Back pressure regulator with floating seal support
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F16K-007/17
G05D-016/06
G05D-016/18
F16K-001/42
F16K-007/16
F16K-007/12
F16K-031/165
출원번호
US-0128224
(2012-06-23)
등록번호
US-9447890
(2016-09-20)
국제출원번호
PCT/US2012/043908
(2012-06-23)
§371/§102 date
20140326
(20140326)
국제공개번호
WO2012/178132
(2012-12-27)
발명자
/ 주소
Jennings, Jeffrey Dean
Tang, Tony Boyd
Roberts, Keith Alan
출원인 / 주소
Equilibar, LLC
대리인 / 주소
Trego, Hines & Ladenheim, PLLC
인용정보
피인용 횟수 :
0인용 특허 :
8
초록▼
A sealing apparatus for a back pressure regulator includes: a body defining a process surface, and including: at least one process void communicating with the process surface; a recess disposed in the process surface; a floating support hub disposed in the recess, carrying an O-ring; a vent void com
A sealing apparatus for a back pressure regulator includes: a body defining a process surface, and including: at least one process void communicating with the process surface; a recess disposed in the process surface; a floating support hub disposed in the recess, carrying an O-ring; a vent void communicating with the recess; an inlet port disposed in fluid communication with the at least one process void and adapted to be coupled in fluid communication with a fluid at a process pressure; and an outlet port disposed in fluid communication with the vent void; and a diaphragm having opposed reference and process sides, the diaphragm disposed against the body such that the process side is substantially coplanar with the process surface.
대표청구항▼
1. A sealing apparatus for a back pressure regulator comprising: a body defining a process surface, and including a vent void communicating with the process surface;a generally cylindrical floating support hub including an annular side wall extending between spaced-apart upper and lower ends, and a
1. A sealing apparatus for a back pressure regulator comprising: a body defining a process surface, and including a vent void communicating with the process surface;a generally cylindrical floating support hub including an annular side wall extending between spaced-apart upper and lower ends, and a central bore extending between the upper and lower ends, wherein the side wall has a shape that receives and supports an O-ring, wherein a height of the hub measured between the upper and lower ends is less than a cross-sectional diameter of the O-ring; andwherein the support hub and O-ring are disposed between the diaphragm and the process surface, in fluid communication with the vent void, and wherein a gap is present between the hub and the process surface. 2. The apparatus of claim 1, further including: at least one process void in the body communicating with the process surface, separate from the vent void;a reference cap including a reference surface, wherein the diaphragm is constrained between the body and the reference cap;a spring disposed within the reference cap such that the spring applies a reference force to the diaphragm; andwherein the diaphragm is arranged such that, in response to forces exerted on the diaphragm by the process pressure in the process void being higher than the reference force, a fluid flow path will be open that extends from the at least one process void past the O-ring to the vent void, and in response to the reference force being higher than the forces exerted on the diaphragm by the process pressure, the flow path will be closed. 3. The apparatus of claim 1 wherein the sidewall is concave-curved and a radius of the concave-curved side wall is between about 90% and about 150% of a cross-sectional radius of the O-ring. 4. The apparatus of claim 1 wherein the floating support hub includes a convex-curved fillet disposed between the upper face and the side wall. 5. The apparatus of claim 1 wherein a radius of the fillet is about 5% to about 10% of a cross-sectional radius of the O-ring. 6. The apparatus of claim 1 wherein a height of the support hub between the upper and lower faces is between about 60% and about 90% of a cross-sectional diameter of the O-ring. 7. A back pressure regulator apparatus comprising: a body defining a process surface, and including: at least one process void communicating with the process surface;a recess disposed in the process surface;a floating support hub disposed in the recess, carrying an O-ring, wherein a height of the hub measured between upper and lower ends thereof is less than a cross-sectional diameter of the O-ring, and wherein a gap is present between the hub and the process surface;a vent void communicating with the recess;an inlet port disposed in fluid communication with the at least one process void and adapted to be coupled in fluid communication with a fluid at a process pressure; andan outlet port disposed in fluid communication with the vent void;a reference cap including a reference surface and a reference port disposed in fluid communication with the reference surface, the reference port adapted to be coupled in fluid communication with a fluid at a predetermined reference pressure; anda diaphragm having opposed reference and process sides, the diaphragm constrained between the body and the reference cap such that the process side is substantially coplanar with the process surface, and arranged such that, in response to the process pressure being higher than the reference pressure, a fluid flow path will be open that extends from the at least one process void past the O-ring to the vent void, and in response to the reference pressure being higher than the process pressure, the flow path will be closed. 