Low-temperature sealing glass frit and method for preparing composite filler in glass frit
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C03C-008/14
C03C-008/24
C03C-001/00
C08K-003/36
C08K-003/22
출원번호
US-0686564
(2015-04-14)
등록번호
US-9359248
(2016-06-07)
우선권정보
CN-2014 1 0838765 (2014-12-26)
발명자
/ 주소
Li, Dandan
출원인 / 주소
SHANGHAI TIANMA AM-OLED CO., LTD.
대리인 / 주소
Anova Law Group, PLLC
인용정보
피인용 횟수 :
0인용 특허 :
7
초록▼
The invention discloses a lower-temperature sealing glass frit and a method for preparing a composite filler in the glass frit. The lower-temperature sealing glass frit includes a glass powder and a negative thermal expansion composite filler with an adjustable thermal expansion coefficient. The the
The invention discloses a lower-temperature sealing glass frit and a method for preparing a composite filler in the glass frit. The lower-temperature sealing glass frit includes a glass powder and a negative thermal expansion composite filler with an adjustable thermal expansion coefficient. The thermal expansion coefficient of the low-temperature sealing glass frit into which the composite material and the glass powder is mixed can be adjustable so that the thermal expansion coefficient of the low-temperature sealing glass frit can match the thermal expansion coefficient of glass substrates packaging an OLED device to thereby improve the yield of the packaged OLED device.
대표청구항▼
1. A glass frit comprising: a glass powder; anda negative thermal expansion composite filler including a plurality of composite materials and having an adjustable thermal expansion coefficient to be selected from a plurality of thermal expansion coefficients corresponding to preset composition ratio
1. A glass frit comprising: a glass powder; anda negative thermal expansion composite filler including a plurality of composite materials and having an adjustable thermal expansion coefficient to be selected from a plurality of thermal expansion coefficients corresponding to preset composition ratios among the plurality of composite materials when the composite materials are mixed to form the negative thermal expansion composite filler. 2. The glass frit according to claim 1, wherein the thermal expansion coefficient of the composite filler is adjustable in a range of −8.7×10−6/° C. to 0/° C. 3. The glass frit according to claim 1, wherein the composite filler is a composite filler resulting from a chemical reaction of a mixture of an isotropic negative thermal expansion material and a zero thermal expansion material at high temperature. 4. The glass frit according to claim 3, wherein the isotropic negative thermal expansion material is zirconium tungstate, and the zero thermal expansion material is silicon dioxide. 5. A glass frit, comprising: a glass powder; anda negative thermal expansion composite filler having an adjustable thermal expansion coefficient,wherein the composite filler is a composite filler resulting from a chemical reaction of a mixture of an isotropic negative thermal expansion material and a zero thermal expansion material at high temperature; andwherein the mixture further comprises at least one of cordierite and eucryptite. 6. The glass frit according to claim 5, wherein the composite filler comprises at least one of a zirconium tungstate and silicon dioxide composite phase, a zirconium tungstate and cordierite composite phase, or a zirconium tungstate and eucryptite composite phase. 7. The glass frit according to claim 1 wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 8. The glass frit according to claim 2, wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 9. The glass frit according to claim 3, wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 10. The glass frit according to claim 4, wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 11. The glass frit according to claim 5, wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 12. The glass frit according to claim 6, wherein a mass fraction of the composite filler is in a range from 10% to 40%, and a mass fraction of the glass powder is in a range from 60% to 90%. 13. The glass frit according to claim 1, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 14. The glass frit according to claim 2, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 15. The glass frit according to claim 3, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 16. The glass frit according to claim 4, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 17. The glass frit according to claim 5, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 18. The glass frit according to claim 6, further comprising oxide components comprising one or more of V2O5, TeO2, Fe2O3, Co2O3, TiO2, ZrO2, ZnO and K2O. 19. The glass frit according to claim 1, wherein a thermal expansion coefficient of the glass frit is adjustable in a range of 3×10−6/° C. to 10×10−6/° C. 20. A method for preparing a composite filler used in a low-temperature sealing glass frit comprising a glass powder, wherein the composite filler is a negative thermal expansion composite filler with an adjustable thermal expansion coefficient, the method comprising: preparing a mixed wet raw material from a zirconium tungstate and a silicon dioxide at preset volume fractions resolved in an organic solvent through physical deposition; orpreparing a mixed wet raw material from a zirconium tungstate and a silicon dioxide at preset volume fractions, and at least one of cordierite and eucryptite resolved in the organic solvent through physical deposition; andpre-sintering the mixed wet raw material at a first preset temperature for 4 to 6 hours; and then sintering the mixed wet raw material at a second preset temperature for 1 to 3 hours into the composite filler, wherein the first preset temperature is in a range from 400° C. to 700° C., and the second preset temperature is in a range from 1000° C. to 1200° C.
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