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Laser irradiation method and laser irradiation apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-026/06
  • H01L-021/84
  • B23K-026/073
  • H01L-027/12
출원번호 US-0899983 (2010-10-07)
등록번호 US-9296068 (2016-03-29)
우선권정보 JP-2004-092933 (2004-03-26)
발명자 / 주소
  • Tanaka, Koichiro
  • Yamamoto, Yoshiaki
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Robinson, Eric J.
인용정보 피인용 횟수 : 0  인용 특허 : 123

초록

An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffrac

대표청구항

1. A laser irradiation method comprising: blocking a low-intensity part of a first laser beam emitted from a laser oscillator which is either a YAG laser or a YVO4 laser to form a second laser beam, by making the first laser beam pass through a slit;bending a traveling direction of the second laser

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