Multiplexed heater array using AC drive for semiconductor processing
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H05B-003/68
H01L-021/67
H01L-021/683
출원번호
US-0406978
(2012-02-28)
등록번호
US-9324589
(2016-04-26)
발명자
/ 주소
Pease, John
Benjamin, Nell
출원인 / 주소
LAM RESEARCH CORPORATION
대리인 / 주소
Buchanan Ingersoll & Rooney
인용정보
피인용 횟수 :
1인용 특허 :
77
초록▼
A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable multiplexing layout, and electronics to independently control and power the planar heater zones. A substrate suppo
A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable multiplexing layout, and electronics to independently control and power the planar heater zones. A substrate support assembly in which the heating plate is incorporated includes an electrostatic clamping electrode and a temperature controlled base plate. Methods for manufacturing the heating plate include bonding together ceramic or polymer sheets having planar heater zones, branch transmission lines, common transmission lines and vias. The heating plate is capable of being driven by AC current or direct current phase alternating power, which has an advantage of minimizing DC magnetic field effects above the substrate support assembly and reduce plasma non-uniformity caused by DC magnetic fields.
대표청구항▼
1. A heating plate for a substrate support assembly used to support a semiconductor substrate in a semiconductor processing apparatus, the heating plate comprising: a first electrically insulating layer; a plurality of heater zones comprising at least first, second, third and fourth heater zones, th
1. A heating plate for a substrate support assembly used to support a semiconductor substrate in a semiconductor processing apparatus, the heating plate comprising: a first electrically insulating layer; a plurality of heater zones comprising at least first, second, third and fourth heater zones, the heater zones distributed across the first electrically insulating layer and operable to tune a spatial temperature profile on the substrate;a plurality of diodes including at least first, second, third, fourth, fifth, sixth, seventh, and eighth diodes;a plurality of first power lines comprising a first electrically conductive branch transmission line electrically connected to the first heater zone via the first diode and the second heater zone via the third diode and a third electrically conductive branch transmission line electrically connected to the first heater zone via the second diode and the second heater zone via the fourth diode and a second electrically conductive branch transmission line electrically connected to the third heater zone via the fifth diode and the fourth heater zone via the seventh diode and a fourth electrically conductive branch transmission line electrically connected to the third heater zone via the sixth diode and the fourth heater zone via the eighth diode; anda plurality of second power lines comprising at least a first electrically conductive common transmission line electrically connected to the first heater zone and the third heater zone and a second electrically conductive common transmission line electrically connected to the second heater zone and the fourth heater zone,wherein the first power lines and/or second power lines are spatially arranged to minimize electromagnetic fields above the heating plate and reduce plasma non-uniformity caused by such electromagnetic fields;wherein each heater zone includes at least one resistance heater element. 2. The heating plate of claim 1, wherein: an anode of the first diode is connected to the first branch transmission line and a cathode of the first diode is connected to the first heater zone;an anode of the second diode is connected to the first heater zone and a cathode of the second diode is connected to the third branch transmission line;an anode of the third diode is connected to the first branch transmission line and a cathode of the third diode is connected to the second heater zone;an anode of the fourth diode is connected to the second heater zone and a cathode of the fourth diode is connected to the third branch transmission line;an anode of the fifth diode is connected to the second branch transmission line and a cathode of the fifth diode is connected to the third heater zone;an anode of the sixth diode is connected to the third heater zone and a cathode of the sixth diode is connected to the fourth branch transmission line;an anode of the seventh diode is connected to the second branch transmission line and a cathode of the seventh diode is connected to the fourth heater zone; andan anode of the eighth diode is connected to the fourth heater zone and a cathode of the eighth diode is connected to the fourth branch transmission line. 3. The heating plate of claim 2, wherein: (a) the heater zones are in a first plane; the common transmission lines are in a second plane parallel to the first plane; the branch transmission lines are in a third plane parallel to the first plane; the first, second and third planes are separated from one another by the first and a second electrically insulating layers; the common transmission lines are electrically connected to the heater zones by vias extending vertically in the first electrically insulating layer; the respective diodes of the branch transmission lines are electrically connected to the heater zones by vias extending vertically in thei first and second electrically insulating layers;(b) the heater zones and the branch transmission lines are in the first plane; the common transmission lines are in the second plane parallel to the first plane; the first and second planes are separated from one another by the first electrically insulating layer; the common transmission lines are electrically connected to the heater zones by vias extending vertically in the first electrically insulating layer;(c) the heater zones and the common transmission lines are in the first plane; the first and second branch transmission lines are in the third plane parallel to the first plane; the third and fourth branch transmission lines are in the second plane parallel to the first plane; the first and second planes are separated by the first electrically insulating layer; the second and third planes are separated by the second electrically insulating layer; the respective diodes of the first and second branch transmission lines are electrically connected to the heater zones by vias extending through the first and second electrically insulating layers; the respective diodes of the third and fourth branch transmission lines are electrically connected to the heater zones by vias extending through the first electrically insulating layer;(d) the heater zones and the third and fourth branch transmission lines are in the first plane; the first and second branch transmission lines are in the third plane parallel to the first plane; the common transmission lines are in the second plane parallel to the first plane; the first and second planes are separated by the first electrically insulating layer; the