Joint design for segmented silicon carbide liner in a fluidized bed reactor
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01J-008/18
B01J-008/24
C01B-033/029
C01B-033/03
C01B-033/027
출원번호
US-0461233
(2014-08-15)
등록번호
US-9446367
(2016-09-20)
발명자
/ 주소
Miller, Matthew J.
Spangler, Michael V.
Zeininger, Gerald A.
Onstot, William J.
Stupin, Walter J.
출원인 / 주소
REC Silicon Inc
대리인 / 주소
Klarquist Sparkman, LLP
인용정보
피인용 횟수 :
1인용 특허 :
17
초록▼
Segmented silicon carbide liners for use in a fluidized bed reactor for production of polysilicon-coated granulate material are disclosed, as well as methods of making and using the segmented silicon carbide liners. Non-contaminating bonding materials for joining silicon carbide segments also are di
Segmented silicon carbide liners for use in a fluidized bed reactor for production of polysilicon-coated granulate material are disclosed, as well as methods of making and using the segmented silicon carbide liners. Non-contaminating bonding materials for joining silicon carbide segments also are disclosed. One or more of the silicon carbide segments may be constructed of reaction-bonded silicon carbide.
대표청구항▼
1. A segmented silicon carbide liner for a fluidized bed reactor for production of polysilicon-coated granulate material, comprising: a first silicon carbide segment having a first segment upper edge surface defining one of an upwardly opening first segment depression or an upwardly extending first
1. A segmented silicon carbide liner for a fluidized bed reactor for production of polysilicon-coated granulate material, comprising: a first silicon carbide segment having a first segment upper edge surface defining one of an upwardly opening first segment depression or an upwardly extending first segment protrusion;a second silicon carbide segment located above and abutted to the first silicon carbide segment, the second silicon carbide segment having a second segment lower edge surface defining a downwardly opening second segment depression if the first segment upper edge surface defines an upwardly extending first segment protrusion or a downwardly extending second segment protrusion if the first segment upper edge surface defines an upwardly opening first segment depression, the protrusion being received within the depression and having smaller dimensions than the depression such that the surface of the depression is spaced apart from the surface of the protrusion and a space is located between the protrusion and the depression; anda volume of bonding material comprising a lithium salt, the bonding material disposed within the space between the protrusion and the depression. 2. The segmented silicon carbide liner of claim 1, wherein: the first silicon carbide segment comprises a first tubular wall having an annular upper surface, the first segment upper edge surface being at least a portion of the annular upper surface, and the first segment depression is a groove that is defined by and extends along at least a portion of the first segment upper edge surface or the first segment protrusion extends upwardly from and along at least a portion of the first segment upper edge surface; andthe second silicon carbide segment comprises a second tubular wall having an annular lower surface, the second segment lower edge surface being at least a portion of the annular lower surface, and the second segment protrusion extends downwardly from and along at least a portion of the second segment second edge surface or the second segment depression is a groove that is defined by and extends along at least a portion of the second segment lower edge surface. 3. The segmented silicon carbide liner of claim 2, wherein the first segment depression extends around the entire first segment annular upper surface or the first segment protrusion extends around the entire first segment annular upper surface, and the second segment protrusion extends around the entire second segment annular lower surface or the second segment depression extends around the entire second segment annular lower surface. 4. The segmented silicon carbide liner of claim 1, wherein the bonding material comprises 0.4-0.7 wt % lithium as lithium aluminum silicate and silicon carbide. 5. The segmented silicon carbide liner of claim 1, wherein at least one of the first silicon carbide segment and the second silicon carbide segment is constructed of reaction-bonded silicon carbide. 6. The segmented silicon carbide liner of claim 5, wherein: the at least one of the silicon carbide segments has an inwardly facing surface; andthe reaction-bonded silicon carbide has a surface contamination level, on the inwardly facing surface of the silicon carbide segment, of less than 1% atomic of phosphorus and less than 1% atomic of boron. 7. The segmented silicon carbide liner of claim 1, wherein the second silicon carbide segment has an upper edge surface that defines an upwardly opening second segment depression. 