Three-dimensional two-terminal memory with enhanced electric field and segmented interconnects
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G11C-013/00
H01L-045/00
출원번호
US-0046172
(2016-02-17)
등록번호
US-9570683
(2017-02-14)
발명자
/ 주소
Jo, Sung Hyun
Kim, Kuk-Hwan
Bettinger, Joanna
출원인 / 주소
CROSSBAR, INC.
대리인 / 주소
Amin, Turocy & Watson, LLP
인용정보
피인용 횟수 :
8인용 특허 :
193
초록▼
Providing for three-dimensional memory cells having enhanced electric field characteristics and/or memory cells located at broken interconnects is described herein. By way of example, a two-terminal memory cell can be constructed from a layered stack of materials, where respective layers are arrange
Providing for three-dimensional memory cells having enhanced electric field characteristics and/or memory cells located at broken interconnects is described herein. By way of example, a two-terminal memory cell can be constructed from a layered stack of materials, where respective layers are arranged along a direction that forms a non-zero angle to a normal direction of a substrate surface upon which the layered stack of materials is constructed. In some aspects, the direction can be orthogonal to or substantially orthogonal to the normal direction. In other aspects, the direction can be less than orthogonal to the normal direction. Where an internal angle of the memory cell forms a non-orthogonal angle, an enhanced electric field or current density can result, providing improved switching times and memory performance.
대표청구항▼
1. A semiconductor device, comprising: a first insulating layer formed above a complementary metal oxide semiconductor (CMOS) substrate that comprises a plurality of CMOS devices;a bottom electrode disposed above the first insulating layer, wherein the bottom electrode comprises a top surface and a
1. A semiconductor device, comprising: a first insulating layer formed above a complementary metal oxide semiconductor (CMOS) substrate that comprises a plurality of CMOS devices;a bottom electrode disposed above the first insulating layer, wherein the bottom electrode comprises a top surface and a bottom surface that are substantially orthogonal to a normal direction of the CMOS substrate, wherein the bottom electrode comprises a third surface coupled to the first surface and the second surface, and wherein the third surface is oblique relative to the normal direction of the CMOS substrate;a second insulating layer disposed at least in part over the bottom electrode having a via formed therein, wherein at least the third surface of the bottom electrode is exposed by the via;a switching memory structure disposed within the via and on top of the third surface; anda top electrode disposed within the via and on top of the switching memory structure, wherein an electrode material of the top electrode is configured to be ionized and form ions in response to an applied bias across the bottom electrode and the top electrode;wherein the switching memory structure comprises a switching material, wherein the switching material is permeable to the ions of the top electrode, and wherein the switching material facilitates formation of a conductive path from the ions of the top electrode from the top electrode towards the bottom electrode along a direction that is oblique to the normal direction of the CMOS substrate;wherein the top electrode, the switching memory structure and the bottom electrode form a memory device;wherein the bottom electrode layer forms a bitline of the memory device; andwherein the top electrode layer forms a wordline of the memory device. 2. The semiconductor device of claim 1, wherein the switching material is selected from a group consisting of: an amorphous insulating film, an amorphous silicon, an undoped silicon material. 3. The semiconductor device of claim 1, wherein the switching material is selected from a group consisting of: SiOx, and a silicon nitride. 4. The semiconductor device of claim 1, wherein the electrode material is selected from a group consisting of: nickel, aluminum, chromium, tungsten, titanium, titanium-nitride. 5. The semiconductor device of claim 1, wherein the switching memory structure comprises the switching material, a conductive layer and a selection layer. 6. The semiconductor device of claim 5, wherein the selection layer is selected from a group consisting of: TiOx, AlOx, WOx, HfOx, and SiOx. 7. The semiconductor device of claim 1, further comprising: another bottom electrode disposed above the second insulating layer, wherein the other bottom electrode comprises another top surface and another bottom surface that are substantially orthogonal to the normal direction of the CMOS substrate, wherein the other bottom electrode comprises another third surface coupled to the other first surface and the other second surface, and wherein the other third surface is oblique relative to the normal direction of the CMOS substrate;a third insulating layer disposed at least in part over the other bottom electrode having another via formed therein, wherein at least the other third surface of the other bottom electrode is exposed by the other via;wherein the switching memory structure is also disposed within the other via and on top of the other third surface;wherein the top electrode is also disposed within the other via and on top of the other switching memory structure;wherein the top electrode, the other switching memory structure and the other bottom electrode form another memory device;wherein the other bottom electrode layer forms another bitline of the other memory device; andwherein the top electrode layer forms a wordline of the other memory device. 8. The semiconductor device of claim 1, wherein the bitline extends in a first direction relative to the CMOS substrate; andwherein the word line extends in a second direction relative to the CMOS substrate, wherein the first direction and the second direction are approximately orthogonal. 9. The semiconductor device of claim 8, wherein the via comprises a cross-sectional shape relative to the CMOS substrate, wherein the cross-sectional shape is selected from a group consisting of: approximately a rectangle, approximately a parallelogram, and approximately a quadrilateral. 10. The semiconductor device of claim 1, wherein the bitline extends in a first direction relative to the CMOS substrate; andwherein the word line extends in a second direction relative to the CMOS substrate, wherein the first direction and the second direction are non-orthogonal; andwherein the via comprises a cross-sectional shape relative to the CMOS substrate, wherein the cross-sectional shape is selected from a group consisting of: approximately a parallelogram, and approximately a quadrilateral. 