Systems and methods to prevent back-flash in an abatement system
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F23D-014/82
B01D-053/38
F23G-007/06
B01D-053/18
B01D-053/78
F23G-005/50
출원번호
US-0269967
(2014-05-05)
등록번호
US-9138679
(2015-09-22)
발명자
/ 주소
Messineo, Daniel L.
LoBianco, Robert T.
Johnsgard, Mark W.
출원인 / 주소
Airgard, Inc.
대리인 / 주소
Gard & Kaslow LLP
인용정보
피인용 횟수 :
0인용 특허 :
4
초록▼
Abatement systems are used to remove harmful pollutants resulting from manufacturing processes. Prior art abatement systems can dangerously back-flash due to, for example, changes in gas velocity and if the inlets become constricted due to clogs. To prevent back-flash a sprayer is introduced to an i
Abatement systems are used to remove harmful pollutants resulting from manufacturing processes. Prior art abatement systems can dangerously back-flash due to, for example, changes in gas velocity and if the inlets become constricted due to clogs. To prevent back-flash a sprayer is introduced to an inlet of the abatement system. The sprayer sprays a volume of a cooling liquid, such as water, into the inlet. In the event of a back-flash, the liquid can extinguish the flame, preventing further damage to the abatement system. The sprayed liquid can provide further benefits, such as cooling the incoming, mitigating effects of reactions within the cooling gases, and flushing away solid particles that would otherwise clog the inlet. These further benefits can allow the abatement system to safely handle additional gases and larger volumes of incoming gas.
대표청구항▼
1. An abatement system comprising: a main burner nozzle mounted at a superior end of a reaction chamber;an inlet chamber forming an annulus surrounding the main burner nozzle, the inlet chamber fluidly connected to the reaction chamber to allow liquid and incoming gas to pass from the inlet chamber
1. An abatement system comprising: a main burner nozzle mounted at a superior end of a reaction chamber;an inlet chamber forming an annulus surrounding the main burner nozzle, the inlet chamber fluidly connected to the reaction chamber to allow liquid and incoming gas to pass from the inlet chamber to the reaction chamber;a first inlet tube having a first end coupled to the inlet chamber at an angle generally tangential to the annulus to convey the liquid and the incoming gas to the inlet chamber thereby generating a circular flow of the liquid and incoming gas in the inlet chamber about the annulus, the first inlet tube comprising: a spray nozzle mounted at a second end of the first inlet tube opposite the first end and configured to spray a volume of the liquid into the first inlet tube sufficient to contact an interior circumferential wall of the first inlet tube near the first end of the first inlet tube; anda first feed tube to convey the incoming gas to the first inlet tube, the first feed tube coupled to the first inlet tube between the second end and the interior circumferential wall of the first inlet tube contacted by the sprayed liquid. 2. The system of claim 1, wherein the first feed tube is positioned perpendicular to the first inlet tube. 3. The system of claim 1, wherein the spray nozzle is configured to spray the volume of the liquid into the first inlet tube sufficient to contact the interior circumferential wall of the first inlet tube by having a spray pattern with a spray angle sufficient to spray completely around the interior circumferential wall of the first inlet tube. 4. The system of claim 1, further comprising a second feed tube to convey additional incoming gas to the first inlet tube, the second feed tube coupled to the first inlet tube between the second end and the interior circumferential wall of the first inlet tube contacted by the sprayed liquid. 5. The system of claim 1, further comprising a second inlet tube having a first end coupled to the inlet chamber at an angle generally tangential to the annulus and located laterally across the inlet chamber from the first inlet tube, the second inlet tube comprising: a second spray nozzle mounted at a second end of the second inlet tube opposite the first end and configured to spray a second volume of the liquid into the second inlet tube sufficient to contact an interior circumferential wall of the second inlet tube near the first end of the second inlet tube. 6. The system of claim 5, further comprising a second feed tube to convey additional incoming gas to the second inlet tube, the second feed tube coupled to the second inlet tube between the second end and the interior circumferential wall of the second inlet tube contacted by the sprayed second volume of the liquid. 