second and third planes are separated by the second electrically insulating layer; the respective diodes of the first and second branch transmission lines are electrically connected to the heater zones by vias extending through the first and second electrically insulating layers; the common transmission lines are electrically connected to the heater zones by vias extending through the first electrically insulating layer;(e) the heater zones and the common transmission lines are in the first plane; the branch transmission lines are in the second plane parallel to the first plane; the first and second planes are separated from one another by the first electrically insulating layer; the respective diodes of the branch transmission lines are electrically connected to the heater zones by vias extending vertically in the first electrically insulating layer; or(f) the heater zones are in the first plane; the common transmission lines are in the second plane parallel to the first plane; the first and second branch transmission lines are in the third plane parallel to the first plane; the third and fourth branch transmission lines are in a fourth plane parallel to the first plane; the first and second planes are separated by the first electrically insulating layer; the second and third planes are separated by the second electrically insulating layer; the third and fourth planes are separated by a third electrically insulating layer; the respective diodes of the first and second branch transmission lines are electrically connected to the heater zones by vias extending through the first and second electrically insulating layers; the respective diodes of the third and fourth branch transmission lines are electrically connected to the heater zones by vias extending through the first, second and third electrically insulating layers; the common transmission lines are electrically connected to the heater zones by vias extending through the first electrically insulating layer. 4. The heating plate of claim 2, wherein the heater zones are planar heater zones sized such that: (a) each planar heater zone is not larger than four device dies being manufactured on the semiconductor substrate, or(b) each planar heater zone is not larger than two device dies being manufactured on the semiconductor substrate, or(c) each planar heater zone is not larger than one device die being manufactured on the semiconductor substrate, or(d) the area of each planar heater zone is between 2 and 3 square centimeters, or(e) the heating plate includes 100 to 400 planar heater zones, or(f) each planar heater zone is 1 to 15 cm2, or(g) each planar heater zone is 16 to 100 cm2, or(h) each planar heater zone is scaled with sizes of device dies on the semiconductor substrate and the overall size of the semiconductor substrate. 5. The heating plate of claim 2, wherein (a) the first electrically insulating layer comprises a polymer material, a ceramic material, or a combination thereof; (b) a total area of the heater zones is from 50% to 90% or over 90% of an upper surface of the heating plate; and/or (c) the heater zones are arranged in a rectangular grid, hexagonal grid or polar array; and the heater zones are separated from each other by gaps at least 1 millimeter in width and at most 10 millimeters in width. 6. The heating plate of claim 2, wherein the heating plate is configured to rectify a power signal, such that the heating plate is capable of being driven by AC current. 7. The heating plate of claim 1, wherein current on the first power lines is committed in the opposite direction of current committed on the second power lines. 8. The heating plate of claim 7, wherein: (a) a segment of one power line is above a segment of another power line in a vertical plane; (b) a segment of one power line is parallel and adjacent to the segment of another power line; (c) each heater zone is electrically coupled to three power lines; (d) said heating plate comprises at least 10 heaters; (e) the first and second power lines are each configured to conduct at least approximately one kilowatt of power to the heater zones; or (f) at least one power line is configured to be a high current carrying bus. 9. The heating plate of claim 7, wherein: (a) the heater zones are arranged in a pattern selected from the group consisting of: a rectangular grid; a hexagonal grid; a polar array and concentric rings; (b) each heater zone is separately addressable by a power source; (c) a power line which is electrically connected to a heater zone on a first half of the heating plate is not electrically coupled to any heater zones not on the first half of the heating plate; or (d) the heater zones are coupled to more power lines than twice the square root of the number of heater zones. 10. A substrate support assembly comprising: an electrostatic chuck (ESC) including an electrostatic clamping layer having at least one clamping electrode configured to electrostatically clamp a semiconductor substrate on the substrate support assembly;the heating plate of claim 2 arranged below the electrostatic clamping layer; anda cooling plate attached to a lower side of the heating plate by a thermal barrier layer. 11. The substrate support assembly of claim 10, wherein: (a) the branch transmission lines are connected to leads electrically insulated from each other and extended through at least one branch transmission conduit in the cooling plate and the common transmission lines are connected to leads electrically insulated from each other and extended through at least one common transmission conduit in the cooling plate; or(b) the branch transmission lines and common transmission lines are connected to terminal connectors embedded in the cooling plate. 12. The substrate support assembly of claim 10, further comprising a controller operable to selectively supply AC current to one or more of the heater zones. 13. The substrate support assembly of claim 12, wherein the controller is operable to selectively supply AC current to: (a) only the first heater zone by connecting an AC power supply to the first and third branch transmission lines and by connecting electrical common to the first common transmission line,(b) only the second heater zone by connecting the AC power supply to the first and third branch transmission lines and by connecting electrical common to the second common transmission line,(c) only the third heater zone by connecting the AC power supply to the second and fourth branch transmission lines and by connecting electrical common to the first common transmission line,(d) only the fourth heater zone by connecting the AC power supply to the second and fourth branch transmission lines and by connecting electrical common to the second common transmission line,(e) only the first and second heater zones by connecting the AC power supply to the first and third branch transmission lines and by connecting electrical common to the first and second common transmission lines,(f) only the first and third heater zones by connecting the AC power supply to the first, second, third and fourth branch transmission lines and by connecting electrical common to the first common transmission line,(g) only the second and fourth heater zones by connecting the AC power supply to the first, second, third and fourth branch transmission lines and by connecting electrical common to the second common transmission line,(h) only the third and fourth heater zones by connecting the AC power supply to the second and fourth branch transmission lines and by connecting electrical common to the first and second common transmission lines, and(i) all of the heater zones by connecting the AC power supply to the first, second, third and fourth branch transmission lines and by connecting electrical common to the first and second common transmission lines. 