최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
DataON 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Edison 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0445238 (2012-04-12) |
등록번호 | US-9330825 (2016-05-03) |
발명자 / 주소 |
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출원인 / 주소 |
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인용정보 | 피인용 횟수 : 0 인용 특허 : 180 |
A field system includes a first component having at least one first field source having opposite polarities and a second component having at least one second field source having opposite polarities. At least one of the first and second components has a movement relative to the other of the component
A field system includes a first component having at least one first field source having opposite polarities and a second component having at least one second field source having opposite polarities. At least one of the first and second components has a movement relative to the other of the components to produce a field interaction therebetween. The at least one first and the at least one second field sources are oriented relative to each other such that in the field interaction the resulting repelling forces and attractive forces substantially cancel each other out and there is an increase and a decrease in the field strength of at least some of the field sources. Therefore, the field system, which can be a magnetic configuration system, provides a field strength change with a minimum energy input which can increase the efficiency of many machines such as MRI or electricity generators.
1. A field system comprising: a first component having at least one first field source having opposite polarities; anda second component having at least one second field source having a body having opposite polarities to define a field direction, wherein the body comprising at least one material suc
1. A field system comprising: a first component having at least one first field source having opposite polarities; anda second component having at least one second field source having a body having opposite polarities to define a field direction, wherein the body comprising at least one material such that within the at least one material the field direction extending substantially in a single direction,wherein at least one of the first and second components are adapted to be capable of having a movement relative to the other of the components to produce a field interaction therebetween, wherein the field interaction produces a plurality of interaction forces which result in a plurality of torques;wherein the at least one first and the at least one second field sources are oriented relative to each other such that repelling forces associated with the same polarities of the at least one first field source and the at least one second field source and attractive forces associated with the opposite polarities of the at least one first field source and the at least one second field source substantially cancel each other out such that a sum of the resulting torques is substantially zero at any given time, andwherein the field interaction produces an increase in at least a first field of a plurality of fields associated with the polarities of the at least one first and at least one second field sources and a decrease in at least a second field of the plurality of fields. 2. The field system of claim 1, wherein the field interaction increases at least a field associated with at least one of the polarities of the at least one first field source and decreases at least a field associated with at least another one of the polarities of the at least one first field source. 3. The field system of claim 1, wherein the at least one first and the at least one second field sources have at least a partial complementary shape relation relative to one another, wherein the at least partial complementary shape relation comprises a substantial reverse geometrical shape relation between at least a portion of the at least one first field source and at least a portion of the at least one second field source such that one portion can be substantially fitted into or received by the other portion. 4. The field system of claim 3, wherein the at least partial complementary shape relation defines a mating relation, wherein each first field source of a plurality of the at least one first field source defines at least one opening to substantially receive at least a portion of the at least partial complementary shaped field source of the at least one second field source. 5. The field system of claim 1, wherein the at least one first field source of the first component comprises a plurality of field sources forming a Halbach array. 6. The field system of claim 5, wherein the Halbach array has at least a partial complementary shape relation relative to the at least one second field source. 7. The field system of claim 5, wherein the Halbach array has a mating relation relative to the at least one second field source. 8. The field system of claim 5, wherein the Halbach array defines a plurality of openings for a mating relation with the at least one second field source of the second component. 9. The field system of claim 1, wherein the first component comprises a first pair of corresponding members of the at least one first field source and the second component comprises a second pair of corresponding members of the at least one second field source, wherein the corresponding members of the first and second pairs are spaced apart in a symmetry relation at a separation distance to substantially prevent a field interaction therebetween. 10. The field system of claim 9, wherein the symmetry relation comprises at least one of: a bilateral symmetry such that the corresponding members of at least the first pair and second pair are mirror images of one another relative to a mirror plane which is perpendicularly bisecting the separation distance;a translational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a linear translation equal to the separation distance; ora rotational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a rotation of less than 360 degrees relative to an axis of rotation. 11. The field system of claim 9, wherein each of the first pair of corresponding members have a mating relation relative to a respective corresponding member in the second pair of corresponding members. 12. The field system of claim 9, wherein at least one of the first or second pairs of corresponding members define a pair of Halbach arrays. 13. The field system of claim 12, wherein the pair of Halbach arrays define at least one pair of corresponding openings for a mating relation with the second pair of corresponding members. 14. The field system of claim 9, wherein the corresponding members of the first and second pairs respectively form a first and a second pair of Halbach arrays. 15. The field system of claim 14, wherein the first pair of Halbach arrays have at least partial complementary shape relations relative to the corresponding members of the second pair. 16. The field system of claim 14, wherein the first pair of Halbach arrays have mating relations relative to the corresponding members of the second pair. 17. The field system of claim 9, wherein the corresponding members in at least one of the first pair of corresponding members or the second pair of corresponding members have a reverse polarity relation relative to one another, and the corresponding members in the other of the first pair of corresponding members or the second pair of corresponding members have an identical polarity relation relative to one another. 