8. The apparatus of claim 7 wherein the process surface incorporates at least one groove therein which defines a flow path adapted to distribute fluid from the at least one process void evenly around the process side of the diaphragm. 9. The apparatus of claim 7 wherein the process surface includes a plurality of substantially concentric annular grooves. 10. The apparatus of claim 7 wherein the floating support hub is generally cylindrical and includes an annular side wall extending between spaced-apart upper and lower ends, and a central bore extending between the upper and lower ends, wherein the side wall has a concave-curved shape that receives and supports the O-ring. 11. The apparatus of claim 10 wherein a radius of the concave-curved side wall is between about 90% and about 150% of a cross-sectional radius of the O-ring. 12. The apparatus of claim 10 wherein the floating support hub includes a convex-curved fillet disposed between the upper face and the side wall. 13. The apparatus of claim 10 wherein a radius of the fillet is about 5% to about 10% of a cross-sectional radius of the O-ring. 14. The apparatus of claim 10 wherein a height of the support hub between the upper and lower faces is between about 60% and about 90% of a cross-sectional diameter of the O-ring. 15. The apparatus of claim 7 wherein the O-ring protrudes above the immediately-surrounding portion of the process surface. 16. The apparatus of claim 7 wherein the O-ring protrudes above a diaphragm constraint plane defined by an outer perimeter of the process surface. 17. A back pressure regulator apparatus comprising: a body defining a process surface, and including: at least one process void communicating with the process surface;a recess disposed in the process surface;a floating support hub disposed in the recess, carrying an O-ring, wherein a height of the hub measured between upper and lower ends thereof is less than a cross-sectional diameter of the O-ring, and wherein a gap is present between the hub and the process surface;a vent void communicating with the recess;an inlet port disposed in fluid communication with the at least one process void and adapted to be coupled in fluid communication with a fluid at a process pressure; andan outlet port disposed in fluid communication with the vent void;a reference cap including a reference surface;a diaphragm having opposed reference and process sides, the diaphragm constrained between the body and the reference cap such that the process side is substantially coplanar with the process surface; anda platen loaded by a spring disposed within the reference cap such that the platen applies a reference force to the diaphragm,wherein the diaphragm is arranged such that, in response to forces exerted on the diaphragm by the process pressure being higher than the reference force, a fluid flow path will be open that extends from the at least one process void past the O-ring to the vent void, and in response to the reference force being higher than the forces exerted on the diaphragm by the process pressure, the flow path will be closed. 18. The apparatus of claim 17 further including an adjuster assembly carried by the reference cap and acting on the spring so as to selectively vary the reference force. 19. The apparatus of claim 17 wherein the reference cap further includes a reference port disposed in fluid communication with the reference surface, the reference port adapted to be coupled in fluid communication with a fluid at a predetermined reference pressure. 20. The apparatus of claim 17 wherein the process surface incorporates at least one groove therein which defines a flow path adapted to distribute fluid from the at least one process void evenly around the process side of the diaphragm. 21. The apparatus of claim 17 wherein the process surface includes a plurality of substantially concentric annular grooves. 22. The apparatus of claim 17 wherein the floating support hub is generally cylindrical and includes an annular side wall extending between spaced-apart upper and lower ends, and a central bore extending between the upper and lower ends, wherein the side wall has a concave-curved shape that receives and supports the O-ring. 23. The apparatus of claim 22 wherein a radius of the concave-curved side wall is between about 90% and about 150% of a cross-sectional radius of the O-ring. 24. The apparatus of claim 22 wherein the floating support hub includes a convex-curved fillet disposed between the upper face and the side wall. 25. The apparatus of claim 22 wherein a radius of the fillet is about 5% to about 10% of a cross-sectional radius of the O-ring. 26. The apparatus of claim 22 wherein a height of the support hub between the upper and lower faces is between about 60% and about 90% of a cross-sectional diameter of the O-ring. 27. The apparatus of claim 17 wherein the O-ring protrudes above the immediately-surrounding portion of the process surface. 28. The apparatus of claim 17 wherein the O-ring protrudes above a diaphragm constraint plane defined by an outer perimeter of the process surface.
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이 특허에 인용된 특허 (8)
Barree Robert D. (Littleton CO), Back pressure regulator.
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