Use of multiple storage caverns for product impurity control
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B65G-005/00
G01N-033/00
출원번호
US-0943687
(2015-11-17)
등록번호
US-9482654
(2016-11-01)
발명자
/ 주소
Strybos, Ronald
출원인 / 주소
Air Liquide Large Industries U.S. LP
대리인 / 주소
Haynes, Elwood L.
인용정보
피인용 횟수 :
0인용 특허 :
31
초록▼
An inventory management method is also provided. This method includes removing and replacing the gas product from a first salt cavern as supply and demand dictate, analyzing the impurities in the gas product that is removed, predicting the duration until a maximum acceptable impurity limit is presen
An inventory management method is also provided. This method includes removing and replacing the gas product from a first salt cavern as supply and demand dictate, analyzing the impurities in the gas product that is removed, predicting the duration until a maximum acceptable impurity limit is present, removing all the working gas from the first salt cavern when the maximum acceptable impurity limit is reached, then replacing the working gas in the first salt cavern, while concurrently, removing and replacing the gas product from a second salt cavern as supply and demand dictate, analyzing the impurities in the gas product that is removed, predicting the duration until a maximum acceptable impurity limit is present, removing all the working gas from the second salt cavern when the maximum acceptable impurity limit is reached, then replacing the working gas in the second salt cavern, while concurrently repeating steps a)-g).
대표청구항▼
1. An inventory management method, comprising: a) introducing a gas product into a first salt cavern and a second salt cavern,b) analyzing the impurities in the gas product,c) predicting the duration until a maximum acceptable impurity limit is present,d) removing and replacing the gas product from
1. An inventory management method, comprising: a) introducing a gas product into a first salt cavern and a second salt cavern,b) analyzing the impurities in the gas product,c) predicting the duration until a maximum acceptable impurity limit is present,d) removing and replacing the gas product from the first salt cavern as supply and demand dictate,e) removing all the working gas from the first salt cavern when the predicted maximum acceptable impurity limit duration is reached, then replacing the working gas in the first salt cavern, while concurrently,f) removing and replacing the gas product from the second salt cavern as supply and demand dictate,g) removing all the working gas from the second salt cavern when the predicted maximum acceptable impurity limit duration is reached, then replacing the working gas from the second salt cavern, while concurrently repeating steps b)-f). 2. The inventory management method of claim 1, wherein the gas product is selected from the group consisting of hydrogen, nitrogen, carbon dioxide, air, methane, ethane, ethylene, propylene, propane, ethane/propane mix, butane, and pentane. 3. The inventory management method of claim 1, wherein the gas product is hydrogen. 4. The inventory management method of claim 1, wherein the impurities are selected from the group consisting of hydrogen sulfide, methane, carbon dioxide, nitrogen, ethane, and benzene.
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이 특허에 인용된 특허 (31)
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