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Landfill gas treatment method with polishing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/14
  • C07C-007/11
  • C10L-003/10
  • B01D-019/00
출원번호 US-0135885 (2016-04-22)
등록번호 US-9580369 (2017-02-28)
발명자 / 주소
  • Morrow, David C.
  • Morrow, Paul D.
  • Morrow, Luke N.
출원인 / 주소
  • Morrow, David C.
대리인 / 주소
    www.bobharter.com
인용정보 피인용 횟수 : 0  인용 특허 : 48

초록

A method for recovering methane gas from a landfill involves the use of a main absorber, a flash system, an optional ancillary absorber and an optional polishing absorber. The recovered gas is maintained at a temperature that enhances a solvent's ability to absorb carbon dioxide from the recovered g

대표청구항

1. A method for using a solvent in treating a gas from a landfill, wherein the gas and the solvent have a varying concentration of carbon dioxide, the method comprising: conveying the gas through a main absorber;conveying substantially all of the gas from the main absorber through a polishing absorb

이 특허에 인용된 특허 (48)

  1. Bahr, David A.; Davis, Lamar A., Absorption method for recovering gas contaminants at high purity.
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  10. Mak, John, Configurations and methods of high pressure acid gas removal.
  11. Goddin ; Jr. Clifton S. (Tulsa OK), Cryogenic distillative removal of CO2 from high CO2 content hydrocarbon containing streams 상세보기
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