초록 ▼

An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of formi

An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of forming a substrate electrostatically held on the chuck surface with a surface layer including a substance having volatility in a vacuum chamber. The protective surface may be provided when a low vacuum pumping mode of operation is performed in a vacuum environment surrounding the chuck surface.

대표청구항 ▼

1. An impurity-doped layer formation apparatus comprising: a process chamber configured to perform a process of forming an impurity-doped layer including phosphorus or carbon on a substrate by irradiation of an ion beam including phosphorus or carbon onto the substrate; andan electrostatic chuck acc

1. An impurity-doped layer formation apparatus comprising: a process chamber configured to perform a process of forming an impurity-doped layer including phosphorus or carbon on a substrate by irradiation of an ion beam including phosphorus or carbon onto the substrate; andan electrostatic chuck accommodated in the process chamber and including a chuck surface for holding the substrate,wherein the impurity-doped layer formation apparatus is configured to shield the chuck surface at least for a certain duration during a process suspension period, in order to suppress transfer of foreign materials including phosphorus or carbon from a surface of the process chamber to the chuck surface,wherein the process chamber comprises a protective member having a protective surface for shielding the chuck surface, wherein the protective member is located outside a path of the ion beam in the process chamber,wherein the apparatus further comprises a substrate holder configured to support the electrostatic chuck so as to hold the substrate upright during the process, wherein the substrate holder movably supports the electrostatic chuck to or from an evacuation position of the electrostatic chuck at which the chuck surface is in proximity to or in contact with the protective surface,wherein the substrate holder comprises a first driving unit that provides movement of the electrostatic chuck in a first direction for mechanical scan of the substrate relative to the ion beam, and a second driving unit that provides movement of the electrostatic chuck in a second direction different from the first direction, wherein the second driving unit moves the electrostatic chuck to or from the evacuation position,wherein the first driving unit is mounted on the second driving unit so that the first driving unit can be moved by the second driving unit in the second direction,wherein the protective member is located on a path of movement of the electrostatic chuck by the second driving unit, andwherein the evacuation position of the electrostatic chuck is defined at an end of a range of movement in which the electrostatic chuck can be moved by the second driving unit. 2. The apparatus according to claim 1, further comprising: a vacuum pumping system for evacuating the process chamber,wherein vacuum is maintained in the process chamber and the vacuum pumping system is suspended for at least a certain duration during the process suspended period. 3. The apparatus according to claim 1, wherein an adsorption operation of the electrostatic chuck is suspended while the chuck surface is shielded. 4. The apparatus according to claim 1, wherein the protective surface is configured to be movable between a standby position during the process and a shielding position at which the chuck surface is shielded. 5. The apparatus according to claim 1, further comprising: a control unit configured to control a protection operation for shielding the chuck surface with a protective member. 6. A vacuum processing apparatus comprising: a process chamber configured to perform a process of forming a surface layer including a substance exhibiting volatility in a vacuum environment on a substrate by irradiation of an ion beam including the substance onto the substrate; andan electrostatic chuck accommodated in the process chamber and including a chuck surface for holding the substrate,wherein a shield for the chuck surface is provided at least for a certain duration during a process suspension period in order to suppress transfer of foreign materials including the substance from a surface of the process chamber to the chuck surface, and the shield for the chuck surface is removed while the process is being performed,wherein the process chamber comprises a protective member having a protective surface for shielding the chuck surface,wherein the protective member is located outside a path of the ion beam in the process chamber,wherein the apparatus further comprises a substrate holder configured to support the electrostatic chuck so as to hold the substrate upright during the process, wherein the substrate holder movably supports the electrostatic chuck to or from an evacuation position of the electrostatic chuck at which the chuck surface is in proximity to or in contact with the protective surface,wherein the substrate holder comprises a first driving unit that provides movement of the electrostatic chuck in a first direction for mechanical scan of the substrate relative to the ion beam, and a second driving unit that provides movement of the electrostatic chuck in a second direction different from the first direction, wherein the second driving unit moves the electrostatic chuck to or from the evacuation position,wherein the first driving unit is mounted on the second driving unit so that the first driving unit can be moved by the second driving unit in the second direction,wherein the protective member is located on a path of movement of the electrostatic chuck by the second driving unit, andwherein the evacuation position of the electrostatic chuck is defined at an end of a range of movement in which the electrostatic chuck can be moved by the second driving unit. 7. The apparatus according to claim 1, wherein the second direction is a rotational direction about an axis perpendicular to the first direction. 8. The apparatus according to claim 1, wherein an ion beam emission port is provided within the process chamber to receive the ion beam from upstream of the process chamber, and wherein the protective member is located toward the ion beam emission port with respect to a path of the substrate in the mechanical scan provided by the first driving unit. 9. The apparatus according to claim 1, wherein the protective member is secured inside the process chamber.