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Coating apparatus including a chamber, sensor, removal unit and control device for application of liquid to a substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-011/00
  • B05C-011/10
  • B05C-005/00
  • C23C-016/52
  • H01L-021/67
  • H01L-021/677
  • H01L-031/0216
  • H01L-031/032
  • H01L-031/18
  • B41J-002/045
출원번호 US-0874984 (2010-09-02)
등록번호 US-9186696 (2015-11-17)
우선권정보 JP-2009-207140 (2009-09-08)
발명자 / 주소
  • Miyamoto, Hidenori
  • Maruyama, Kenji
  • Hirakawa, Tadahiko
  • Misumi, Koichi
출원인 / 주소
  • Tokyo Ohka Kogyo Co., Ltd.
대리인 / 주소
    Knobbe Martens Olson & Bear LLP
인용정보 피인용 횟수 : 0  인용 특허 : 41

초록

A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate, a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the substrate is transported, and a remo

대표청구항

1. A solar cell coating system comprising: a coating part including a slit nozzle which applies a liquid material including an oxidizable metal to a first substrate by a non-spin coating method;a chamber having a coating space in which the coating part applies the liquid material to the first substr

이 특허에 인용된 특허 (41)

  1. Sarkozy Robert F. (85 Concord Rd. Westford MA 01886), Apparatus for chemical vapor deposition with clean effluent and improved product yield.
  2. Rosenblum Mark D. (Woburn MA) Hanoka Jack I. (Brookline MA), Apparatus for forming diffusion junctions in solar cell substrates.
  3. Yamane Mitsuo (Yotsukaichi JPX) Kawaguchi Takashi (Aichi JPX), Apparatus for forming three-dimensional article.
  4. Lampkin Curtis M. (El Paso TX) Roderick Guy A. (El Paso TX) Locke Peter (El Paso TX), Apparatus for quality film formation.
  5. Takamura Takumi (Gifu JPX), Booth structure for coating cathode-ray tube having dust absorbing wall surfaces.
  6. Britt, Jeffrey S.; Albright, Scot; Schoop, Urs, Buffer layer deposition for thin-film solar cells.
  7. Klein,Richard G., Closed loop adhesive registration system.
  8. Liu Wei-Jen,TWX, Closed-loop controlled apparatus for preventing chamber contamination.
  9. Curry ; II John W. (Austin TX) Pietila Douglas A. (Austin TX), Coating a heat curable liquid dielectric on a substrate.
  10. Sada, Tetsuya; Hashimoto, Hiroshi; Shimomura, Yuji, Coating processing apparatus.
  11. Usami,Mamoru; Tanaka,Kazushi; Yoneyama,Kenji; Kaneko,Yukio; Umega,Takeshi, Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object.
  12. Yoneyama,Kenji; Tanaka,Kazushi; Usami,Mamoru, Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object.
  13. Wang, Chau-Jong; Yang, Mong-Yuan, Extracts of sacred water lotus for the treatment of cancer.
  14. Kawamura, Daisuke, Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices.
  15. Ina, Hideki; Sentoku, Koichi; Matsumoto, Takahiro, Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus.
  16. Tom Glenn M. (New Milford CT), In-line detector system for real-time determination of impurity concentration in a flowing gas stream.
  17. Novotny Jerome L. (17700 Darden Rd. South Bend IN 46635) Nickerson ; Sr. Roy S. (340 Marvel La. New Carlisle IN 46552), Inert atmosphere chamber.
  18. Fujii Hiroyuki,JPX, Ink jet printer for monitoring and removing thickened ink from print head.
  19. Riley John A. (905 Richmar Dr. Westlake OH 44145), Method and apparatus for automated polymeric film coating.
  20. Rosenberger Mary Ellen ; Jones Donald B., Method and apparatus for spraying waterborne coatings under varying conditions.
  21. Grime Thomas E. ; Gargac Andrew P. ; Campbell Larry E., Method for VOC abatement and paint spray booth incorporating such method.
  22. Lampkin Curtis M. (El Paso TX) Roderick Guy A. (El Paso TX) Nikodem Robert B. (El Paso TX), Method for quality film formation.
  23. Merkel Stephen L. (380 Oakmoor Bay Village OH 44140) Miller Scott R. (10845 Shagbark Trail Roswell GA 30075) Becker Kevin C. (23147 Hilliard Blvd. Westlake OH 44145), Method of monitoring parameters of coating material dispensing systems and processes by analysis of swirl pattern dynami.
  24. Nanbu Mitsuhiro,JPX ; Iida Naruaki,JPX ; Gotou Hideaki,JPX ; Tateyama Masanori,JPX ; Yoshimoto Yuji,JPX ; Ishimoto Tomoko,JPX ; Yaegashi Hidetami,JPX ; Kawakami Yasunori,JPX ; Fukuda Takahide,JPX ; F, Method of substrate processing to form a film on multiple target objects.
  25. Lis Steven A. (Needham MA) Serreze Harvey B. (Dover MA) Sienkiewicz Peter M. (Randolph MA), Method to synthesize and produce thin films by spray pyrolysis.
  26. Squillante Michael R. (Waltham MA), Method to synthesize and produce thin films by spray pyrolysis.
  27. Rothchild Ronald D. (South Orange NJ), Methods and apparatus for recovering solvents.
  28. Mickelsen Reid A. (Bellevue WA) Chen Wen S. (Seattle WA), Methods for forming thin-film heterojunction solar cells from I-III-VI2 chalcopyrite compounds, and solar.
  29. Kapur Vijay K. ; Basol Bulent M. ; Leidholm Craig R. ; Roe Robert A., Oxide-based method of making compound semiconductor films and making related electronic devices.
  30. Eberspacher Chris (Los Angeles CA) Ermer James H. (Burbank CA) Mitchell Kim W. (Granada Hill CA), Process for making thin film solar cell.
  31. Gladfelter Wayne L. (St. Paul MN) Mantell Daniel R. (Minneapolis MN) Evans John F. (Minneapolis MN) Schulze Roland K. (Minneapolis MN), Process for metal nitride deposition.
  32. Page, Geoffrey A.; Tokoli, Emery G.; Cosgrove, Robert T.; Spiewak, John W., Process for preparing a phthalocyanine.
  33. Yaegashi Hidetami,JPX ; Fan Qi,JPX, Processing apparatus and method.
  34. Kishkovich Oleg P. ; Kinkead Devon A., Protection of semiconductor fabrication and similar sensitive processes.
  35. Rangarajan, Bharath; Subramanian, Ramkumar; Phan, Khoi A.; Quinto, Ursula Q.; Templeton, Michael T., Recirculation and reuse of dummy dispensed resist.
  36. Sano Hideo,JPX ; Takimoto Hiroshi,JPX ; Nishimura Toru,JPX ; Yamada Masahiro,JPX ; Hirasa Takashi,JPX, Recording liquid and recording method according to ink-jet recording system using the same.
  37. Mitzi, David B, Solution deposition of chalcogenide films.
  38. Liu, Wei; Mitzi, David B., Spray pyrolysis for large-scale production of chalcopyrite absorber layer in photovoltaic devices.
  39. Minamida, Junya; Ishida, Seiki, Substrate processing system.
  40. Doley Allan ; Goodwin Dennis ; O'Neill Kenneth ; Vrijburg Gerben ; Rodriguez David, System and method for reducing particles in epitaxial reactors.
  41. Choi Sun-jip,KRX ; Kim Jong-kwan,KRX ; Jang Ill-jin,KRX, Wafer spin coating system with photoresist pumping unit check function.

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