Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01B-001/20
B82Y-030/00
H01B-001/24
H01L-021/02
H01L-029/06
H01L-021/22
H01L-021/228
H01L-031/068
H01L-031/18
C09D-011/037
C09D-011/52
H01L-021/268
출원번호
US-0282216
(2014-05-20)
등록번호
US-9475695
(2016-10-25)
발명자
/ 주소
Li, Weidong
Soeda, Masaya
Pengra-Leung, Gina Elizabeth
Chiruvolu, Shivkumar
출원인 / 주소
NanoGram Corporation
대리인 / 주소
Dardi & Herbert, PLLC
인용정보
피인용 횟수 :
0인용 특허 :
101
초록▼
Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for formi
Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant.
대표청구항▼
1. A nanoparticle ink comprising from about 0.001 weight percent to about 30 weight percent silicon/germanium based nanoparticles, at least about 10 weight percent of a viscous polycyclic alcohol, wherein the viscous polycyclic alcohol has a boiling point of no more than about 450° C. and non-Newton
1. A nanoparticle ink comprising from about 0.001 weight percent to about 30 weight percent silicon/germanium based nanoparticles, at least about 10 weight percent of a viscous polycyclic alcohol, wherein the viscous polycyclic alcohol has a boiling point of no more than about 450° C. and non-Newtonian rheology. 2. The nanoparticle ink of claim 1 wherein the viscous polycyclic alcohol has 7-25 carbon atoms. 3. The nanoparticle ink of claim 1 wherein the viscous polycyclic alcohol comprises a norbornyl bicyclo moiety. 4. The nanoparticle ink of claim 1 wherein the viscous polycyclic alcohol is selected from the group consisting of vinylnorbornyl alcohol, C-8 substituted 1,5-dimethyl-bicyclo[3.2.1]octane-8-ols with ethyl, methyl, n-propyl, i-propyl, n-butyl, 1-methyl-propyl, 2-methyl-propyl, allyl, n-hexyl, 3-methyl butyl, cyclopentyl or cyclohexyl substitutions, isobornyl cyclohexane diol, trimethyl-2,2,3-norbornyl-5-(-3-cyclohexanol-1), 3-(5,5,6 trimethyl bicyclo[6.4.0.1]heptan-2-yl)cyclohexanol, 11-hydroxy-2,13,13-trimethyl-tricyclo[6.4.0.12,5]tridecane and combinations thereof. 5. The nanoparticle ink of claim 1 further comprising no more than about 0.1 weight percent polymer. 6. The nanoparticle ink of claim 1 further comprising no more than about 100 ppb transition metal contamination. 7. The nanoparticle ink of claim I wherein the silicon/germanium based nanoparticles comprise doped elemental silicon nanoparticles having an average primary particle size of no more than about 50 nm. 8. The nanoparticle ink of claim 1 comprising at least about 0.5 weight percent elemental silicon nanoparticles and having a viscosity of at least about 1 Pa·s at a shear of 2 s−1. 9. The nanoparticle ink of claim 1 wherein the nanoparticles have a dopant level of at least about 0.5 atomic percent. 10. The nanoparticle ink of claim 1 comprising vinylnorbornyl alcohol, C-8 substituted 1,5-dimethyl-bicyclo[3.2.1]octane-8-ols with ethyl, methyl, n-propyl, i-propyl, n-butyl, 1-methyl-propyl, 2-methyl-propyl, allyl, n-hexyl, 3-methyl butyl, cyclopentyl or cyclohexyl substitutions, isobornyl cyclohexane diol, trimethyl-2,2,3-norbomyl-5-(-3-cyclohexanol-1), 3-(5,5,6 trimethyl bicyclo[6.4.0.1]heptan-2-yl)cyclohexanol, 11-hydroxy-2,13,13-trimethyl-tricyclo[6.4.0.12,5]tridecane and combinations thereof and having a transition metal contamination of no more than about 100 ppb. 11. The nanoparticle ink of claim 1 having from about 0.1 weight percent to about 20 weight percent silicon nanoparticles. 12. The nanoparticle ink of claim I having from about 20 weight percent to about 80 weight percent polycyclic alcohol. 13. The nanoparticle ink of claim 1 having from about 30 weight percent to about 80 weight percent polycyclic alcohol. 14. The nanoparticle ink of claim 13 further comprising terpineol. 15. The nanoparticle ink of claim 1 further comprising terpineol. 16. The nanoparticle ink of claim 1 further comprising no more than about 0.1 weight percent solvent boiling below 165° C. 17. The nanoparticle ink of claim 1 having a ratio of the viscosity at a shear of 2 s−1 to the viscosity at a shear of 1000 s−1 from about 2.5 to about 50.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (101)
Flagan, Richard C.; Boer, Elizabeth; Ostraat, Michele L.; Atwater, Harry A.; Bell, II, Lloyd D., Aerosol silicon nanoparticles for use in semiconductor device fabrication.
