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Methods and apparatus for material processing using plasma thermal source

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03B-005/02
  • C03B-003/00
  • C03B-005/185
  • C03B-019/10
  • H05H-001/24
  • H05H-001/46
출원번호 US-0231008 (2014-03-31)
등록번호 US-9550694 (2017-01-24)
발명자 / 주소
  • Boughton, Daniel Robert
출원인 / 주소
  • Corning Incorporated
대리인 / 주소
    Barron, Jason A.
인용정보 피인용 횟수 : 0  인용 특허 : 64

초록

Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel in such a way that the glass batch material is dispensed as a sheet of glass batch material particles; directing one or more sources of plasma gas into the inner volume of the plasma containment vessel i

대표청구항

1. An apparatus, comprising: a plasma containment vessel having at least first and second opposing wall members defining an inner volume of X, Y, Z orthogonal dimensions and directions, an inlet end, and an opposing outlet end separated from the inlet end in the Y direction;an inlet structure dispos

이 특허에 인용된 특허 (64)

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