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Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and des

Disclosed is a solution for an electrochemical process, the solution containing a sulfonic acid and having a low concentration of sulfur compounds, either low or high valence, that are susceptible to reduction and which is intended for use in electrodeposition, batteries, conductive polymers and descaling processes.

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1. An aqueous solution for use in an electrochemical process, the solution comprising a sulfonic acid, trichloromethyl methyl sulfone and methyl methanethiosulfonate wherein said trichloromethyl methyl sulfone is present in amounts less than about 6 parts per million, and said methyl methanethiosulf

1. An aqueous solution for use in an electrochemical process, the solution comprising a sulfonic acid, trichloromethyl methyl sulfone and methyl methanethiosulfonate wherein said trichloromethyl methyl sulfone is present in amounts less than about 6 parts per million, and said methyl methanethiosulfonate is present in amounts less than about 0.25 parts per million. 2. The solution of claim 1 for use in electrodeposition, batteries, conductive polymers and descaling processes. 3. The solution of claim 1 wherein the sulfonic acid is derived from an alkyl monosulfonic acid, an alkyl polysulfonic acid or an aryl mono or polysulfonic acid. 4. The solution of claim 1 wherein the sulfonic acid is: wherein a+b±c+y equals 4, R, R′ and R″ are the same or different and each independently are hydrogen, phenyl, Cl, F, Br, I, CF3 or a lower C1-9 alkyl group that is unsubstituted or substituted by oxygen, Cl, F, Br, I, CF3, or —SO2OH. 5. The solution of claim 4 wherein the sulfonic acid is selected from the group consisting of methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, methanedisulfonic acid, monochloromethanedisulfonic acid, dichloromethanedisulfonic acid, 1,1-ethanedisulfonic acid, 2-chloro-1,1-ethanedisulfonic acid, 1,2-dichloro-1,1-ethanedisulfonic, acid, 1,1-propanedisulfonic acid, 3-chloro-1,1-propanedisulfonic acid, 1,2-ethylene disulfonic acid, 1,3-propylene disulfonic acid, trifluormethanesulfonic acid, butanesulfonic acid, perfluorobutanesulfonic acid, pentanesulfonic acid, phenylsulfonic acid, phenolsulfonic acid, para-toulenesulfonic acid, xylenesulfonic acid and mixtures thereof. 6. The solution of claim 4 wherein the sulfonic acid is a free alkanesulfonic acid having a concentration range from 1 to 1480 g/l. 7. The solution of claim 6, wherein the concentration of the free alkanesulfonic acid is about 10 to about 700 grams per liter of solution. 8. The solution of claim 6, wherein the concentration of the free alkanesulfonic acid is about 30 to about 500 grams per liter of solution. 9. The solution of claim 1 wherein the pH is between −2 to 13. 10. The solution of claim 1 further comprising inorganic or organic acids in combination with said sulfonic acid. 11. The solution of claim 1 further comprising a metal sulfonate salt or other metal salts and free sulfonic acids. 12. The solution of claim 11 wherein the other metal salts is a salt of an alkyl or aryl sulfonic acid of formula: wherein a+b±c+y equals 4, M is a metal selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide metals of the periodic table, of actinide metals of the periodic table, ammonium ion or mixtures thereof, R, R′ and R″ are the same or different and each independently is hydrogen, phenyl, Cl, F, Br, I, CF3 or a C1-23 alkyl group that is unsubstituted or substituted by oxygen, Cl, F, Br, I, CF3, or —SO2OH. 13. The solution of claim 11 wherein the metal sulfonate salt or other metal salts are present at a concentration froth about 1 to about 600 grams per liter of aqueous solution. 14. The solution of claim 11 wherein the free sulfonic acids are selected from the group consisting of methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, trifluoromethanesulfonic acid and mixtures thereof. 15. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide or actinide metals of the periodic table and ammonium ion or mixtures thereof. 16. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is zinc methanesulfonate salt. 17. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is copper methanesulfonate salt. 18. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is nickel methanesulfonate salt. 19. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is ferrous methanesulfonate salt. 20. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is an alkali or alkaline earth metal salt. 21. The solution of claim 11 wherein the metal sulfonate salt or other metal salts is a mixture of metal sulfonate salts selected from metals in Group 1B, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6B, 7B, 8B, lanthanide and actinide metals of the periodic table and ammonium ion. 22. The solution of claim 1 further comprising a buffering agent to modulate the pH of the aqueous solution. 23. The solution of claim 22 wherein the buffering agent is boric acid. 24. The solution of claim 1 further comprising an organic monomer selected from aniline or substituted aniline or pyrrole.