18. The field system of claim 1, wherein the relative movement comprises at least one of a reciprocating movement, an oscillatory movement, a rotary movement, a spinning movement, a revolving movement, or a rolling movement. 19. The field system of claim 1, wherein the first and second components defining a static relation relative to one another. 20. The field system of claim 1, wherein the at least one of the first and second field sources comprises at least one of a permanent magnet, an electromagnet, an electret, a magnetized ferromagnetic material, a soft magnetic material, or a superconductive magnetic material. 21. The field system of claim 1, further comprising: a third component having a plurality of third field sources each having opposite polarities,wherein a relative movement of the third component with respect to the first and second components produces a field interaction with the first and second components;wherein the plurality of third field sources are oriented relative to the at least one first and the at least one second field sources such that the field interaction produces a net repulsive force experienced by, and causing a motion of, the third component between a first and a second position. 22. A field system comprising a first component having at least one first field source having opposite polarities wherein each first field source of a plurality of the at least one first field source having at least one opening; anda second component having at least one second field source having a body having opposite polarities, to define a field direction, wherein the body comprising at least one material such that within the at least one material the field direction extending substantially in a single direction,wherein at least one of the first and second components having a movement relative to the other of the components to produce a field interaction therebetween,wherein the field interaction produces a plurality of interaction forces which results in a plurality of torques such that both the interaction forces and the resulting torques act upon the movable component;wherein the at least one first and the at least one second field sources are oriented relative to each other such that the field interaction satisfies requirements that:at least one of a sum of the interaction forces or a sum of the resulting torques is substantially zero; andthe field interaction produces an increase in at least a first field of a plurality of fields associated with the polarities of the at least one first and at least one second field sources and a decrease in at least a second field of the plurality of fields. 23. A method of changing a field strength of at least a portion of at least one field source comprising: arranging a first component having at least one first field source having opposite polarities relative to a second component having at least one second field source having a body having opposite polarities to define a field direction, wherein the body comprising at least one material such that within the at least one material the field direction extending substantially in a single direction, wherein the arrangement being such that a movement of at least one of the first and second components relative to the other of the components produces a field interaction therebetween; andorienting the at least one first and the at least one second field sources relative to each other such that the field interaction between the first and second components generate repelling forces associated with the same polarities of the at least one first field source and the at least one second field source and attractive forces associated with the opposite polarities of the at least one first field source and the at least one second field source substantially cancelling each other out to result in a sum of the resulting torques being substantially zero at any given time,wherein the field interaction produces an increase in at least a first field of a plurality of fields associated with the polarities of the at least one first and at least one second field sources and a decrease in at least a second field of the plurality of fields. 24. The field system of claim 22, wherein the field interaction increases at least a field associated with at least one of the polarities of the at least one first field source and decreases at least a field associated with at least another one of the polarities of the at least one first field source. 25. The field system of claim 22, wherein the at least one first and the at least one second field sources have at least a partial complementary shape relation relative to one another, wherein the at least partial complementary shape relation comprises a substantial reverse geometrical shape relation between at least a portion of the at least one first field source and at least a portion of the at least one second field source such that one portion can be substantially fitted into or received by the other portion. 26. The field system of claim 25, wherein the at least partial complementary shape relation defines a mating relation, wherein the at least one opening of the plurality of the at least one first field source substantially receive at least a portion of the at least partial complementary shaped field source of the at least one second field source. 27. The field system of claim 22, wherein the at least one first field source of the first component comprises a plurality of field sources forming a Halbach array. 28. The field system of claim 27, wherein the Halbach array has at least a partial complementary shape relation relative to the at least one second field source. 29. The field system of claim 27, wherein the Halbach array has a mating relation relative to the at least one second field source. 30. The field system of claim 27, wherein the Halbach array defines a plurality of openings for a mating relation with the at least one second field source of the second component. 31. The field system of claim 22, wherein the first component comprises a first pair of corresponding members of the at least one first field source and the second component comprises a second pair of corresponding members of the at least one second field source, wherein the corresponding members of the first and second pairs are spaced apart in a symmetry relation at a separation distance to substantially prevent a field interaction therebetween. 32. The field system of claim 31, wherein the symmetry relation comprises at least one of: a bilateral symmetry such that the corresponding members of at least the first pair and second pair are mirror images of one another relative to a mirror plane which is perpendicularly bisecting the separation distance;a translational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a linear translation equal to the separation distance; ora rotational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a rotation of less than 360 degrees relative to an axis of rotation. 33. The field system of claim 31, wherein each of the first pair of corresponding members have a mating relation relative to a respective corresponding member in the second pair of corresponding members. 34. The field system of claim 31, wherein at least one of the first or second pairs of corresponding members define a pair of Halbach arrays. 35. The field system of claim 34, wherein the pair of Halbach arrays define at least one pair of corresponding openings for a mating relation with the second pair of corresponding members. 36. The field system of claim 31, wherein the corresponding members of the first and second pairs respectively form a first and a second pair of Halbach arrays. 