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Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G21K-005/10
  • H01J-037/08
  • H01J-037/30
  • B82Y-010/00
  • B82Y-040/00
  • H01J-037/09
  • H01J-037/28
  • H01J-037/317
  • H01J-037/14
  • H01J-037/10
출원번호 US-0165573 (2014-01-27)
등록번호 US-9224576 (2015-12-29)
발명자 / 주소
  • Knippelmeyer, Rainer
  • Kienzle, Oliver
  • Kemen, Thomas
  • Mueller, Heiko
  • Uhlemann, Stephan
  • Haider, Maximilian
  • Casares, Antonio
  • Rogers, Steven
출원인 / 주소
  • CARL ZEISS MICROSCOPY GMBH
대리인 / 주소
    Morris & Kamlay LLP
인용정보 피인용 횟수 : 3  인용 특허 : 43

초록

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array

대표청구항

1. A particle-optical arrangement comprising: at least one charged-particle source for generating at least one beam of charged particles;at least one multi-aperture plate arranged in a beam path of the at least one beam of charged particles, wherein the at least one multi-aperture plate has a plural

이 특허에 인용된 특허 (43)

  1. Platzgummer,Elmar, Advanced pattern definition for particle-beam exposure.
  2. Nakasuji Mamoru,JPX, Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams.
  3. Kimba, Toshifumi; Satake, Tohru; Karimata, Tsutomu; Watanabe, Kenji; Noji, Nobuharu; Murakami, Takeshi; Hatakeyama, Masahiro; Nakasuji, Mamoru; Sobukawa, Hirosi; Yoshikawa, Shoji; Oowada, Shin; Saito, Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former.
  4. Frosien, Jüergen, Charged particle beam device with detection unit switch and method of operation thereof.
  5. Casares, Antonio; Kemen, Thomas; Knippelmeyer, Rainer; Bayer, Thomas; Fritz, Georg; Greschner, Johann; Kalt, Samuel, Charged particle-optical systems, methods and components.
  6. Chen Hsing-Yao ; Ma Yu Kun,TWX, Color CRT electron gun with asymmetric auxiliary beam passing aperture.
  7. Alig Roger C. (West Windsor Township ; Mercer County NJ) New David A. (Manheim Township ; Lancaster County PA), Color picture tube having an inline electron gun with an einzel lens.
  8. Alig, Roger Casanova; Bechis, Dennis John; New, David Arthur, Color picture tube including an electron gun in a coated tube neck.
  9. Simpson Theodore Frederick ; Gorog Istvan ; Marks Bruce George ; Wetzel Charles Michael ; Eshleman Craig Clay, Display apparatus having enhanced resolution shadow mask and method of making same.
  10. Yamashita Hiroshi,JPX ; Tamura Takao,JPX ; Nozue Hiroshi,JPX, Electron beam cell projection lithography method for correcting coulomb interaction effects.
  11. Muraki Masato,JPX ; Gotoh Susumu,JPX, Electron beam exposure apparatus and method, and device manufacturing method.
  12. Yui, Yoshikiyo, Electron gun and electron beam drawing apparatus using the same.
  13. Ono, Haruhito; Muraki, Masato, Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method.
  14. Benner Gerd,DEX, Energy filter, particularly for an electron microscope.
  15. Kienzle, Oliver; Stenkamp, Dirk; Steigerwald, Michael; Knippelmeyer, Rainer; Haider, Max; M?ller, Heiko; Uhlemann, Stephan, Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same.
  16. True Richard B. (Sunnyvale CA), Flood beam electron gun.
  17. Guzowski Kenneth A. (Hoffman Estates IL) Derr Andrew C. (Western Springs IL), Focusing electrode assembly for a color cathode ray tube electron gun.
  18. Frosien,Juergen; Lanio,Stefan; Schoenecker,Gerald; Brodie,Alan D.; Crewe,David A., High current density particle beam system.
  19. Sogard Michael R. ; McCoy John, High throughput electron beam lithography system.
  20. Mamoru Nakasuji JP, High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors.
  21. Saito Masato (Amagasaki JPX) Suzuki Ryo (Amagasaki JPX) Shiroishi Tetsuya (Amagasaki JPX) Sakurai Kouichi (Amagasaki JPX) Yamane Yoshio (Amagasaki JPX) Murakami Hidenobu (Amagasaki JPX), Image display apparatus.
