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Systems and methods for treating flammable effluent gases from manufacturing processes

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/00
  • B01D-053/40
출원번호 US-0365886 (2009-02-04)
등록번호 US-9387428 (2016-07-12)
발명자 / 주소
  • Clark, Daniel O.
  • Moalem, Mehran
  • Vermeulen, Robbert M.
  • Chandler, Phil
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Dugan & Dugan, PC
인용정보 피인용 횟수 : 0  인용 특허 : 39

초록

A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust c

대표청구항

1. A method of treating a flammable effluent gas from an electronic device manufacturing process, comprising the steps of: providing a first configuration and a second configuration of conduits for mixing a second gas with the flammable effluent gas, the second configuration comprising a distributio

이 특허에 인용된 특허 (39)

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  2. Chi,Yueh shian T.; Hawkins,Parris C. M.; Huang,Charles Q., Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility.
  3. Ibaraki Yoshihiro,JPX ; Ina Hidekazu,JPX ; Kawanaka Hideji,JPX, Exhaust gas treatment unit and method.
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  8. Vickery Earl (San Jose CA), Flame arresting conduit section, combustor and method.
  9. Anderson Lawrence B. (Encinitas CA), Flashback protection apparatus and method for suppressing deflagration in combustion-susceptible gas flows.
  10. Martz Lyle F. (Verona PA) Kiscaden Roy W. (Springfield PA) Uram Robert (East Pittsburgh PA), Gas turbine and steam turbine combined cycle electric power generating plant having a coordinated and hybridized control.
  11. Miyazaki,Kunihiro; Nadahara,Soichi; Usuda,Kinya; Akahori,Masaji; Nakagawa,Sota; Nakajima,Ken, Material supply system in semiconductor device manufacturing plant.
  12. Puri,Amitabh; Duffin,David; Englhardt,Eric A., Method and apparatus for integrating large and small lot electronic device fabrication facilities.
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  14. Mori, Yoichi; Kyotani, Takashi; Shinohara, Toyoji, Method and apparatus for treating a waste gas containing fluorine-containing compounds.
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  34. Laush Curtis T., Solid state fluorine sensor system and method.
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  36. Chen,Xiaoming; Nguyen,Maihan; Arasaki,Osamu; Maraquin,Tammy; Sawyer,Daniel; Morrison,Pedro, System and method for haze control in semiconductor processes.
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