14. The substrate support assembly of claim 13, wherein AC current from the AC power supply does not have a DC component. 15. The substrate support assembly of claim 12, wherein the controller is operable to selectively supply AC current to: (a) only the first heater zone by cycling between a state wherein the first branch transmission line is connected to a DC power supply, the third branch transmission line is electrically isolated and the first common transmission line is connected to electrical common and a state wherein the first branch transmission line is electrically isolated, the third branch transmission line is connected to electrical common and the first common transmission line is connected to the DC power supply,(b) only the second heater zone by cycling between a state wherein the first branch transmission line is connected to the DC power supply, the third branch transmission line is electrically isolated and the second common transmission line is connected to electrical common and a state wherein the first branch transmission line is electrically isolated, the third branch transmission line is connected to electrical common and the second common transmission line is connected to the DC power supply,(c) only the third heater zone by cycling between a state wherein the second branch transmission line is connected to the DC power supply, the fourth branch transmission line is electrically isolated and the first common transmission line is connected to electrical common and a state wherein the second branch transmission line is electrically isolated, the fourth branch transmission line is connected to electrical common and the first common transmission line is connected to the DC power supply,(d) only the fourth heater zone by cycling between a state wherein the second branch transmission line is connected to the DC power supply, the fourth branch transmission line is electrically isolated and the second common transmission line is connected to electrical common and a state wherein the second branch transmission line is electrically isolated, the fourth branch transmission line is connected to electrical common and the second common transmission line is connected to the DC power supply,(e) only the first and second heater zones by cycling between a state wherein the first branch transmission line is connected to the DC power supply, the third branch transmission line is electrically isolated and the first and second common transmission lines are connected to electrical common and a state wherein the first branch transmission line is electrically isolated, the third branch transmission line is connected to electrical common and the first and second common transmission lines are connected to the DC power supply,(f) only the first and third heater zones by cycling between a state wherein the first and second branch transmission lines are connected to the DC power supply, the third and fourth branch transmission lines are electrically isolated and the first common transmission line is connected to electrical common and a state wherein the first and second branch transmission lines are electrically isolated, the third and fourth branch transmission lines are connected to electrical common and the first common transmission line is connected to the DC power supply,(g) only the second and fourth heater zones by cycling between a state wherein the first and second branch transmission lines are connected to the DC power supply, the third and fourth branch transmission lines are electrically isolated and the second common transmission line is connected to electrical common and a state wherein the first and second branch transmission lines are electrically isolated, the third and fourth branch transmission lines are connected to electrical common and the second common transmission line is connected to the DC power supply,(h) only the third and fourth heater zones by cycling between a state wherein the second branch transmission line is connected to the DC power supply, the fourth branch transmission line is electrically isolated and the first and second common transmission lines are connected to electrical common and a state wherein the second branch transmission line is electrically isolated, the fourth branch transmission line is connected to electrical common and the first and second common transmission lines are connected to the DC power supply, and(i) all of the heater zones by cycling between a state wherein the first and second branch transmission lines are connected to the DC power supply, the third and fourth branch transmission lines are electrically isolated and the first and second common transmission lines are connected to electrical common and a state wherein the first and second branch transmission lines are electrically isolated, the third and fourth branch transmission lines are connected to electrical common and the first and second common transmission lines are connected to the DC power supply;wherein the DC power supply outputs a constant voltage. 16. The substrate support assembly of claim 12, wherein the AC current has a frequency of at least 10 Hz. 17. The substrate support assembly of claim 10, further comprising at least one primary heater layer arranged above or below the first electrically insulating layer of the heating plate, wherein the primary heater layer is electrically insulated from the heater zones, the branch transmission lines, and the common transmission lines of the heating plate; the primary heater layer includes at least one heater which provides mean temperature control of the semiconductor substrate; the heater zones provide radial and azimuthal temperature profile control of the semiconductor substrate, during processing thereof. 18. The substrate support assembly of claim 17, wherein the primary heater layer includes two or more heaters. 19. The substrate support assembly of claim 10, further comprising a power controller capable of digital switching. 20. The substrate support assembly of claim 10, further comprising a power controller capable of producing at least one of time-division multiplexed power, pulse-width modulated power, alternating current power, or direct current phase alternating power.
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