  22. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Sobukawa,Hirosi; Yoshikawa,Shoji; Karimata,Tsutomu; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Takagi,Toru, Inspection system by charged particle beam and method of manufacturing devices using the system.
  23. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Sobukawa,Hirosi; Yoshikawa,Shoji; Karimata,Tsutomu; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Takagi,Toru, Inspection system by charged particle beam and method of manufacturing devices using the system.
  24. Blake Julian G. ; Purser Kenneth H. ; Brailove Adam A. ; Rose Peter H. ; Hughey Barbara J., Large area uniform ion beam formation.
  25. Miyoshi Motosuke (Tokyo JPX) Okumura Katsuya (Poughkeepsie NY) Yamazaki Yuichiro (Tokyo JPX), Magnetic field immersion type electron gun.
  26. Nakagawa Seiichi (Akishimashi JPX), Magnetic objective lens for use in a scanning electron microscope.
  27. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Hatakeyama,Masahiro; Watanabe,Kenji; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki, Method for inspecting substrate, substrate inspecting system and electron beam apparatus.
  28. Kienzle, Oliver; Knippelmeyer, Rainer; M?ller, Ingo, Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor.
  29. Talbot Christopher G. ; Lo Chiwoei Wayne, Method of detecting defects in patterned substrates.
  30. Ando Masaaki (Fujisawa JPX) Matsuzaka Masaaki (Fujisawa JPX) Saita Masahiro (Zushi JPX), Multiple-imaging charged particle-beam exposure system.
  31. Knippelmeyer, Rainer, Particle-optical apparatus and method for operating the same.
  32. Van Der Mast Karel D. (Eindhoven NLX) Kruit Pieter (Delft NLX) Troost Kars Z. (Eindhoven NLX) Henstra Alexander (Eindhoven NLX), Particle-optical apparatus comprising a detector for secondary electrons.
  33. Marcellinus Petrus Carolus Michael Krijn NL; Alexander Henstra NL, Particle-optical apparatus involving detection of Auger electronics.
  34. Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  35. Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  36. Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximillian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  37. Knippelmeyer,Rainer; Kienzle,Oliver, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  38. Kitamura, Tadashi; Kubota, Kazufumi; Nakazawa, Shinichi; Vohra, Neeti; Yamamoto, Masahiro, Pattern inspection apparatus and method.
  39. Kitamura, Tadashi; Kubota, Kazufumi; Nakazawa, Shinichi; Vohra, Neeti; Yamamoto, Masahiro; Hasebe, Toshiaki, Pattern inspection apparatus and method.
  40. Yamamoto, Masahiro; Kitamura, Tadashi, Pattern inspection apparatus, pattern inspection method, and recording medium.
  41. Ka-Ngo Leung ; Yung-Hee Yvette Lee ; Vinh Ngo ; Nastaran Zahir, Plasma formed ion beam projection lithography system.
  42. Kato, Yasushi; Noguchi, Yasushi; Ogawa, Masato, Porous honeycomb structure and process for production thereof.
  43. Todokoro Hideo,JPX ; Ishitani Tohru,JPX ; Usami Yasutsugu,JPX ; Taya Shunroku,JPX ; Shinada Hiroyuki,JPX ; Ninomiya Taku,JPX ; Ohnishi Tsuyoshi,JPX, Projecting type charged particle microscope and projecting type substrate inspection system.

이 특허를 인용한 특허 (3)

  1. Masnaghetti, Doug K.; McCord, Mark A.; Simmons, Richard R.; Knippelmeyer, Rainer, Multi-beam dark field imaging.
  2. Knippelmeyer, Rainer; Kienzle, Oliver; Kemen, Thomas; Mueller, Heiko; Uhlemann, Stephan; Haider, Maximilian; Casares, Antonio; Rogers, Steven, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
  3. Zeidler, Dirk; Kemen, Thomas; Pascal, Anger; Casares, Antonio; Riedesel, Christof, Particle-optical systems and arrangements and particle-optical components for such systems and arrangements.
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