[특허]Methods for controllably induction heating an article

Methods for controllably induction heating an article 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-016/00 H05B-006/10 C23C-016/458 C23C-016/46 C30B-025/10
출원번호	US-0121072 (2008-05-15)
등록번호	US-9155131 (2015-10-06)
발명자 / 주소	Sumakeris, Joseph John Paisley, Michael James
출원인 / 주소	Cree, Inc.
대리인 / 주소	Myers Bigel Sibley & Sajovec, PA
인용정보	피인용 횟수 : 0 인용 특허 : 39

초록 ▼

A heating device for controllably heating an article defines a processing chamber to hold the article and includes a housing and an EMF generator. The housing includes a susceptor portion surrounding at least a portion of the processing chamber, and a conductor portion interposed between the susceptor portion and the processing chamber. The EMF generator is operable to induce eddy currents within the susceptor portion such that substantially no eddy currents are induced in the conductor portion. The conductor portion is operative to conduct heat from the susceptor portion to the processing chamber. The heating device may further include a platter and an opening defined in the conductor portion, wherein the opening is interposed between the susceptor portion and the platter.

대표청구항 ▼

1. A method for controllably heating an article, the method comprising: a) positioning the article in a processing chamber;b) applying an electromagnetic field to a housing about the processing chamber such that eddy currents are induced within an outer, susceptor portion of the housing, and such that substantially none of the electromagnetic field is applied to an inner conductor portion of the housing and substantially no eddy currents are induced in the conductor portion, wherein the conductor portion is disposed between the susceptor portion and the article; andc) conducting heat from the susceptor portion to the processing chamber through the conductor portion, whereinthe susceptor portion includes a platter region, and the conductor portion defines an opening therein overlying the platter region, said method further including: positioning a platter in the processing chamber such that the platter is disposed in the opening and overlies the platter region; and placing the article on the platter. 2. The method of claim 1 wherein the conductor portion includes first and second liner portions defining the opening therebetween, said method further including: removing the first liner portion from the processing chamber; andthereafter, removing the platter from the processing chamber. 3. The method of claim 1 including rotating the platter with the article disposed thereon. 4. The method of claim 1 wherein the conductor portion is separately formed from the susceptor portion. 5. The method of claim 4 wherein the conductor portion includes a conductor core of a first material and a conductor coating of a second material different from the first material. 6. The method of claim 5 wherein: the first material is graphite; andthe second material is a refractory metal carbide or SiC. 7. The method of claim 1 wherein the conductor portion is formed of a material in which heat generating eddy currents would be generated if the electromagnetic field were applied thereto. 8. The method of claim 7 wherein the conductor portion includes a portion formed of graphite.

이 특허에 인용된 특허 (39)

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Jancosek David G. (Valparaiso IN) Demorotski Michael (Portage IN) Noelting Gregory (Valparaiso IN), Galvanneal induction furnace temperature control system.
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Helmut Aschner DE; Andreas Hauke DE; Karsten Weber DE; Dieter Zernickel DE, Gas driven rotating susceptor for rapid thermal processing (RTP) system.
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Bhat Rajaram (Middletown NJ), Gas foil rotating substrate holder.
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Frijlink Peter M. (Crosne FRX), Method for epitaxial growth from the vapor phase of semiconductor materials.
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Frijlink Peter M. (Crosne FRX), Vapor phase epitaxy using complex premixing system.
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