Apparatus and method for regulating cryogenic spraying
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
A62C-005/02
B05B-007/12
B05B-007/06
B05B-007/04
F17C-007/02
F28C-001/00
C23C-004/12
F17C-013/00
C21D-001/667
출원번호
US-0846116
(2007-08-28)
등록번호
US-9200356
(2015-12-01)
발명자
/ 주소
Zurecki, Zbigniew
Knorr, Jr., Robert Ellsworth
Green, John Lewis
출원인 / 주소
Air Products and Chemicals, Inc.
대리인 / 주소
Kiernan, Anne R.
인용정보
피인용 횟수 :
0인용 특허 :
43
초록
A nozzle and process are set forth for contacting a cryogenic liquid and a gas, and discharging the resulting fluid through the nozzle. In one embodiment, the ratio of the discharged fluid's liquid component to its gaseous component is controlled as a function of the gas pressure.
대표청구항▼
1. An apparatus comprising at least one spray device each comprising: a contact zone for contacting a liquid (L) and a throttling gas (G) and forming a resulting fluid thereof;at least one gas inlet in fluid communication with the contact zone for introducing the throttling gas into the contact zone
1. An apparatus comprising at least one spray device each comprising: a contact zone for contacting a liquid (L) and a throttling gas (G) and forming a resulting fluid thereof;at least one gas inlet in fluid communication with the contact zone for introducing the throttling gas into the contact zone;at least one liquid inlet in fluid communication with the contact zone for introducing the liquid into the contact zone;the contact zone being in fluid communication with at least one nozzle for discharging the resulting fluid through the at least one nozzle; anda gas supply control in fluid communication with each of the at least one gas inlet;wherein the liquid is a cryogenic liquid and the at least one spray device is a spray device for the resulting fluid; andwherein the gas supply control adjusts the pressure of gas supplied to each of the at least one gas inlet to achieve a first desired flow rate of cryogenic liquid through the at least one nozzle when a source of cryogenic liquid at a first pressure is provided to each of the at least one cryogenic liquid inlet;wherein the apparatus does not comprise a flow-restricting valve in fluid communication with the liquid inlet for controlling the flow rate of the cryogenic liquid,and wherein the flow rate of the cryogenic liquid is controlled as a function of the pressure of the throttling gas without any changes other than to the pressure of the throttling gas such that the ratio of the resulting fluid's liquid flow rate to gaseous flow rate (DL/DG) decreases with increasing pressure of the throttling gas. 2. The apparatus of claim 1, wherein the gas supply control comprises at least one adjustable valve, each of the at least one adjustable valve adjusts the pressure of the gas supplied to one of the at least one gas inlet to greater than the first pressure. 3. The apparatus of claim 1, wherein the at least one nozzle comprises a plurality of nozzles, each of the plurality of nozzles having a respective flow rate of cryogenic liquid, the flow rates of cryogenic liquid for each of the plurality of nozzles collectively defining a spray profile, wherein the gas supply control adjusts the pressure of gas supplied to each of the at least one gas inlet to achieve a first desired spray profile when a source of cryogenic liquid at the first pressure is provided to each of the at least one cryogenic liquid inlet. 4. The apparatus of claim 3, wherein the gas supply control comprises a controller that is programmed to change the spray profile in accordance with a preprogrammed cooling profile. 5. The apparatus of claim 3, wherein the gas supply control comprises a controller that is programmed to change the spray profile in response to signals received from a sensor. 6. The apparatus of claim 5, wherein the sensor comprises a temperature sensor that measures the temperature of at least a portion of a substrate being cooled by the at least one cryogenic spray device. 7. The apparatus of claim 1, wherein the at least one gas inlet comprises a first gas inlet and a second gas inlet. 8. The apparatus of claim 1, wherein the at least one cryogenic spray device comprises a plurality of cryogenic spray devices and the gas supply controller comprises a plurality of adjustable valves, each of the plurality of adjustable valves being in fluid communication with each of the at least one gas inlet. 9. The apparatus of claim 1 wherein the apparatus comprises: an outer conduit;an inner conduit positioned within the outer conduit and defining an annular space between the outer conduit and the inner conduit and the contact zone comprising the annular space,the inner conduit having at least one opening positioned to enable the cryogenic liquid to flow radially from the inner conduit into the annular space;the at least one nozzle formed on the outer conduit, each of the at least one nozzle being in fluid communication with the annular space;the at least one gas inlet in fluid communication with the outer conduit, wherein the at least one gas inlet is connected to a pressurized gas supply; andthe at least one liquid inlet in fluid communication with the inner conduit, wherein the at least one liquid inlet is connected to a cryogenic liquid supply. 