초록 ▼

In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to f

In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.

대표청구항 ▼

1. A method of forming a nanochannel comprising: depositing a photosensitive film stack over a substrate;forming a first pattern on the film stack using interferometric lithography to form a nanochannel;forming a second pattern on the film stack using interferometric lithography and a mask aligner t

1. A method of forming a nanochannel comprising: depositing a photosensitive film stack over a substrate;forming a first pattern on the film stack using interferometric lithography to form a nanochannel;forming a second pattern on the film stack using interferometric lithography and a mask aligner to form a barrier in the nanochannel;depositing a plurality of silica nanoparticles to form a structure over the first pattern and the second pattern; andremoving the first pattern and the second pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel with the barrier formed along a portion of the enclosed nanochannel. 2. The method of claim 1, wherein the depositing a photosensitive film stack comprises depositing a first layer comprising an antireflective coating over the substrate and depositing a second layer comprising a photoresist over the first layer. 3. The method of claim 2, wherein the second layer comprises a layer of positive photoresist or a layer of negative photoresist. 4. The method of claim 1, wherein the depositing the plurality of silica nanoparticles comprises at least one cycle of spin coating using a suspension of silica nanoparticles. 5. The method of claim 1, wherein the depositing the plurality of silica nanoparticles comprises multiple cycles of spin coating wherein each cycle of spin coating uses a suspension of silica nanoparticles with a same size distribution. 6. The method of claim 1, wherein the depositing the plurality of silica nanoparticles comprises multiple cycles of spin coating wherein at least one cycle of spin coating uses a suspension of silica nanoparticles with a size distribution different than the other cycles of spin coating. 7. A nanochannel device for selectively separating components of a fluid comprising: a first plurality of nanochannels, wherein each nanochannel comprises a first opening and a second opening of the first plurality of nanochannels;a second plurality of nanochannels, wherein each nanochannel comprises a first opening and a second opening of the second plurality of nanochannels; anda barrier positioned between the first plurality of nanochannels and the second plurality of nanochannels, wherein the barrier comprises a plurality of silica nanoparticles, wherein a space between adjacent silica nanoparticles functions as a pore to allow fluid to flow between the first plurality of nanochannels and the second plurality of nanochannels. 8. The nanochannel device of claim 7, wherein the second plurality of nanochannels are arranged perpendicular to the first plurality of nanochannels and separated from the first plurality of nanochannels by the barrier. 9. The nanochannel device of claim 7, wherein a thickness and/or a pore size of the barrier is controlled by a size of the nanoparticle to affect the flow of moieties across the barrier. 10. The nanochannel device of claim 7, comprising at least one porous divider arranged between the first and the second plurality of nanochannels. 11. The nanochannel device of claim 10, where the at least one porous divider comprises a plurality of pores between the first and the second plurality of nanochannels, wherein the first plurality of nanochannels, the second plurality of nanochannels, and the at least one porous divider are disposed such that the fluid enters through the first set of openings of the first plurality of nanochannels, percolates through the plurality of pores of the porous divider and exits through the second set of openings of the second plurality of nanochannels. 12. The nanochannel device of claim 7, further comprising functionalized silica nanoparticles to selectively transport one component of the fluid. 13. The nanochannel device of claim 7, further comprising a chemical vapor deposited (“CVD”) film providing sealing of the top surface of the roof of the nanochannels. 14. The nanochannel device of claim 13 wherein the CVD film is composed of SiO2 and Si3N4. 15. The nanochannel device of claim 13, further comprising an atomic layer deposited film atop the chemical vapor deposited film. 16. The nanochannel device of claim 15 wherein the atomic layer deposited film is Al2O3.