11. A method for fabricating a semiconductor device, comprising: receiving a complementary metal oxide semiconductor (CMOS) substrate having a plurality of CMOS devices formed therein;forming a first insulating layer above the CMOS substrate;forming a bottom electrode above the first insulating layer, wherein the bottom electrode comprises a top surface and a bottom surface that are substantially orthogonal to a normal direction of the CMOS substrate;forming a second insulating layer above the bottom electrode;forming a via within the second insulating layer and within the bottom electrode, wherein a third surface of the bottom electrode is exposed, wherein third surface is coupled to the first surface and the second surface, and wherein the third surface is oblique relative to the normal direction of the CMOS substrate;forming a switching memory structure within the via, wherein at least a portion the switching memory structure is in contact with the third surface; andforming a top electrode within the via, wherein at least a portion of the top electrode is in contact with the portion of the switching memory structure, wherein an electrode material of the top electrode is configured to be ionized and form ions in response to an applied bias across the bottom electrode and the top electrode;wherein the switching memory structure comprises a switching material, wherein the switching material is permeable to the ions of the top electrode, and wherein the switching material facilitates formation of a conductive path from the ions of the top electrode from the top electrode towards the bottom electrode along a direction that is oblique to the normal direction of the CMOS substrate;wherein the top electrode, the switching memory structure and the bottom electrode form a memory device;wherein the bottom electrode layer forms a bitline of the memory device; andwherein the top electrode layer forms a wordline of the memory device. 12. The method of claim 11, wherein the forming the switching memory structure comprises depositing a switching material, wherein the switching material is selected from a group consisting of: an amorphous insulating film, an amorphous silicon, an undoped silicon material. 13. The method of claim 11 wherein the forming the switching memory structure comprises depositing the switching material, wherein the switching material is selected from a group consisting of: SiOx, and a silicon nitride. 14. The method of claim 11, wherein forming the top electrode comprises depositing the electrode material, wherein the electrode material is selected from a group consisting of: nickel, aluminum, chromium, tungsten, titanium, titanium-nitride. 15. The method of claim 11, wherein forming the switching memory structure comprises: forming a selection layer within the via, wherein at least a portion of the selection layer is in contact with the third surface; andforming the switching material within the via, wherein at least a portion of the switching material is in contact with the portion of the selection layer. 16. The method of claim 15, wherein the forming the selection layer comprises forming a selection material, wherein the selection material is selected from a group consisting of: TiOx, AlOx, WOx, HfOx, and SiOx. 17. The method of claim 11, further comprising: forming another bottom electrode above the second insulating layer, wherein the other bottom electrode comprises another top surface and another bottom surface that are substantially orthogonal to the normal direction of the CMOS substrate;forming a third insulating layer above other bottom electrode;wherein forming the via further comprises forming the via within the third insulating layer and within the other bottom electrode, wherein another third surface of the other bottom electrode is exposed, wherein other third surface is coupled to the other first surface and the other second surface, and wherein the other third surface is oblique relative to the normal direction of the CMOS substrate;wherein at least another portion the switching memory structure is in contact with the other third surface; andwherein at least another portion of the top electrode is in contact with the other portion of the switching memory structure, wherein the electrode material of the top electrode is configured to be ionized and form ions in response to an applied bias across the other bottom electrode and the top electrode;wherein the other switching memory structure comprises the switching material, wherein the switching material is permeable to the ions of the top electrode, and wherein the switching material facilitates formation of another conductive path from the ions of the top electrode from the top electrode towards the other bottom electrode along a direction that is oblique to the normal direction of the CMOS substrate;wherein the top electrode, the switching memory structure and the other bottom electrode form another memory device;wherein the other bottom electrode layer forms a bitline of the other memory device; andwherein the top electrode layer forms a wordline of the other memory device. 18. The method of claim 11, wherein the forming the bottom electrode above the first insulating layer comprises forming the bitline in a first direction relative to the CMOS substrate; andwherein the forming the top electrode comprises forming the word line in a second direction relative to the CMOS substrate, wherein the first direction and the second direction are approximately orthogonal. 19. The method of claim 18, wherein the forming the via within the second insulating layer comprises forming the via with a cross-sectional shape relative to the CMOS substrate, wherein the cross-sectional shape is selected from a group consisting of: approximately a rectangle, approximately a parallelogram, and approximately a quadrilateral. 20. The method of claim 11, wherein the forming the bottom electrode above the first insulating layer comprises forming the bitline in a first direction relative to the CMOS substrate; andwherein the forming the top electrode comprises forming the word line in a second direction relative to the CMOS substrate, wherein the first direction and the second direction are non-orthogonal; andwherein the forming the via comprises forming the via with a cross-sectional shape relative to the CMOS substrate, wherein the cross-sectional shape is selected from a group consisting of: approximately a parallelogram, and approximately a quadrilateral.
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