초록 ▼

A monitoring system 100 comprising a material transport system 104 providing for the transportation of a substantially planar material 102, 107 through the monitoring zone 103 of the monitoring system 100. The system 100 also includes a line camera 106 positioned to obtain multiple line images acros

A monitoring system 100 comprising a material transport system 104 providing for the transportation of a substantially planar material 102, 107 through the monitoring zone 103 of the monitoring system 100. The system 100 also includes a line camera 106 positioned to obtain multiple line images across a width of the material 102, 107 as it is transported through the monitoring zone 103. The system 100 further includes an illumination source 108 providing for the illumination of the material 102, 107 transported through the monitoring zone 103 such that light reflected in a direction normal to the substantially planar surface of the material 102, 107 is detected by the line camera 106. A data processing system 110 is also provided in digital communication with the line camera 106. The data processing system 110 is configured to receive data output from the line camera 106 and further configured to calculate and provide substantially contemporaneous information relating to a quality parameter of the material 102, 107. Also disclosed are methods of monitoring a quality parameter of a material.

대표청구항 ▼

1. A monitoring system comprising: a material transport system configured to transport a substantially planar material through a monitoring zone of the monitoring system;an illumination source positioned to illuminate the material with light that spans across a width of the material, wherein the lig

1. A monitoring system comprising: a material transport system configured to transport a substantially planar material through a monitoring zone of the monitoring system;an illumination source positioned to illuminate the material with light that spans across a width of the material, wherein the light has substantially uniform intensity across the width of the material;a line camera configured to obtain a plurality of consecutive line images, each comprising a respective linear array of pixels, wherein each consecutive line image captures non-specular reflections of the light from a respective section of the material, each respective section spanning the width of the material; anda data processing system in digital communication with the line camera configured to: receive, from the line camera, data representing each consecutive line image,determine, based on the data representing each consecutive line image and for each of at least two pixels from the respective linear array of pixels, a respective value of a quality parameter of the material, andoutput the respective value of the quality parameter of the material for each of the at least two pixels. 2. The monitoring system of claim 1, wherein the substantially planar material comprises one of a semiconductor wafer or a fuel cell membrane. 3. The monitoring system of claim 1, wherein the illumination source comprises: a light source that generates the light;a fiber optic providing for transmission of the light from the light source to a rectangular aperture; anda lens in optical communication with the rectangular aperture. 4. The monitoring system of claim 1, wherein the illumination source comprises: one of a linear array of LEDs or a linear lamp that generates the light and a parabolic reflector providing for projection of the light toward the substantially planar material. 5. The monitoring system of claim 1, wherein the illumination source is positioned with respect to the substantially planar material such that a line from the illumination source to the planar material forms an angle of less than 45° with a planar surface of the planar material. 6. The monitoring system of claim 1, wherein the illumination source comprises a source of polychromatic light having a range of wavelengths and wherein the monitoring system further comprises a filtering system, associated with the line camera, that is configured to transmit only selected wavelengths. 7. The monitoring system of claim 1, wherein the data processing system is configured to provide substantially contemporaneous data output regarding at least one of the following quality parameters: material surface roughness, material texture etch quality, anti-reflection coating thickness, wafer thickness, metallization quality, material back reflectance back layer thickness, crystalline grain size and crystalline grain orientation, membrane surface roughness, thickness values for different layers of a multiple-layer membrane, thickness of a single layer membrane, variations in porosity of the electrode-coated membrane, presence of absorbing defects, or presence of non-opaque defects. 8. The monitoring system of claim 1, further comprising one of an edge sensor, a position encoder, or a time regulated trigger providing for triggering of the line camera at selected time intervals. 9. The monitoring system of claim 1, wherein the data processing system is configured to provide substantially contemporaneous data output regarding at least one of the following quality parameters: membrane surface roughness, thickness values for different layers of a multiple-layer membrane, thickness of a single layer membrane, variations in porosity of the electrode-coated membrane, presence of absorbing defects, or presence of non-opaque defects. 10. The monitoring system of claim 1, wherein the plurality of consecutive line images comprises a current line image and at least one previous line image, andwherein the data processing system is configured to determine the respective value of the quality parameter of the material for each of the at least two pixels from the respective linear array of pixels of the current line image further based on data representing the at least one previous line image. 