8. The segmented silicon carbide liner of claim 7, wherein the first segment upper edge surface defines an upwardly opening first segment depression and the second segment lower edge surface defines a downwardly extending second segment protrusion, the liner further comprising: one or more additional silicon carbide segments, each additional silicon carbide segment comprising an additional segment upper edge surface defining an upwardly opening additional segment depression and an additional segment lower edge surface defining a downwardly extending additional segment protrusion, the additional segment protrusion received within an upper edge surface depression of an adjacent silicon carbide segment located below and abutted to the additional silicon carbide segment and having smaller dimensions than the depression of the adjacent silicon carbide segment such that the surface of the adjacent silicon carbide segment depression is spaced apart from the surface of the additional segment protrusion and a space is located between the additional segment protrusion and the depression of the adjacent silicon carbide segment; anda volume of bonding material comprising a lithium salt, the bonding material disposed within the space between the additional segment protrusion and the depression of the adjacent silicon carbide segment. 9. The segmented silicon carbide liner of claim 7, wherein the first segment upper edge surface defines an upwardly opening first segment depression and the second segment lower edge surface defines a downwardly extending second segment protrusion, the liner further comprising: a terminal silicon carbide segment located above and abutted to the second silicon carbide segment, the terminal silicon carbide segment having a terminal segment lower edge surface defining a downwardly extending terminal segment protrusion received within the second segment depression and having smaller dimensions than the second segment depression such that the surface of the second segment depression is spaced apart from the surface of the terminal segment protrusion and a space is located between the terminal segment protrusion and the second segment depression; anda volume of bonding material comprising a lithium salt, the bonding material disposed within the space between the terminal segment protrusion and the second segment depression. 10. A fluidized bed reactor for production of polysilicon-coated granulate material, comprising: a vessel having an outer wall; anda segmented silicon carbide liner according to claim 1, the liner being positioned inwardly of the outer wall such that the inner surfaces of the liner segments define a portion of a reaction chamber. 11. The fluidized bed reactor of claim 10, further comprising: at least one heater positioned between the outer wall and the segmented silicon carbide liner;at least one inlet having an opening positioned to admit a primary gas comprising a silicon-bearing gas into the reaction chamber;a plurality of fluidization gas inlets, wherein each fluidization gas inlet has an outlet opening into the reaction chamber; andat least one outlet for removing silicon-coated product particles from the vessel. 12. A process for assembling a segmented silicon carbide liner for a fluidized bed reactor for production of polysilicon-coated granulate material, comprising: providing a first silicon carbide segment having a first segment upper edge surface defining an upwardly opening first segment depression;providing a second silicon carbide segment having a second segment lower edge surface defining a downwardly extending second segment protrusion configured to fit within the first segment depression, the second segment protrusion having smaller dimensions than the first segment depression to provide a space between the second segment protrusion and the first segment depression when the second segment lower edge surface is brought into contact with the first segment upper edge surface and the second segment protrusion is received within the first segment depression;applying a volume of bonding material comprising a lithium salt to at least one of a portion of the first segment depression or a portion of the second segment protrusion;bringing at least a portion of the lower edge surface of the second silicon carbide segment into abutment with the upper edge surface of the first silicon carbide segment with the bonding material therebetween; andapplying heat to the bonding material, in an inert atmosphere, to form bonded first and second silicon carbide segments. 13. The process of claim 12, further comprising applying the bonding material to the other of a portion of the first segment depression or a portion of the second segment protrusion before bringing the lower edge surface of the second silicon carbide segment into abutment with the upper edge surface of the first silicon carbide segment and before applying heat. 14. The process of claim 12, wherein, prior to heating, the bonding material is an aqueous slurry comprising water, lithium silicate and silicon carbide particles. 15. The process of claim 12, wherein applying heat comprises: exposing the abutted first and second silicon carbide segments to an atmosphere at a first temperature T1 for a first period of time;increasing the temperature to a temperature T2; andexposing the abutted first and second silicon carbide segments to the second temperature T2, wherein T2>T1, for a second period of time to cure the bonding material. 16. The process of claim 15, wherein: the first temperature T1 is 90-100° C. and the first period of time is at least two hours; andthe second temperature T2 is 250-300° C. and the second period of time is at least two hours. 17. The process of claim 12, further comprising drying the abutted first and second silicon carbide segments for an initial period of time at ambient temperature before applying heat. 18. The process of claim 17, further comprising exposing the abutted first and second silicon carbide segments to sunlight while drying at the ambient temperature.
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이 특허에 인용된 특허 (17)
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