Methods and apparatus for material processing using plasma thermal source
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C03B-005/02
C03B-003/00
C03B-005/185
C03B-019/10
H05H-001/24
H05H-001/46
출원번호
US-0231008
(2014-03-31)
등록번호
US-9550694
(2017-01-24)
발명자
/ 주소
Boughton, Daniel Robert
출원인 / 주소
Corning Incorporated
대리인 / 주소
Barron, Jason A.
인용정보
피인용 횟수 :
0인용 특허 :
64
초록▼
Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel in such a way that the glass batch material is dispensed as a sheet of glass batch material particles; directing one or more sources of plasma gas into the inner volume of the plasma containment vessel i
Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel in such a way that the glass batch material is dispensed as a sheet of glass batch material particles; directing one or more sources of plasma gas into the inner volume of the plasma containment vessel in such a way that the plasma gas enters the plasma containment vessel as at least one sheet of plasma gas; and applying an alternating electric field to facilitate production of a plasma plume within the inner volume of the plasma containment vessel, where the plasma plume is of dimensions sufficient to envelope the sheet of glass batch material particles, and is of sufficient thermal energy to cause the glass batch material to react and melt thereby forming substantially homogeneous, spheroid-shaped glass intermediate particles.
대표청구항▼
1. An apparatus, comprising: a plasma containment vessel having at least first and second opposing wall members defining an inner volume of X, Y, Z orthogonal dimensions and directions, an inlet end, and an opposing outlet end separated from the inlet end in the Y direction;an inlet structure dispos
1. An apparatus, comprising: a plasma containment vessel having at least first and second opposing wall members defining an inner volume of X, Y, Z orthogonal dimensions and directions, an inlet end, and an opposing outlet end separated from the inlet end in the Y direction;an inlet structure disposed at the inlet end of the plasma containment vessel and including: (i) a material inlet for receiving glass batch material, and an opposing material outlet, where the material inlet and the material outlet are elongate in the X direction such that the glass batch material is dispensed as a substantially planar sheet of glass batch material particles into the inner volume of the plasma containment vessel, (ii) at least one gas inlet for receiving one or more sources of plasma gas, and (iii) a plurality of gas outlets disposed in a linear arrangement around a periphery of the material outlet, each of the plurality of gas outlets including at least one bore extending from the at least one gas inlet to the periphery of the material outlet, and the gas outlets for directing the plasma gas into the inner volume of the plasma containment vessel; andfirst and second electrode plates covering portions of respective exterior surfaces of the first and second wall members of the plasma containment vessel, wherein:the first and second electrode plates are operable to receive a source of alternating current (AC) power having characteristics sufficient to produce an alternating electric field in the Z direction, and facilitate production of a plasma plume within the plasma containment vessel,the plasma plume is of a substantially planar sheet shape having dimensions sufficient to envelope the planar sheet of glass batch material particles, and is of sufficient thermal energy to cause the glass batch material to thermally react. 2. The apparatus of claim 1, wherein the plasma plume is of sufficient thermal energy to cause thermal reaction of sufficient characteristics to at least one of: at least partially melt the glass batch material,at least partially melt at least one of the glass batch material and one or more further materials thereby forming coated glass batch material particles, andat least partially melt the glass batch material to form substantially homogeneous, spheroid-shaped glass intermediate particles. 3. The apparatus of claim 1, wherein: the material outlet includes at least first and second opposing peripheral edges extending in the X direction in which the material outlet is elongate; andthe plurality of gas outlets are disposed at intervals along at least one of the first and second opposing peripheral edges of the material outlet, and are operable to direct the plasma gas into the inner volume of the plasma containment vessel as at least one planar sheet of plasma gas. 4. The apparatus of claim 3, wherein the plurality of gas outlets are disposed at intervals along both of the first and second opposing peripheral edges of the material outlet, and are operable to direct the plasma gas into the inner volume of the plasma containment vessel as two planar sheets of plasma gas. 5. The apparatus of claim 4, wherein the plurality of gas outlets are directed at an angle with respect to the Y direction such that the two planar sheets of plasma gas are directed both in the Y direction and toward one another in order to envelop the planar sheet of glass batch material particles. 6. The apparatus of claim 1, further comprising: a magnetic source operating to produce a magnetic field characterized by a plurality of lines of magnetic flux directed through the inner volume of the plasma containment vessel in the X direction,wherein the first and second electrode plates are oriented in respective planes that are parallel to a reference X-Y plane extending in the X and Y directions, and the plurality of lines of magnetic flux are directed in the X direction and parallel with the reference X-Y plane. 7. The apparatus of claim 6, wherein: at periodic instances of time, the first and second electrode plates produce respective electric fields, each electric field being characterized by lines of electric flux emanating from one of the first and second electrode plates toward the other of the first and second electrode plates in the Z direction, andthe interaction of the electric flux and the magnetic flux is such that an electron cyclotron frequency of electrons about the magnetic flux is produced of sufficient magnitude to produce the plasma plume of sufficient thermal energy to cause the glass batch material to thermally react. 8. The apparatus of claim 6, wherein the magnetic field is one of: (i) at least about 2.0×10−3 Tesla, (ii) at least about 3.0×10−3 Tesla, and (iii) at least about 4.0×10−3 Tesla. 9. The apparatus of claim 7, wherein the electron cyclotron frequency is one of: (i) at least about 2.0×108 radians/second, (ii) at least about 3.0×108 radians/second, and at least about 4.0×108 radians/second. 10. The apparatus of claim 1, wherein the plasma plume has a temperature ranging from one of: (i) about 9,000° K to about 18,000° K; (ii) about 11,000° K to about 15,000° K; and (iii) at least about 11,000° K. 11. The apparatus of claim 1, wherein the first and second opposing wall members include respective internal channels operating to carry fluid therethrough in order to cool the plasma containment vessel in the presence of the plasma plume. 12. The apparatus of claim 1, wherein the inlet structure includes one or more internal channels operating to carry fluid therethrough in order to cool the inlet structure in the presence of the plasma plume. 13. The apparatus of claim 1, wherein the inlet opening is of a construction capable of receiving the glass batch material having an average particle size ranging from about 5 to about 1,000 microns. 14. The apparatus of claim 1, wherein the plasma gas includes at least one of argon, air, helium, nitrogen, oxygen, and mixtures thereof. 15. The apparatus of claim 1, wherein the thermally reacted glass batch material exit the plasma containment vessel through the outlet end.
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