A support structure for positioning an exchangeable object (e.g., patterning device) in a lithographic apparatus. The support structure has a chuck and at least two clamp mechanisms spaced from one another in a first direction. Each clamp mechanism has a plurality of vacuum sections to support the o
A support structure for positioning an exchangeable object (e.g., patterning device) in a lithographic apparatus. The support structure has a chuck and at least two clamp mechanisms spaced from one another in a first direction. Each clamp mechanism has a plurality of vacuum sections to support the object and apply a localized clamping force to the object to hold the object. The separation between the vacuum sections is in a second direction different from the first direction. The support structure may have a chuck and a clamp mechanism having a plurality of clamp sections to support the object and apply a clamping force to the object. The sections may move relative to each other. Each section may include a channel to communicate a low pressure to hold the object. The stiffness of the clamp mechanism(s) reduces and/or avoids stress and/or slip at the interface of the chuck/clamp and object.
대표청구항▼
1. A support structure for positioning an exchangeable object in a lithographic apparatus, the support structure comprising: a chuck; andat least two clamp mechanisms disposed on the chuck, the clamp mechanisms being spaced from one another in a first direction, each clamp mechanism comprising a plu
1. A support structure for positioning an exchangeable object in a lithographic apparatus, the support structure comprising: a chuck; andat least two clamp mechanisms disposed on the chuck, the clamp mechanisms being spaced from one another in a first direction, each clamp mechanism comprising a plurality of separate vacuum sections constructed and arranged to support the exchangeable object and apply a clamping force to the exchangeable object to hold the exchangeable object, the separation between vacuum sections being in a second direction different from the first direction, wherein each vacuum section of a respective clamp mechanism is movable relative to an adjacent vacuum section of the respective clamp mechanism in the second direction. 2. The support structure of claim 1, wherein the exchangeable object is a patterning device. 3. The support structure of claim 1, wherein each vacuum section further comprises a channel to communicate a low pressure to hold the exchangeable object in a position to prevent movement relative to the chuck. 4. The support structure of claim 1, wherein each vacuum section further comprises a contact surface in contact with the exchangeable object. 5. The support structure of claim 4, wherein each vacuum section forms a volume arranged to apply a substantially constant low pressure force to hold the exchangeable object thereon, wherein the volume is open to the exchangeable object at the contact surface. 6. The support structure of claim 1, wherein the second direction is perpendicular to the first direction. 7. A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the patterning device configured to provide a patterned beam of radiation, the apparatus comprising: a support structure configured to support the patterning device comprising the pattern;a projection system configured to project the patterned beam onto a target portion of the substrate;a substrate table configured to support the substrate; andat least two clamp mechanisms disposed on the support structure, the clamp mechanisms being spaced from one another in a first direction, each clamp mechanism comprising a plurality of separate vacuum sections constructed and arranged to support the patterning device and apply a clamping force to the patterning device to hold the patterning device, the separation between vacuum sections being in a second direction different from the first direction, wherein each vacuum section of a respective clamp mechanism is movable relative to an adjacent vacuum section of the respective clamp mechanism in the second direction. 8. A method for positioning an object within a lithographic apparatus, the method comprising: loading the object onto a chuck of the lithographic apparatus; andapplying a clamping force to the object to hold the object,wherein the clamping force is applied by at least two clamp mechanisms disposed on the chuck, the clamp mechanisms being spaced from one another in a first direction, each clamp mechanism comprising a plurality of separate vacuum sections constructed and arranged to support the exchangeable object and apply the clamping force, the separation between vacuum sections being in a second direction different from the first direction, wherein each vacuum section of a respective clamp mechanism is movable relative to an adjacent vacuum section of the respective clamp mechanism in the second direction. 9. The method of claim 8, wherein each vacuum section further comprises a channel to communicate a vacuum pressure from a vacuum source to the object, and wherein the method further comprises applying the vacuum pressure to each vacuum section to hold the object at a position to prevent movement relative to the chuck. 10. The method of claim 8, wherein the second direction is perpendicular to the first direction. 11. A clamp assembly for holding an exchangeable object in a lithographic apparatus, the clamp assembly comprising: at least two clamp mechanisms spaced from one another in a first direction, each clamp mechanism comprising a plurality of separate vacuum sections constructed and arranged to support the exchangeable object and apply a clamping force to the exchangeable object to hold the exchangeable object, the separation between vacuum sections being in a second direction different from the first direction, wherein each vacuum section of a respective clamp mechanism is movable relative to an adjacent vacuum section of the respective clamp mechanism in the second direction. 12. The clamp assembly of claim 11, wherein each vacuum section further comprises a channel to communicate a low pressure to hold the exchangeable object in a position to prevent movement. 13. The clamp assembly of claim 11, wherein each vacuum section further comprises a contact surface in contact with the exchangeable object. 14. The clamp assembly of claim 11, wherein the second direction is perpendicular to the first direction. 15. A support structure for positioning an exchangeable object in a lithographic apparatus, the support structure comprising: a chuck; andan elongate clamp mechanism on the chuck, the clamp mechanism comprising at least three clamp sections, arranged along the direction of elongation, constructed and arranged to support the exchangeable object and apply a clamping force to the exchangeable object to hold the exchangeable object, wherein at least one of the clamp sections is separated by open gaps located respectively at opposite sides, along the direction, of the at least one clamp section from respective adjacent clamp sections, each adjacent clamp section arranged at an opposite side, along the direction, of the at least one clamp section. 16. The support structure of claim 15, wherein each clamp section is movable relative to an adjacent clamp sections located along the direction. 17. A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the patterning device configured to provide a patterned beam of radiation, the apparatus comprising: a chuck; andan elongate clamp mechanism on the chuck, the clamp mechanism comprising at least three clamp sections, arranged along the direction of elongation, constructed and arranged to support the exchangeable object and apply a clamping force to the exchangeable object to hold the exchangeable object, wherein at least one of the clamp sections is separated by open gaps located respectively at opposite sides, along the direction, of the at least one clamp section from respective adjacent clamp sections, each adjacent clam section arranged at an opposite side, along the direction, of the at least one clamp section. 18. The apparatus of claim 17, further comprising: a substrate table configured to hold a substrate; anda projection system configured to project the patterned beam onto a target portion of the substrate. 19. The apparatus of claim 17, wherein each clamp section is movable relative to an adjacent clamp sections located along the direction. 20. A method for positioning an object within a lithographic apparatus, the method comprising: loading the object onto a chuck of the lithographic apparatus; andapplying a clamping force to the object to hold the object,wherein the clamping force is applied by at least one elongate clamping mechanism that is divided into a plurality of sections along the direction of elongation, each section being movable relative to an adjacent section in the direction of elongation and constructed and arranged to support the object.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (8)
Phillips, Alton H., Devices and methods for reducing residual reticle chucking forces.
Shiraishi, Naomasa; Takeuchi, Hitoshi; Owa, Soichi, Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.