphere from the exterior atmosphere, the load port being configured to couple with the carrier to pump down the internal volume of the carrier and to communicably connect the carrier to the processing section, for loading the substrate into the processing section through the load port.

대표청구항 ▼

1. A substrate processing system comprising: a processing section arranged to hold a processing vacuum therein, the processing vacuum corresponding to at least one vacuum process from the group of material deposition, ion implantation, etching and lithography;a carrier having a shell forming an inte

1. A substrate processing system comprising: a processing section arranged to hold a processing vacuum therein, the processing vacuum corresponding to at least one vacuum process from the group of material deposition, ion implantation, etching and lithography;a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell having first and second carrier registration features and being configured to allow the internal volume to be pumped down to the processing vacuum, corresponding to the at least one vacuum process from the group of material deposition, ion implantation, etching and lithography, that is different than an exterior atmosphere outside both the substrate processing system and the carrier; anda load port communicably connected to the processing section to isolate the processing vacuum from the exterior atmosphere, the load port having a first carrier interface having first registration features configured to form a first kinematic coupling with the first carrier registration features for coupling the carrier to the first carrier interface,a second carrier interface arranged at an angle in relation to the first carrier interface, the second carrier interface having second registration features configured to form a second kinematic coupling with the second carrier registration features for coupling the carrier to the second carrier interface,wherein the second registration features are configured to allow movement of the carrier relative to the second carrier interface when the carrier is coupled by the second kinematic coupling to the second carrier interface so that the second carrier registration features allow coupling of the first registration features with the first carrier registration features, andwherein a coupling between the load port carrier includes a coupling between a vacuum source generating the processing vacuum, corresponding to the at least one vacuum process from the group of material deposition, ion implantation, etching and lithography, and the carrier to pump down the internal volume of the carrier where the load port communicably connects the carrier to the processing section, for loading the substrate into the processing section through the load port and the processing vacuum, corresponding to the at least one vacuum process from the group of material deposition, ion implantation, etching and lithography, extends from the internal volume of the carrier to the processing section. 2. The substrate processing system of claim 1, wherein the processing vacuum is a pressure of a processing atmosphere. 3. The substrate processing system of claim 1, wherein the processing system is configured for transporting substrates directly from the carrier to the processing section in a vacuum environment. 4. The substrate processing system of claim 1, wherein the load port is further configured to introduce a gas into the internal volume for pressurizing the carrier. 5. The substrate processing system of claim 1, further comprising a carrier station apart from the load port, the carrier station being configured to pump down the carrier to the processing vacuum or pressurize the carrier through an introduction of gas. 6. The substrate processing system of claim 1, wherein at least the shell of the carrier is constructed of a metal. 7. The substrate processing system of claim 1, wherein the shell of the carrier includes reinforcing ribs on one or more sides of the shell. 8. The substrate processing system of claim 1, further comprising a transport module communicably connecting the load port to the processing section, the transport module comprising an internal passage formed between the carrier and the processing section wherein the internal passage is a substantially contaminant free environment. 9. The substrate processing system of claim 8, further comprising a movable cart configured to traverse the internal passage and hold substrates for transfer through the transport module. 10. The substrate processing system of claim 9, wherein the movable cart includes a transfer arm configured to transfer at least one substrate directly between the carrier and the processing section. 11. The substrate processing system of claim 9, further comprising a transfer module connecting the transport module to the processing section, the transfer module include a transfer arm configured to hold at least one substrate and to transfer the at least one substrate from the movable cart to the processing section. 12. The substrate processing system of claim 8, wherein a pressure of the carrier and internal passage are the same as a pressure of the processing section. 13. The processing system of claim 1, wherein the carrier comprises a portable gas supply, the portable gas supply being configured to maintain a predetermined pressure within the carrier during transport and/or storage of the carrier. 14. The substrate processing system of claim 1, wherein the load port includes the vacuum source. 15. A substrate processing system comprising: a processing section arranged to hold a processing vacuum therein;a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell having first and second carrier registration features and being configured to allow the internal volume to be pumped down to the processing vacuum that is different than an exterior atmosphere outside both the substrate processing system and the carrier; anda load port communicably connected to the processing section to isolate the processing vacuum from the exterior atmosphere, the load port being configured to couple with the carrier where a coupling between the load port and carrier includes a coupling between a vacuum source generating the processing vacuum and the carrier to pump down the internal volume of the carrier where the load port communicably connects the carrier to the processing section, for loading the substrate into the processing section through the load port and the processing vacuum extends from the internal volume of the carrier to the processing section;wherein the carrier is configured to hold at least one substrate in a predetermined substrate plane for transport to the processing section, the carrier having a closable opening on a side of the carrier oriented at an angle relative to the substrate plane so that the angle of the closable opening crosses the substrate plane; and the load port comprisesa first carrier interface having first registration features configured to form a first kinematic coupling with the first carrier registration features for coupling the carrier to the first carrier interface,a second carrier interface arranged at the angle, which is angled in relation to the first carrier interface, the second carrier interface having second registration features configured to form a second kinematic coupling with the second carrier registration features for coupling the carrier to the second carrier interface, the second registration features being configured to engage the side of the carrier oriented at the angle and effect repeatable positioning of the carrier to the load port independent of a closure of the closable opening,wherein the second registration feature are configured to allow movement of the carrier relative to the second carrier interface when the carrier is coupled to the second kinematic coupling to the second carrier interface so that the second carrier registration features allow coupling of the first registration features with the first carrier registration features. 16. A substrate processing system comprising: a carrier for holding substrates therein, the carrier having first and second carrier registration features; anda load port configured to communicably connect the carrier to a processing section of the substrate processing system, the load port comprising, a first carrier interface having first registration features configured such as to form a first kinematic coupling with the first carrier registration features for coupling the carrier to the first carrier interface, anda second carrier interface arranged at an angle in relation to the first carrier interface, the second carrier interface having second registration features configured such as to form a second kinematic coupling with the second carrier registration features for coupling the carrier to the second carrier interface;wherein the second registration features are configured to allow movement of the carrier relative to the second carrier interface when the carrier is coupled by the second kinematic coupling to the second carrier interface so that the second carrier registration features allow coupling of the first registration features with the first carrier registration features. 17. The substrate processing apparatus of claim 16, wherein the second carrier interface includes a movable shuttle configured to transport the carrier towards the first carrier interface and relative movement between the carrier and the movable shuttle effects a transfer of registration of the carrier from the second carrier interface to the first carrier interface. 18. The substrate processing system of claim 17, wherein the first carrier interface is configured to engage the carrier and cause the relative movement between the carrier and second carrier interface.