37. The field system of claim 36, wherein the first pair of Halbach arrays have at least partial complementary shape relations relative to the corresponding members of the second pair. 38. The field system of claim 36, wherein the first pair of Halbach arrays have mating relations relative to the corresponding members of the second pair. 39. The field system of claim 31, wherein the corresponding members in at least one of the first pair of corresponding members or the second pair of corresponding members have a reverse polarity relation relative to one another, and the corresponding members in the other of the first pair of corresponding members or the second pair of corresponding members have an identical polarity relation relative to one another. 40. The field system of claim 22, wherein the relative movement comprises at least one of a reciprocating movement, an oscillatory movement, a rotary movement, a spinning movement, a revolving movement, or a rolling movement. 41. The field system of claim 22, wherein the first and second components defining a static relation relative to one another. 42. The field system of claim 22, wherein the at least one of the first and second field sources comprises at least one of a permanent magnet, an electromagnet, an electret, a magnetized ferromagnetic material, a soft magnetic material, or a superconductive magnetic material. 43. The field system of claim 22, further comprising: a third component having a plurality of third field sources each having opposite polarities,wherein a relative movement of the third component with respect to the first and second components produces a field interaction with the first and second components;wherein the plurality of third field sources are oriented relative to the at least one first and the at least one second field sources such that the field interaction produces a net repulsive force experienced by, and causing a motion of, the third component between a first and a second position. 44. The method of claim 23, wherein the field interaction increases at least a field associated with at least one of the polarities of the at least one first field source and decreases at least a field associated with at least another one of the polarities of the at least one first field source. 45. The method of claim 23, wherein the at least one first and the at least one second field sources have at least a partial complementary shape relation relative to one another, wherein the at least partial complementary shape relation comprises a substantial reverse geometrical shape relation between at least a portion of the at least one first field source and at least a portion of the at least one second field source such that one portion can be substantially fitted into or received by the other portion. 46. The method of claim 45, wherein the at least partial complementary shape relation defines a mating relation, wherein each first field source of a plurality of the at least one first field source defines at least one opening to substantially receive at least a portion of the at least partial complementary shaped field source of the at least one second field source. 47. The method of claim 23, wherein the at least one first field source of the first component comprises a plurality of field sources forming a Halbach array. 48. The method of claim 47, wherein the Halbach array has at least a partial complementary shape relation relative to the at least one second field source. 49. The method of claim 47, wherein the Halbach array has a mating relation relative to the at least one second field source. 50. The method of claim 47, wherein the Halbach array defines a plurality of openings for a mating relation with the at least one second field source of the second component. 51. The method of claim 23, wherein the first component comprises a first pair of corresponding members of the at least one first field source and the second component comprises a second pair of corresponding members of the at least one second field source, wherein the corresponding members of the first and second pairs are spaced apart in a symmetry relation at a separation distance to substantially prevent a field interaction therebetween. 52. The method of claim 51, wherein the symmetry relation comprises at least one of: a bilateral symmetry such that the corresponding members of at least the first pair and second pair are mirror images of one another relative to a mirror plane which is perpendicularly bisecting the separation distance;a translational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a linear translation equal to the separation distance; ora rotational symmetry such that the corresponding members of at least the first pair and second pair can be coincided to one another after a rotation of less than 360 degrees relative to an axis of rotation. 53. The method of claim 51, wherein each of the first pair of corresponding members have a mating relation relative to a respective corresponding member in the second pair of corresponding members. 54. The method of claim 51, wherein at least one of the first or second pairs of corresponding members define a pair of Halbach arrays. 55. The method of claim 54, wherein the pair of Halbach arrays define at least one pair of corresponding openings for a mating relation with the second pair of corresponding members. 56. The method of claim 51, wherein the corresponding members of the first and second pairs respectively form a first and a second pair of Halbach arrays. 57. The method of claim 56, wherein the first pair of Halbach arrays have at least partial complementary shape relations relative to the corresponding members of the second pair. 58. The method of claim 56, wherein the first pair of Halbach arrays have mating relations relative to the corresponding members of the second pair. 59. The method of claim 51, wherein the corresponding members in at least one of the first pair of corresponding members or the second pair of corresponding members have a reverse polarity relation relative to one another, and the corresponding members in the other of the first pair of corresponding members or the second pair of corresponding members have an identical polarity relation relative to one another. 60. The method of claim 23, wherein the relative movement comprises at least one of a reciprocating movement, an oscillatory movement, a rotary movement, a spinning movement, a revolving movement, or a rolling movement. 61. The method of claim 23, wherein the first and second components defining a static relation relative to one another. 62. The method of claim 23, wherein the at least one of the first and second field sources comprises at least one of a permanent magnet, an electromagnet, an electret, a magnetized ferromagnetic material, a soft magnetic material, or a superconductive magnetic material. 63. The method of claim 23, further comprising: a third component having a plurality of third field sources each having opposite polarities,wherein a relative movement of the third component with respect to the first and second components produces a field interaction with the first and second components;wherein the plurality of third field sources are oriented relative to the at least one first and the at least one second field sources such that the field interaction produces a net repulsive force experienced by, and causing a motion of, the third component between a first and a second position. 64. The field system of claim 1, wherein the at least one first field source of the first component comprises a plurality of field sources forming a substantially flat surface. 65. The field system of claim 23, wherein the at least one first field source of the first component comprises a plurality of field sources forming a substantially flat surface.
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