Multi-laminate hermetic barriers and related structures and methods of hermetic sealing
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B32B-003/04
B32B-027/32
B32B-027/36
H01L-051/52
출원번호
US-0032663
(2013-09-20)
등록번호
US-9555595
(2017-01-31)
발명자
/ 주소
Edwards, Victoria Ann
Giroux, Cynthia Baker
Koval, Shari Elizabeth
Quesada, Mark Alejandro
Walczak, Wanda Janina
출원인 / 주소
Edwards, Victoria Ann
인용정보
피인용 횟수 :
0인용 특허 :
9
초록▼
A free-standing multi-laminate hermetic sheet includes a first carrier film, a hermetic inorganic thin film formed over the first carrier film, and a second carrier film formed over the hermetic inorganic thin film. A workpiece can be hermetically sealed using the multi-laminate sheet, which can be
A free-standing multi-laminate hermetic sheet includes a first carrier film, a hermetic inorganic thin film formed over the first carrier film, and a second carrier film formed over the hermetic inorganic thin film. A workpiece can be hermetically sealed using the multi-laminate sheet, which can be applied to the workpiece in a step separate from a formation step of either the multi-laminate sheet or the workpiece.
대표청구항▼
1. A protected substrate comprising: an hermetic structure formed over a major surface of a substrate,wherein the hermetic structure comprises a barrier layer in direct physical contact with a film,wherein the barrier layer comprises a glass material selected from the group consisting of a tin fluor
1. A protected substrate comprising: an hermetic structure formed over a major surface of a substrate,wherein the hermetic structure comprises a barrier layer in direct physical contact with a film,wherein the barrier layer comprises a glass material selected from the group consisting of a tin fluorophosphate glass, a tungsten-doped tin fluorophosphate glass, a chalcogenide glass, a tellurite glass, and a borate glass and the film comprises a polymer layer,wherein the tin fluorophosphate glass comprises 20-85 wt % Sn, 2-20 wt % P, 10-36 wt % O, 10-36 wt % F, 0-5 wt % Nb, and at least 75 wt % total of Sn+P+0+F, andwherein the tungsten-doped tin fluorophosphate glass comprises 55-75 wt % Sn, 4-14 wt % P, 6-24 wt % O, 4-22 wt % F, and 0.15-15 wt % W. 2. The protected substrate according to claim 1, wherein from two or more hermetic structures are formed over the substrate. 3. The protected substrate according to claim 2, wherein a first major surface of the film is in direct physical contact with the barrier layer and an opposing second major surface of the film is in contact with a second barrier layer comprising a glass material selected from the group consisting of a tin fluorophosphate glass, a tungsten-doped tin fluorophosphate glass, a chalcogenide glass, a tellurite glass, a borate glass and a phosphate glass. 4. The protected substrate according to claim 1, wherein the barrier layer or film is in physical contact with the substrate. 5. The protected substrate according to claim 1, wherein the barrier layer, the film or both the barrier layer and film have an average thickness of less than about 50 microns. 6. The protected substrate according to claim 1, wherein the film comprises a polymer selected from the group consisting of polydimethylsiloxane, polyethylene naphthalate, and polyethylene terephthalate. 7. The protected substrate according to claim 1, wherein the hermetic structure is optically translucent. 8. The protected substrate according to claim 1, wherein the substrate comprises gallium nitride. 9. The protected substrate according to claim 1, wherein the barrier layer has an average thickness ranging from about 0.5 to about 10 microns. 10. A protected substrate comprising: an hermetic structure formed over a major surface of a substrate,wherein the hermetic structure comprises a barrier layer in direct physical contact with a film, andwherein the barrier layer comprises a glass material selected from the group consisting of a tin fluorophosphate glass, a tungsten-doped tin fluorophosphate glass, a chalcogenide glass, a tellurite glass, a borate glass and a phosphate glass, andwherein the film comprises a polymer selected from the group consisting of polydimethylsiloxane, polyethylene naphthalate, and polyethylene terephthalate.
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