Substrate table, a lithographic apparatus and a device manufacturing method
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03B-027/52
G03B-027/58
G03F-007/20
출원번호
US-0048826
(2016-02-19)
등록번호
US-9454089
(2016-09-27)
발명자
/ 주소
Ten Kate, Nicolaas
Lafarre, Raymond Wilhelmus Louis
출원인 / 주소
ASML NETHERLANDS B.V.
대리인 / 주소
Pillsbury Winthrop Shaw Pittman LLP
인용정보
피인용 횟수 :
1인용 특허 :
5
초록
A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
대표청구항▼
1. A table for a lithographic apparatus, the table comprising: an outlet opening;a catchment opening at an upper surface of the table, the catchment opening in fluid communication with the outlet opening; anda porous structure in a flow path between the catchment opening and the outlet opening, wher
1. A table for a lithographic apparatus, the table comprising: an outlet opening;a catchment opening at an upper surface of the table, the catchment opening in fluid communication with the outlet opening; anda porous structure in a flow path between the catchment opening and the outlet opening, wherein the porous structure is configured to stop liquid flow and accumulate liquid above the porous structure. 2. The table of claim 1, further comprising a chamber in the flow path, the chamber having the catchment opening at an upper end thereof and the outlet opening at a lower end thereof, wherein at least part of the chamber is wider than the catchment opening. 3. The table of claim 1, wherein the flow path further comprises a collector portion below the porous structure and above a substantially vertical or horizontal portion of a channel arrangement fluidly connecting the porous structure and a drain opening. 4. The table of claim 1, comprising a further porous structure in the flow path between the catchment opening and the porous structure. 5. The table of claim 1, further comprising a channel arrangement fluidly connecting the porous structure and a drain opening, the channel arrangement comprising a first substantially vertical portion located below at least part of the porous structure, a substantially horizontally extending portion connected to the first substantially vertical portion and located below the first substantially vertical portion, and a second substantially vertical portion extending downward from the substantially horizontally extending portion. 6. The table of claim 1, further comprising a substrate supporting area on which a substrate is to be supported and wherein the catchment opening is outward of the substrate supporting area. 7. The table of claim 1, wherein a surface extending around at least part of the flow path is liquidphobic. 8. The table of claim 1, wherein the catchment opening is in fluid communication with the environment of the table at a location downstream from the porous structure. 9. A lithographic apparatus, comprising: a projection system configured to project a beam of radiation through a liquid onto a substrate;a liquid supply system configured to supply a liquid to a region between the projection system and the substrate;a table comprising: an outlet opening;a catchment opening at an upper surface of the table, the catchment opening in fluid communication with the outlet opening, anda porous structure in a flow path between the catchment opening and the outlet opening, wherein the porous structure is configured to stop liquid flow and accumulate liquid above the porous structure. 10. The apparatus of claim 9, further comprising a chamber in the flow path, the chamber having the catchment opening at an upper end thereof and the outlet opening at a lower end thereof, wherein at least part of the chamber is wider than the catchment opening. 11. The apparatus of claim 9, wherein the flow path further comprises a collector portion below the porous structure and above a substantially vertical or horizontal portion of a channel arrangement fluidly connecting the porous structure and a drain opening. 12. The apparatus of claim 9, comprising a further porous structure in the flow path between the catchment opening and the porous structure. 13. The apparatus of claim 9, further comprising a channel arrangement fluidly connecting the porous structure and a drain opening, the channel arrangement comprising a first substantially vertical portion located below at least part of the porous structure, a substantially horizontally extending portion connected to the first substantially vertical portion and located below the first substantially vertical portion, and a second substantially vertical portion extending downward from the substantially horizontally extending portion. 14. The apparatus of claim 9, wherein the table further comprises a substrate supporting area on which a substrate is to be supported and wherein the catchment opening is outward of the substrate supporting area. 15. The apparatus of claim 9, wherein a surface extending around at least part of the flow path is liquidphobic. 16. A table for a lithographic apparatus, the table comprising: a plurality of protrusions extending from the table, the ends of the protrusions defining a support surface configured to support an object;a catchment opening at an upper surface of the table, the catchment opening located below the support surface and the catchment opening in fluid communication with an outlet opening;a chamber in a flow path between the catchment opening and the outlet opening, the chamber configured to collect immersion liquid and the chamber having the catchment opening at an upper end thereof and the outlet opening at a lower end thereof, wherein at least part of the chamber is wider than the catchment opening;a first porous structure located in the flow path and below the catchment opening, the first porous structure configured to stop liquid flow and accumulate liquid above the first porous structure in the chamber; anda second porous structure, located above the first porous structure, configured to receive immersion liquid from the catchment opening. 17. The table of claim 16, wherein a surface extending around at least part of the flow path is liquidphobic. 18. The table of claim 16, wherein the catchment opening is in fluid communication with the environment of the table at a location downstream from the chamber. 19. The table of claim 16, further comprising a channel arrangement fluidly connecting the chamber and a drain opening, the channel arrangement comprising a first substantially vertical portion located below the chamber, a substantially horizontally extending portion connected to the first substantially vertical portion and located below the first substantially vertical portion, and a second substantially vertical portion extending downward from the substantially horizontally extending portion. 20. A lithographic apparatus, comprising a projection system configured to project a beam of radiation through a liquid onto a substrate, a liquid supply system configured to supply a liquid to a region between the projection system and the substrate, and the table according to claim 16.
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이 특허에 인용된 특허 (5)
Tabarelli Werner (Schlosstr. 5 Vaduz LIX FL-9490) Lbach Ernst W. (Tonagass 374 Eschen LIX FL-9492), Apparatus for the photolithographic manufacture of integrated circuit elements.
Luttikhuis,Bernardus Antonius Johannes; Van Der Pasch,Engelbertus Antonius Fransiscus; Van Der Ham,Ronald; Roset,Niek Jacobus Johannes, Lithographic apparatus and device manufacturing method.
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