[특허]Cryopump drain and vent

Cryopump drain and vent 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01D-008/00
출원번호	US-0451712 (2012-04-20)
등록번호	US-9186601 (2015-11-17)
발명자 / 주소	Longsworth, Ralph
출원인 / 주소	SUMITOMO (SHI) CRYOGENICS OF AMERICA INC.
대리인 / 주소	Katten Muchin Rosenman LLP
인용정보	피인용 횟수 : 0 인용 특허 : 30

초록 ▼

A means of rapidly melting a large quantity of type II cryogen in a cryopump that is configured to contain the liquid in the warm cryopanel with the inlet to the cryopump facing up or sideways, and venting the liquid and gas in a controlled way. Rapid melting is preferably accomplished by flowing a purge gas that will condense on the cryodeposit. By not allowing the liquid to drain onto the vacuum housing the evaporation rate is limited and the maximum pressure in the cryopump can be controlled by the purge gas flow rate.

대표청구항 ▼

1. A method of removing cryodeposits from a second stage cryopanel assembly, the second stage cryopanel assembly being contained in an interior space disposed within a first stage cryopanel assembly in a cryopump attached to a vacuum chamber,the cryodeposits comprising group II cryogens,the first stage cryopanel assembly comprising an inlet to the interior space, the inlet facing between up and sideways; the method comprising the steps of: (a) orienting a tube that is connected to a first vent valve to remove from the lowest point in the first stage cryopanel assembly a first and a second liquid waste;(b) isolating the cryopump from the vacuum chamber;(c) stopping cryogenic refrigeration operation of the cryopump;(d) introducing a purge gas and a second gas having a lower normal boiling point than the purge gas, the purge gas being selected from group II cryogens;(e) melting the cryodeposits with the purge gas into a first liquid waste while the purge gas condensing into a second liquid waste by the cryodeposit;(f) containing the first liquid waste and the second liquid waste within the first stage cryopanel;(g) increasing a pressure in the interior space by introducing more second gas; and(h) removing from the cryopump the first liquid waste, the second liquid gas, and the second gas through the tube into the first vent valve, and removing from the cryopump only the uncondensed purge gas through a second vent valve,wherein the first vent valve opens automatically at a first pressure above atmospheric pressure and the second vent valve opens automatically at a pressure higher than the first pressure. 2. The method of claim 1, wherein when a cryodeposit is partially melted, the following steps are performed (i) stopping a flow of the purge gas,(j) collecting in the interior space the first liquid waste and the second liquid waste;(k) introducing into the interior space enough second gas to force the first liquid waste and the second liquid waste through the first vent valve,(l) repeating steps (i)-(k) until all of the cryodeposit is removed from the second stage cryopanel assembly. 3. The method of claim 1, wherein by controlling a flow rate of the purge gas and the second gas into the interior the maximum pressure in said cryopump is controlled. 4. A method of removing at least one cryodeposit from a second stage cryopanel assembly, the second stage cryopanel assembly being contained in an interior space disposed within a first stage cryopanel assembly in a cryopump attached to a vacuum chamber, the at least one cryodeposit comprising at least one group II cryogen, the first stage cryopanel assembly comprising an inlet to the interior space, the inlet facing between up and sideways;the method comprising the steps of: (a) orienting a tube that is connected to a first vent valve to remove from the lowest point in the first stage cryopanel assembly a first and a second liquid waste;(b) isolating the cryopump from the vacuum chamber;(c) stopping cryogenic refrigeration operation of the cryopump;(d) introducing a purge gas, the purge gas being selected from group II cryogens;(e) melting the at least one cryodeposit with the purge gas into a first liquid waste while the purge gas condenses into a second liquid waste by the at least one cryodeposit;(f) containing the first liquid waste and the second liquid waste within the first stage cryopanel;(g) increasing a pressure in the interior space by introducing one of the same purge gas and a second gas having a lower normal boiling point than the purge gas; and(h) removing from the cryopump the first liquid waste, the second liquid waste, and a partial amount of purge gas through the tube into the first vent valve, and removing from the cryopump a balance of the gas in the cryopump through a second vent valve;wherein the first vent valve opens automatically at a first pressure above atmospheric pressure and the second vent valve opens automatically at a pressure higher than the first pressure. 5. The method of claim 4, wherein when the at least one cryodeposit is partially melted, the following steps are performed (i) stopping a flow of the purge gas,(j) collecting in the interior space the first liquid waste and the second liquid waste;(k) introducing into the interior space enough second gas to force the first liquid waste and the second liquid waste through the first vent valve,(l) repeating steps (i)-(k) until all of the at least one cryodeposit is removed from the second stage cryopanel assembly.