10. The apparatus of claim 9, wherein the at least one gas inlet is in head-on flow communication with the annular space. 11. The apparatus of claim 9, wherein the outer conduit includes a first end and a second end that is distal to the first end and comprises a second gas inlet, the at least one gas inlet being located at the first end and the second gas inlet being located at the second end, wherein the second gas inlet is connected to a pressurized gas supply. 12. The apparatus of claim 9, wherein the inner conduit and outer conduit are each cylindrical in shape and are concentric. 13. The apparatus of claim 9, wherein at least one nozzle comprises a plurality of nozzles arranged in a row. 14. A method comprising: supplying a liquid at a first pressure and first temperature to a contact zone that is in fluid communication with at least one nozzle;supplying a gas at a second pressure and second temperature to the contact zone, the second pressure being no less than the first pressure, the second temperature being greater than the first temperature, and the gas having a boiling point at 1 atm that is no greater than the first temperature;contacting the liquid and the gas in the contact zone to provide a resulting fluid; anddischarging the resulting fluid through the at least one nozzle,wherein the liquid is a cryogenic liquid, andwherein the second pressure of the gas supplied to the contact zone is regulated in order to achieve a desired flow rate of cryogenic liquid through each of the at least one nozzle;wherein the method does not comprise controlling the supply of the cryogenic liquid to the contact zone with a flow-restricting valve, andwherein the flow rate of the cryogenic liquid is controlled as a function of the pressure of the throttling gas without any changes other than to the pressure of the throttling gas such that the ratio of the resulting fluid's liquid flow rate to gaseous flow rate (DL/DG) decreases with increasing pressure of the throttling gas. 15. The method of claim 14, wherein supplying the gas step further comprises regulating the second pressure greater than 1 to 100 times the first pressure in order to achieve the desired flow rate of cryogenic liquid through each of the at least one nozzle. 16. The method of claim 14, wherein supplying a gas at a second pressure and second temperature to the contact zone further comprises supplying the gas in a direction that impinges the cryogenic liquid being supplied to the contact zone. 17. The method of claim 14, wherein the supplying a cryogenic liquid step further comprises supplying a cryogenic liquid at a first pressure and first temperature to an inner conduit having at least one opening in fluid communication with the contact zone, the inner conduit being located within an outer conduit and the contact zone being located between the inner and outer conduits. 18. The method of claim 14, wherein the regulating the gas supplied step further comprises regulating the gas supplied to the contact zone using a controller that is programmed to adjust the pressure of gas supplied to the contact zone based on one or more of: (a) signals from at least one sensor and (b) a preprogrammed cooling profile. 19. The method of claim 14, wherein the method is used in one of the applications selected from the group of thermal spraying, welding; fusing; hardening; nitriding; carburizing; laser glazing; induction heat treating; brazing; extrusion; casting; finish-rolling; forging; embossing; engraving; patterning; printing, scribing or slitting of metal strip, tape, or tube; cryogenic cutting and grinding of metal and non-metal components; and processing, surfacing, or assembly in the metals, ceramics, aerospace, medical, electronics, and optical industries.
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Allor, Richard L.; Baer, John Richard; Regan, Kevin Patrick, Method and apparatus for controlling a spray form process based on sensed surface temperatures.
Germain Jean-Pierre,FRX ; Dubreuil Thierry,FRX, Method and device for sequentially spraying a cryogenic liquid, cooling method and installation making application thereof.
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Nesgood Patrick J. (Clark NJ) Faler James H. (Beaver Dams NY), Process for mixing liquid additives with solid materials under sonic velocity conditions.
Zurecki Zbigniew (Macungie PA) Berger Kerry R. (Lehighton PA) Swan Robert B. (Lehighton PA), Vortex dispersing nozzle for liquefied cryogenic inert gases used in blanketing of molten metals exposed to ambient air.
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