Bi, Xiangxin; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; Gardner, James T.; Lim, Seung M.; McGovern, William E., Coating formation by reactive deposition.
Nayfeh,Munir H.; Belomoin,Gennadey; Rao,Satish; Therrien,Joel; Chaieb,Sahraoui, Family of discretely sized silicon nanoparticles and method for producing the same.
Yoon Poong (Seoul KRX) Song Yongmok (Chungnam KRX), Fluidized bed reactor with microwave heating system for preparing high-purity polycrystalline silicon.
Kim Hee Y. (Daejeon KRX) Song Yong M. (Daejeon KRX) Jeon Jong Y. (Daejeon KRX) Kwon Dae H. (Daejeon KRX) Lee Kang M. (Daejeon KRX) Lee Jae S. (Daejeon KRX) Park Dong S. (Daejeon KRX), Heating of fluidized bed reactor by microwaves.
Yamamoto Shigeyuki (Amagasaki JPX) Adachi Hiroshi (Amagasaki JPX), High purity hydroxy-terminated phenyl ladder polysiloxane and method for producing the same.
Li Jiang (Beijing CNX) Pan Xijin (Beijing CNX) You Shoudong (Beijing CNX) Huang Shixiong (Beijing CNX), Method for surface treating conductive copper powder with a treating agent and coupler.
Grabmaier Christa (Berg DEX) Otto Franz (Munich DEX) Thomann Helmut (Munich DEX), Method of producing plate- or tape-shaped silicon crystal bodies having crystalline pillar-like structures therein, equi.
Lemmi, Francesco; Rogojina, Elena V.; Yu, Pingrong; Jurbergs, David; Antoniadis, Homer; Kelman, Maxim, Methods for creating a densified group IV semiconductor nanoparticle thin film.
Saul Griffith ; Joseph M. Jacobson ; Scott Manalis, Methods for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging.
Miyazaki, Makoto; Tanaka, Satoru, Monolithic ceramic electronic component and production process therefor, and ceramic paste and production process therefor.
Horne, Craig R.; DeMascarel, Pierre J.; Honeker, Christian C.; Chaloner-Gill, Benjamin; Lopez, Herman A.; Bi, Xiangxin; Mosso, Ronald J.; McGovern, William E.; Gardner, James T.; Kumar, Sujeet; Gilli, Optical materials and optical devices.
Motoomi Arakawa JP; Kazuaki Sukata JP; Yasuyuki Agari JP; Masayuki Shimada JP, Organic-inorganic composite material and process for preparing the same.
Weiss Shimon ; Bruchez ; Jr. Marcel ; Alivisatos Paul, Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such p.
Yamamura Ryuji (Kyoto JPX) Tsuboi Mikio (Kyoto JPX) Kitagawa Keishi (Kyoto JPX) Abe Masaru (Kyoto JPX), Packaging material for high pressure liquid chromatography and method of making the same.
Wong Sui-Ming (Collegeville PA) Cooper Eugene R. (Berwyn PA) Xu Shugian (Exton PA), Polyalkylene block copolymers as surface modifiers for nanoparticles.
Blackburn, Gary; Creager, Stephen E.; Fraser, Scott; Irvine, Bruce D.; Meade, Thomas J.; O'Connor, Stephen D.; Terbrueggen, Robert H.; Vielmetter, Jost G.; Welch, Thomas W., Printed circuit boards with monolayers and capture ligands.
Lee Jung D. (Soowon KRX) Yoo Chang J. (Soowon KRX) Lee Moon Y. (Soowon KRX), Process for preparing a low stress agent & an epoxy composition containing the agent.
Chiruvolu, Shivkumar; Altman, Igor; Frey, Bernard M.; Li, Weidong; Liu, Guojun; Lynch, Robert B.; Pengra-Leung, Gina Elizabeth; Srinivasan, Uma, Silicon/germanium nanoparticles and inks having low metal contamination.
Hieslmair, Henry; Dioumaev, Vladimir K.; Chiruvolu, Shivkumar; Du, Hui, Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications.
Mitsuhiro Maruyama,JPX ; Yasuhiro Maruyama,JPX, Substrate for producing semiconductor device, method for producing the substrate, photoelectric conversion device and method for producing the photoelectric conversion device.
Yudasaka,Ichio; Shimoda,Tatsuya; Kanbe,Sadao; Miyazawa,Wakao, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device.
Yudasaka,Ichio; Shimoda,Tatsuya; Kanbe,Sadao; Miyazawa,Wakao, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.