이 특허에 인용된 특허 (30)

Mattern-Klosson Monika (Roesrath DEX) Mundinger Hans-Juergen (Bruehl DEX) Haefner Hans-Ulrich (Cologne DEX) Timm Uwe (Frankfurt DEX), Cryogenic pump with an essentially cup-shaped housing.
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Lombardini Lapo (Florence ITX) Bardi Gianluca (Florence ITX), Cryogenic pump with refrigerator with the geometry of the shields, suitable for achieving a high efficiency and an exten.
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Saho Norihide (Tsuchiura JPX) Isogami Hisashi (Ibaraki JPX) Yamashita Yasuo (Hitachi JPX) Kawakami Hiroyuki (Hitachi JPX) Uede Taisei (Hitachi JPX), Cryogenic refrigeration system and refrigeration method therefor.
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Asami Hiroshi (Yokohama JPX) Suzuki Mitsuru (Hiratsuka JPX), Cryogenic refrigerator.
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Kohler Marcel (Egerta 517 FL-9496 Balzers LIX), Cryopump.
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Mattern-Klosson Monika (Roesrath DEX) Mundinger Hans-Juergen (Bruehl DEX) Greger Ferdinand (Cologne DEX), Cryopump.
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Bartlett Allen J. (Milford MA) Stochl Charles A. (Cumberland RI) Guerra Anthony M. (Scituate MA) Dopson Dale A. (Stoughton MA) Meroski Paul (Melrose MA) Stevens Thomas F. (Westborough MA), Cryopump and cryopanel having frost concentrating device.
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Hfner Hans-Ulrich (Kln DEX) Mundinger Hans-Jrgen (Brhl DEX) Flick Gerd (Brhl DEX) Forth Hans-Joachim (Kln DEX) Klein Hans-Hermann (Friedberg DEX) Timm Uwe (Frankfurt DEX), Cryopump and process for regenerating said cryopump.
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Harrington James E. (Acton MA) Camerlengo Arthur J. (Woburn MA), Cryopump water drain.
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Harrington James E. (Acton MA) Camerlengo Arthur J. (Woburn MA), Cryopump water drain.
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Wooster Gary ; Skuncik Frank ; Richardson Michael ; Mazzola Richard ; Funsch Douglas ; Ledgard Harry, Cryopump with an exhaust filter.
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Eacobacci Michael J. (Randolph MA) Planchard David C. (Shrewsberry MA), Cryopump with exhaust filter.
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Bartlett Allen J. (Milford MA) Lessard Philip A. (Boxborough MA) Yamartino Stephen J. (Wayland MA) Harvell John T. (Sudbury MA), Cryopump with improved second stage passageway.
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Bartlett Allen J. (10 Jillson Cir. Milford MA 01757), Cryopump with multiple refrigerators.
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Longsworth Ralph C. (Allentown PA), Cryopumping method and apparatus.
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Flegal Christopher M. (Santa Rosa CA) Porter John R. (Napa CA), Cryosorption surface for a cryopump.
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Hohne Jens,DEX, Detector device.
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Kadi Frank J. (New Tripoli PA), Economical and thermally efficient cryopump panel and panel array.
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Georges G. Evens BE; Emanuel M. J. Pijpers NL; Andreas A. Oosterlaken NL; Jacob Renkema NL; Henri J. H. Beelen NL, Elastomeric copolymer and process for the preparation thereof.
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Matte Stephen R. ; Bartlett Allen J., High capacity cryopump.
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Peterson John F. (Lynnfield MA) Bartlett Allen J. (Milford MA), Multiport cryopump.
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Paynting Richard J., Particulate dam for cryopump flange.
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Miyamoto Atsushi,JPX ; Kakimi Yasuhiro,JPX ; Kunitani Shingo,JPX ; Ito Daisuke,JPX, Pulse pipe refrigerating machine and cryopump using the refrigerating machine.
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Ohtani Yasumi (Yokohama JPX) Hatakeyama Hideo (Yokohama JPX) Kuriyama Toru (Yokohama JPX) Nakagome Hideki (Tokyo JPX) Matsubara Yoichi (Funabashi JPX), Pulse tube refrigerator.
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Lessard Philip A. ; Dresens Paul E. ; Buonpane Maureen C. ; Pulling Timothy M. ; Brightman Alan C. ; Patterson Robert M. ; Stira Mark A. ; Bartlett Allen J. ; Yamartino Stephen J. ; Ash Gary S. ; O'N, Purge and rough cryopump regeneration process, cryopump and controller.
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Peterson John F. (Lynnfield MA) Bartlett Allen J. (Milford MA), Reduced vacuum cryopump.
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Longsworth Ralph C., Reduced vibration cooling device having pneumatically-driven GM type displacer.
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Strasser Wilhelm (Bergisch-Gladbach DEX), Refrigerator-operated apparatus.
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Brezoczky Thomas ; Narasimhan Murali, Shield to prevent cryopump charcoal array from shedding during cryo-regeneration.
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Lessard Philip A. (Acton MA) Bartlett Allen J. (Milford MA) Peterson John F. (Lynnfield MA), Temperature control of cryogenic systems.
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