Systems, apparatus and methods are disclosed for coupling a wafer style primary element of a process measurement system between process pipes in a manner which aligns the primary element with the process pipes, while maintaining alignment and preventing leaking in the event of a dynamic shock to the
Systems, apparatus and methods are disclosed for coupling a wafer style primary element of a process measurement system between process pipes in a manner which aligns the primary element with the process pipes, while maintaining alignment and preventing leaking in the event of a dynamic shock to the process pipes.
대표청구항▼
1. A process measurement system alignment device for maintaining alignment of a wafer style primary element between flanges of first and second process pipes, the device comprising: an alignment ring having an inner surface forming an interior region into which the primary element can be inserted su
1. A process measurement system alignment device for maintaining alignment of a wafer style primary element between flanges of first and second process pipes, the device comprising: an alignment ring having an inner surface forming an interior region into which the primary element can be inserted such that the alignment ring encompasses at least of portion of the primary element;a channel formed in the alignment ring and configured to receive an interconnecting neck of the primary element when the primary element is inserted into the interior region of the alignment ring such that the interconnecting neck of the primary element extends outside of the alignment ring; anda plurality of flange fastener receiving apertures formed in the alignment ring and configured to be aligned with flange apertures in the flanges of the first and second process pipes and to receive flange fasteners extending through aligned flange apertures. 2. The process measurement system alignment device of claim 1 including a plurality of alignment tabs positioned on one or more outer surfaces of the alignment ring and configured to make contact with one of the flanges of the first and second process pipes to align the alignment ring and the primary element with the process pipes. 3. The process measurement system alignment device of claim 1, wherein the flange fasteners comprise threaded studs or bolts and wherein the flange fastener receiving apertures are threaded apertures configured to receive the threaded studs or bolts. 4. The process measurement system alignment device of claim 3, wherein the plurality of alignment tabs are spaced around the alignment ring. 5. The process measurement system alignment device of claim 4, wherein at least one of the plurality of alignment tabs is configured to be removably attached to the alignment ring such that the at least one of the alignment tabs can be removed to allow the alignment ring to be inserted between the flanges of the first and second process pipes, and subsequently reattached after the alignment ring is positioned between the flanges of the first and second process pipes. 6. The process measurement system alignment device of claim 4, and further comprising a plurality of alignment pins spaced around the inner surface of the alignment ring to maintain the primary element at a proper position within the interior region and thereby aligned with the first and second process pipes. 7. The process measurement system alignment device of claim 6, wherein the plurality of alignment pins include first alignment pins on an upper portion of the inner surface of the alignment ring and second alignment pins on a lower portion of the inner surface of the alignment ring, and wherein the second alignment pins extend further into the interior region than do the first alignment pins. 8. The process measurement system alignment device of claim 4, and further comprising a plurality of alignment screws extending from the one or more outer surfaces of the alignment ring to the inner surface of the alignment ring to adjust a position of the primary element within the interior region and thereby align the primary element with the first and second process pipes. 9. The process measurement system of claim 1, and further comprising a plurality of sleeves configured to be placed over the flange fasteners in order to position the flange fasteners in centers of the flange apertures. 10. A system for measuring a process variable of a process fluid in first and second process pipes having flanges, the system comprising: a process transmitter;a wafer style primary element having an interconnecting neck for use in coupling the primary element to the process transmitter, the primary element configured to be positioned between the flanges in contact with the process fluid for use in measuring the process variable;a plurality of flange fasteners;an alignment ring forming an interior region in which the primary element is at least partially positioned, the alignment ring including a channel configured to receive the interconnecting neck of the primary element such that the interconnecting neck of the primary element extends outside of the alignment ring, the alignment ring further comprising a plurality of flange fastener receiving apertures configured to be aligned with flange apertures in the flanges of the first and second process pipes and to receive the flange fasteners extending through aligned flange apertures; anda plurality of nuts each fastened to an end of one of the plurality of flange fasteners after each flange fastener has been inserted through a flange aperture in the flange of the first process pipe, a flange fastener receiving aperture in the alignment ring, and flange aperture in the flange of the second process pipe to maintain the primary element in an aligned position in the event of a dynamic shock to the first or second process pipes. 11. The system of claim 10, wherein the plurality of flange fastener receiving apertures in the alignment ring are threaded apertures configured to secure to the flange fasteners. 12. The system of claim 11, wherein the plurality of flange fastener receiving apertures in the alignment ring comprise at least eight flange fastener receiving apertures spaced around the alignment ring to allow the wafer style primary element and process transmitter to be installed in different orientations relative to the first and second process pipes. 13. The system of claim 10, wherein the alignment ring further comprises a plurality of alignment tabs positioned on an outer portion of the alignment ring and configured to make contact with at least one of the flanges of the first and second process pipes to align the alignment ring and the primary element with the first and second process pipes. 14. The system of claim 13, wherein at least one of the plurality of alignment tabs is configured to be removably attached to the alignment ring such that the at least one of the plurality of the alignment tabs can be removed before the alignment ring is inserted between the flanges of the first and second process pipes, and subsequently reattached after the alignment ring is positioned between the flanges of the first and second process pipes. 15. The system of claim 10, and further comprising a plurality of alignment pins spaced around an inner portion of the alignment ring to maintain the primary element at a proper position within the interior region and thereby aligned with the first and second process pipes. 16. The system of claim 15, wherein the plurality of alignment pins include first alignment pins on an upper portion of the alignment ring and second alignment pins on a lower portion of the alignment ring, and wherein the second alignment pins extend further into the interior region of the alignment ring than do the first alignment pins. 17. The system of claim 10, and further comprising a plurality of alignment screws extending from the outer portion of the alignment ring to the inner portion of the alignment ring to adjust a position of the primary element within the interior region and thereby align the primary element with the first and second process pipes. 18. The system of claim 10, and further comprising a plurality of sleeves configured to be placed over the plurality of flange fasteners in order to position the plurality of flange fasteners in centers of the flange apertures. 19. A method of coupling a wafer style primary element of a process measuring system between first and second process pipes to measure a process variable of process fluid in the first and second process pipes, the method comprising: encompassing at least a portion of the primary element in an interior region of an alignment ring such that an interconnecting neck of the primary element is positioned in a channel formed in the alignment ring and extends outside of the alignment ring;inserting the alignment ring and encompassed primary element between flanges of each of the first and second process pipes such that the primary element is aligned with the first and second process pipes; andinserting each of a plurality of flange fasteners through a corresponding one of a plurality of flange apertures in the flange of the first process pipe, through a corresponding one of a plurality of alignment apertures of the alignment ring, and through a corresponding one of a plurality of flange apertures in the flange of the second process pipe in order to capture the flange fastener and prevent misalignment of the alignment ring or leaking of the process fluid in the event of a pipeline shock. 20. The method of claim 19, wherein inserting the alignment ring and encompassed primary element between the flanges of each of the first and second process pipes such that the primary element is aligned with the first and second process pipes further comprises removing an alignment tab from the alignment ring, inserting the alignment ring and encompassed primary element between the flanges of each of the first and second process pipes, and reattaching the alignment tab to the alignment ring. 21. The method of claim 19, wherein encompassing the primary element in the interior region of the alignment ring further comprises using alignment pins or screws extending into the interior region of the alignment ring to position the primary element in the interior region and align the primary element with the first and second process pipes.
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이 특허에 인용된 특허 (12)
Neumann Bob A. (Monroeville PA), Apparatus for centering and the axial and parallel alignment of shafts.
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