Micro-channel water-gas shift reaction device having built-in flow-through-type metal catalyst
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01J-008/02
B01J-016/00
C01B-003/16
B01J-019/00
C10K-003/04
C10K-001/00
출원번호
US-0237756
(2012-08-08)
등록번호
US-9180421
(2015-11-10)
우선권정보
KR-10-2011-0080183 (2011-08-11)
국제출원번호
PCT/KR2012/006297
(2012-08-08)
§371/§102 date
20140207
(20140207)
국제공개번호
WO2013/022271
(2013-02-14)
발명자
/ 주소
Hwang, Kyung-Ran
Park, Jong-Soo
Ryi, Shin-Kun
Lee, Jin-Suk
Lee, Chun-Boo
Lee, Sung-Wook
출원인 / 주소
Korea Institute of Energy Research
대리인 / 주소
Sterne, Kessler, Goldstein & Fox P.L.L.C.
인용정보
피인용 횟수 :
0인용 특허 :
5
초록▼
The present invention relates to a micro-channel water-gas shift (WGS) reaction device for WGS for generating hydrogen and pre-combustion carbon capture and storage (CCS) from coal gasification, the device using a micro-channel heat exchanger and through-type metal catalyst capable of rapidly dissip
The present invention relates to a micro-channel water-gas shift (WGS) reaction device for WGS for generating hydrogen and pre-combustion carbon capture and storage (CCS) from coal gasification, the device using a micro-channel heat exchanger and through-type metal catalyst capable of rapidly dissipating heat generated during single-stage WGS reaction of high concentration CO in a high temperature space.
대표청구항▼
1. A micro-channel water-gas shift (WGS) reaction device comprising: an upper plate including a heat transfer gas supply pipe which is connected with a heat transfer gas supply source to supply a heat transfer gas, and a product gas discharge pipe for discharging a product gas;a lower plate includin
1. A micro-channel water-gas shift (WGS) reaction device comprising: an upper plate including a heat transfer gas supply pipe which is connected with a heat transfer gas supply source to supply a heat transfer gas, and a product gas discharge pipe for discharging a product gas;a lower plate including a reactant gas supply pipe which is connected with a reactant gas supply source to supply a reactant gas, and a heat transfer gas discharge pipe the discharging the heat transfer gas;an upper heat transfer unit which is disposed under the upper plate and includes an upper heat transfer gas flow path which is connected with the heat transfer gas supply pipe to flow the heat transfer gas, and an upper product gas flow path which is formed in contact with the upper heat transfer gas flow path so as to allow heat transfer therebetween, and connected with the product gas discharge pipe;a lower heat transfer unit which is disposed on the lower plate and includes a lower heat transfer gas flow path which is connected with the heat transfer gas discharge pipe to flow the heat transfer gas, and a lower reactant gas flow path which is formed in contact with the lower heat transfer gas flow path so as to allow heat transfer therebetween, and connected with the product gas supply pipe; andat least one reaction unit laminated between the upper heat transfer unit and the lower heat transfer unit,wherein the at least one reaction unit, in order to be laminated in one or more layers, includes:a gas supply plate on which a gas supply channel for communicating only with the lower reactant gas flow path is installed;a metal catalyst plate which is laminated on the gas supply plate and has at least one metal catalyst mounted thereon and at least one porous metal retainer disposed under the metal catalyst;a gas transfer unit which is laminated on the metal catalyst plate to transfer the reactant gas reacted with the metal catalyst to the upper product gas flow path; andan endothermic plate which is disposed under the gas supply plate or the upper gas transfer unit and has an endothermic channel for communicating the upper heat transfer gas flow path with the lower heat transfer gas flow path, andwherein the gas supply plate, the metal catalyst plate, the gas transfer unit, and the endothermic plate include first reaction through holes communicated with the upper product gas flow path, second reaction through holes communicated with the upper heat transfer gas flow path, third reaction through holes communicated with the lower reactant gas flow path, fourth reaction through holes communicated with the lower heat transfer gas flow path, respectively. 2. The device according to claim 1, wherein, when the metal catalyst plate includes a plurality of metal catalysts and a plurality of the metal retainer, these metal catalysts and metal retainers are laminated alternately to each other. 3. The device according to claim 1, wherein the upper heat transfer unit comprises: at least one upper heat transfer plate which has an upper heat transfer channel communicated with the heat transfer gas supply pipe to form the upper heat transfer gas flow path;at least one upper reaction gas plate which has an upper reaction channel communicated with the product gas discharge pipe to form the upper product gas flow path, and are alternately laminated with the at least one upper heat transfer plate,wherein the at least one upper heat transfer plate and the at least one upper reaction gas plate include first upper through holes formed at a position corresponding to the first reaction through holes to fourth reaction through holes of the reaction unit, andan upper shielding plate having the first upper through holes and second upper through holes formed therein is disposed at the lowermost side of the upper heat transfer unit. 4. The device according to claim 1, wherein the lower heat transfer unit comprises: at least one lower heat transfer plate which has a lower heat transfer channel communicated with the heat transfer gas supply pipe to form the lower heat transfer gas flow path; andat least one lower reactant gas plate which has a lower reaction channel communicated with the reactant gas supply pipe to form the lower reactant gas flow path, and are alternately laminated with the lower heat transfer plate,wherein the at least one lower heat transfer plate and the at least one lower reactant gas plate include first lower through holes to fourth lower through holes formed at a position corresponding to the first reaction through holes to fourth reaction through holes of the reaction unit, anda lower shielding plate having the third lower through holes and fourth lower through holes formed therein is disposed at the uppermost side of the lower heat transfer unit. 5. The device according to claim 1, wherein the gas transfer unit comprises: a gas collection plate which is disposed on the metal catalyst plate, and isolated from the first reaction through holes to fourth reaction through holes; anda gas transfer plate which is disposed on the gas collection plate, and includes a gas transfer channel communicated only with the first reaction through hole. 6. The device according to claim 1, wherein the gas transfer trait is a collection and transfer plate which is disposed on the metal catalyst plate, and has porous collection holes isolated from the second reaction through holes to fourth reaction through holes, wherein the porous collection holes are communicated with the first reaction hole through a connecting channel. 7. The device according to claim 1, wherein an O-ring is disposed on a lower side of the metal catalyst plate, and the at least one metal retainer is disposed on the O-ring. 8. The device according to claim 6, wherein a cross-sectional area of the porous collection holes are formed smaller than that of the metal catalyst.
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이 특허에 인용된 특허 (5)
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