7. The system of claim 1, further comprising a second inlet tube having a first end coupled to the inlet chamber at an angle generally tangential to the annulus and located longitudinally inferior to the first inlet tube, the second inlet tube comprising: a second spray nozzle mounted at a second end of the second inlet tube opposite the first end and configured to spray a second volume of the liquid into the second inlet tube sufficient to contact an interior circumferential wall of the second inlet tube near the first end of the second inlet tube. 8. The system of claim 7, further comprising a second feed tube to convey additional incoming gas to the second inlet tube, the second feed tube coupled to the second inlet tube between the second end and the interior circumferential wall of the second inlet tube contacted by the sprayed second volume of the liquid. 9. The system of claim 1, further comprising a fluid valve that fluidly connects the inlet chamber to the reaction chamber. 10. The system of claim 1, wherein the liquid comprises water. 11. The system of claim 1, wherein at least a portion of an interior wall of the inlet chamber that forms an outer circumference of the annulus is conical and wherein the circular flow of the liquid and the incoming gas in the inlet chamber causes the liquid to flow along the conical interior wall of the inlet chamber. 12. A method of abating contaminants in incoming gas comprising: receiving incoming gas into an inlet tube from a feed tube;spraying, using a spray nozzle mounted at a first end of the inlet tube opposite a second end, a volume of a liquid into the inlet tube sufficient to contact an interior circumferential wall of the inlet tube near the second end of the inlet tube and to mix the incoming gas with the liquid;directing the mixture of the liquid and the incoming gas to flow through the inlet tube into an inlet chamber forming an annulus surrounding a main burner nozzle mounted at a superior end of a reaction chamber, the mixture directed at a generally tangential angle relative to the annulus so as to generate a generally circular flow of the mixture in the inlet chamber thereby separating the mixture of the liquid and the incoming gas so that the liquid flows along a first interior wall of the inlet chamber that forms an outer circumference of the annulus and the incoming gas flows between the liquid and a second interior wall of the inlet chamber that forms an inner circumference of the annulus;passing the separated incoming gas into the reaction chamber;allowing the separated liquid to flow from the first interior wall of the inlet chamber into and along walls of the reaction chamber;receiving fuel and oxidizer into the reaction chamber via the main burner nozzle to maintain a flame in the reaction chamber; andthermally abating, using the flame, contaminants in the incoming gas in the reaction chamber. 13. The method of claim 12, further comprising extinguishing, using the liquid, a portion of the flame that has propagated from the reaction chamber into the inlet chamber. 14. The method of claim 12, further comprising cooling the incoming gas in the inlet tube using the sprayed liquid. 15. The method of claim 12, wherein the volume of the liquid sprayed into the inlet tube is sufficient to flush into the reaction chamber solid products of reactions from the incoming gas occurring in the inlet tube. 16. The method of claim 12, wherein passing the separated incoming gas into the reaction chamber comprises passing the separated incoming gas through a fluid valve between the inlet chamber and the reaction chamber. 17. The method of claim 12, wherein the sprayed volume of the liquid into the inlet tube is sufficient to lower a back pressure of the incoming gas in the feed tube. 18. The method of claim 12, wherein the sprayed volume of the liquid into the inlet tube is sufficient to create a negative pressure in the feed tube. 19. An abatement system comprising: a reaction chamber with a main burner nozzle;an inlet tube having a first end coupled to the reaction chamber to allow incoming gas to pass from the inlet tube to the reaction chamber, the inlet tube comprising: a spray nozzle mounted at a second end of the inlet tube opposite the first end and configured to spray a volume of the liquid into the inlet tube sufficient to contact an interior circumferential wall of the inlet tube; anda feed tube to convey the incoming gas to the inlet tube, the feed tube coupled to the inlet tube between the second end and the interior circumferential wall of the inlet tube contacted by the sprayed liquid.
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이 특허에 인용된 특허 (4)
Culpepper ; Jr. Clifford (Charlotte NC), Automatic high-low burner operation.
Germerdonk Rolf (Kaiserslautern DEX) Huning Werner (Odenthal-Hahnenberg DEX) Cirkel Rudolf (Cologne DEX) Brinkmann Gunter (Tonisvorst DEX), Process and apparatus for thermally purifying effluent gases.
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