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특허 상세정보

Methods and apparatus for material processing using plasma thermal source

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C03B-005/02    C03B-003/00    C03B-005/185    C03B-019/10    H05H-001/24    H05H-001/46   
출원번호 US-0231008 (2014-03-31)
등록번호 US-9550694 (2017-01-24)
발명자 / 주소
  • Boughton, Daniel Robert
출원인 / 주소
  • Corning Incorporated
대리인 / 주소
    Barron, Jason A.
인용정보 피인용 횟수 : 0  인용 특허 : 64
초록

Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel in such a way that the glass batch material is dispensed as a sheet of glass batch material particles; directing one or more sources of plasma gas into the inner volume of the plasma containment vessel in such a way that the plasma gas enters the plasma containment vessel as at least one sheet of plasma gas; and applying an alternating electric field to facilitate production of a plasma plume within the inner volume of the plasma containment vessel, where the...

대표
청구항

1. An apparatus, comprising: a plasma containment vessel having at least first and second opposing wall members defining an inner volume of X, Y, Z orthogonal dimensions and directions, an inlet end, and an opposing outlet end separated from the inlet end in the Y direction;an inlet structure disposed at the inlet end of the plasma containment vessel and including: (i) a material inlet for receiving glass batch material, and an opposing material outlet, where the material inlet and the material outlet are elongate in the X direction such that the glass b...

이 특허에 인용된 특허 (64)

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