11. The monitoring system of claim 10, wherein the data processing system is configured to determine the respective value of the quality parameter of the material for each of the at least two pixels from the respective linear array of pixels of the current line image by: calculating, based on the data representing the at least one previous line image, an average value of the quality parameter;calculating, based on data representing the current line image and for each of the at least two pixels from the respective linear array of pixels of the current line image, a respective current value of the quality parameter; andcomparing the respective current value of the quality parameter for each of the at least two pixels from the respective linear array of pixels of the current line image to the average value of the quality parameter. 12. The monitoring system of claim 1, wherein the illumination source comprises a first illumination source, and wherein the monitoring system further comprises a second illumination source positioned symmetrically opposite the first illumination source with respect to the line camera. 13. The monitoring system of claim 1, wherein the data processing system is configured to determine the respective value of the quality parameter of the material for each of the at least two pixels by: generating, based on data representing at least two consecutive line images, a composite image of a portion of the material, andcalculating, based on the composite image, at least one of an average grain size, a grain orientation value, or a number of grains per unit area. 14. The monitoring system of claim 13, wherein the data processing system is configured to generate the composite image by generating a dynamic composite image, and wherein the data processing system is configured to calculate at least one of the average grain size, the grain orientation value, or the number of grains per unit area by calculating, based on the dynamic composite image, a rolling value of at least one of the average grain size, the average grain orientation value, or the average number of grains per unit area. 15. The monitoring system of claim 1, wherein the data processing system is further configured to: determine a respective value of the quality parameter of the material for each pixel from the respective linear array of pixels for a plurality of consecutive line images; andoutput, based on the respective value of the quality parameter of the material for each pixel from the respective linear array of pixels for the plurality of consecutive line images, a two-dimensional mapping of the quality parameter of the material. 16. A method of monitoring a material, the method comprising: transporting a substantially planar material through a monitoring zone of a monitoring system;illuminating, by an illumination source, the material with light that spans across a width of the material, wherein the light has substantially uniform intensity across the width of the material;obtaining, by a line camera, a plurality of consecutive line images, each comprising a respective linear array of pixels, wherein each consecutive line image captures non-specular reflections of the light from a respective section of the material, each respective section spanning the width of the material; andcalculating, by a data processing system in digital communication with the line camera, based on data representing each consecutive line image, and for each of at least two pixels from the respective linear array of pixels, a respective value of a quality parameter of the material. 17. The method of monitoring a material of claim 16, further comprising comparing the respective value of the quality parameter of the material for each of the at least two pixels with a standard parameter value. 18. The method of monitoring a material of claim 16, further comprising identifying an irregularity in the material based upon the respective value of the quality parameter of the material for at least one of the at least two pixels. 19. The method of monitoring a material of claim 16, wherein the illumination source comprises: a light source that generates the light;a fiber optic providing for transmission of the light from the light source to a rectangular aperture; anda lens in optical communication with the rectangular aperture. 20. The method of monitoring a material of claim 16, wherein the illumination source comprises: one of a linear array of LEDs or a linear lamp that generates the light and a parabolic reflector providing for projection of the light toward the substantially planar material. 21. The method of monitoring a material of claim 16, wherein the illumination source is positioned with respect to the substantially planar material such that a line from the illumination source to the planar material forms an angle of less than 45° with a planar surface of the planar material. 22. The method of monitoring a material of claim 16, wherein the illumination source is positioned opposite the substantially planar material from the line camera. 23. The method of monitoring a material of claim 16, wherein the illumination source comprises a source of polychromatic light having a range of wavelengths and wherein obtaining the plurality of line images comprises capturing only light having selected wavelengths. 24. The method of monitoring a material of claim 16, wherein the data processing system calculates values of at least one of the following quality parameters; material surface roughness, material texture etch quality, anti-reflection coating thickness, wafer thickness, metallization quality, material back reflectance back layer thickness, crystalline grain size and crystalline grain orientation, membrane surface roughness, thickness values for different layers of a multiple-layer membrane, thickness of a single layer membrane, variations in porosity of the electrode-coated membrane, presence of absorbing defects, or presence of non-opaque defects.