A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an e
A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.
대표청구항▼
1. A method for the preparation of an electrochromic device comprising: a) providing a first conductive layer,b) depositing one of an electrochromic layer or a counter electrode layer on said first conductive layer, thereby providing a first deposited electrode,c) depositing an ion-conductor layer o
1. A method for the preparation of an electrochromic device comprising: a) providing a first conductive layer,b) depositing one of an electrochromic layer or a counter electrode layer on said first conductive layer, thereby providing a first deposited electrode,c) depositing an ion-conductor layer on said first deposited electrode,d) depositing the other of said electrochromic layer or said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode,e) depositing lithium onto said second deposited electrode whereby a mixed tungsten-nickel oxide of the counter electrode layer is reduced,f) depositing a second conductive layer on said second deposited electrode, andg) heat treating said electrochromic device,wherein said counter electrode layer comprises a mixed tungsten-nickel oxide,wherein said mixed tungsten-nickel oxide in said electrochromic device is substantially crystalline, andwherein an amount of nickel in said mixed oxide ranges from 30% to 70% by weight of said mixed oxide. 2. The method of claim 1, wherein said amount ranges from about 40% to about 60% by weight of said mixed oxide. 3. The method of claim 1, wherein said electrochromic layer comprises a metal oxide. 4. The method of claim 3, wherein said metal oxide is selected from the group consisting of tungsten oxide, vanadium oxide, molybdenum oxide, niobium oxide, titanium oxide, iridium oxide, chromium oxide, copper oxide, and manganese oxide. 5. The method of claim 3, wherein said metal oxide is doped with one or more metals. 6. The method of claim 1, comprising depositing said lithium in an amount which provides a maximum transmission through said counter electrode layer. 7. The method of claim 1, comprising depositing said lithium in an amount in excess of an amount which provides a maximum transmission through said counter electrode layer. 8. The method of claim 7, wherein said excess amount ranges from about 10% to about 40% above said amount which provides a maximum transmission through said counter electrode layer. 9. The method of claim 1, comprising heating said electrochromic device to a temperature ranging from about 280° C. to about 500° C. 10. The method of claim 9, comprising heating said electrochromic device to a temperature ranging from about 355° C. to about 395° C. 11. The method of claim 1, comprising depositing said counter electrode layer by means of physical vapor deposition. 12. The method of claim 1, comprising depositing said counter electrode layer by means of intermediate frequency reactive sputtering. 13. The method of claim 1, comprising depositing said counter electrode layer by means of DC sputtering. 14. The method of claim 1, comprising depositing said lithium on said counter electrode layer by means of wet chemical methods. 15. The method of claim 1, comprising depositing said lithium on said counter electrode layer by means of physical vapor deposition. 16. A method of making a counter electrode layer for use in connection with an electrochromic device comprising: a) depositing a film of mixed tungsten-nickel oxide on a substrate,b) reducing said mixed tungsten-nickel oxide film by depositing lithium on said film, andc) heating said counter electrode layer,wherein said mixed tungsten-nickel oxide in said counter electrode layer is substantially crystalline, wherein an amount of nickel in said mixed oxide ranges from 30% to 70% by weight of said mixed oxide. 17. The method of claim 16, wherein said amount ranges from about 40% to about 60% by weight of said mixed oxide. 18. The method of claim 16, comprising depositing said lithium in an amount which provides a maximum transmission through said counter electrode layer. 19. The method of claim 16, comprising depositing said lithium in an amount in excess of an amount which provides a maximum transmission through said counter electrode layer. 20. The method of claim 19, wherein said excess amount ranges from about 10% to about 40% above said amount which provides a maximum transmission through said counter electrode layer. 21. The method of claim 16, comprising depositing said counter electrode layer by means of physical vapor deposition. 22. The method of claim 16, comprising depositing said counter electrode layer by means of intermediate frequency reactive sputtering. 23. The method of claim 16, comprising depositing said counter electrode layer by means of DC sputtering. 24. The method of claim 16, comprising depositing said lithium on said counter electrode layer by means of wet chemical methods. 25. The method of claim 16, comprising depositing lithium on said counter electrode layer by means of physical vapor deposition. 26. A method for the preparation of an electrochromic device comprising: a) providing a first conductive layer,b) depositing one of an electrochromic layer or a counter electrode layer comprising a mixed tungsten-nickel oxide on said first conductive layer, thereby providing a first deposited electrode,c) depositing an ion-conductor layer on said first deposited electrode,d) depositing the other of said electrochromic layer or said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode,f) depositing lithium onto said second deposited electrode whereby the mixed tungsten-nickel oxide of the counter electrode is reduced, said lithium being deposited in an amount in excess of an amount which provides a maximum transmission through said counter electrode layer,e) depositing a second conductive layer on said second deposited electrode, andg) heating said electrochromic device,wherein said mixed tungsten-nickel oxide in said electrochromic device is substantially crystalline, wherein an amount of nickel in said mixed oxide ranges from 30% to 70% by weight of said mixed oxide. 27. A method for the preparation of an electrochromic device comprising: a) providing a first conductive layer,b) depositing one of an electrochromic layer or a counter electrode layer comprising a mixed tungsten-nickel oxide in crystalline form on said first conductive layer, thereby providing a first deposited electrode,c) depositing an ion-conductor layer on said first deposited electrode,d) depositing the other of said electrochromic layer or said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode,e) depositing lithium onto said counter electrode layer whereby said mixed tungsten-nickel oxide is reduced, wherein said lithium is deposited in an amount of from 10% to 40% above an amount which provides a maximum transmission through said counter electrode layer,f) depositing a second conductive layer on said second deposited electrode, andg) heat treating said electrochromic device,wherein an amount of nickel in said mixed oxide ranges from about 30% to about 70% by weight of said mixed oxide.
Ando Eiichi (Yokohama JPX) Suzuki Koichi (Yokohama JPX) Ebisawa Junichi (Tokyo JPX) Suzuki Susumu (Kawasaki JPX), Amorphous oxide film and article having such film thereon.
Ando Eiichi (Yokohama JPX) Suzuki Koichi (Yokohama JPX) Ebisawa Junichi (Tokyo JPX) Suzuki Susumu (Kawasaki JPX), Amorphous oxide film and article having such film thereon.
Gordon Roy G. (c/o Thompson ; Birch ; Gauthier & Samuels ; 225 Franklin St. Boston MA 02110), Coating process for making non-iridescent glass structure.
Shashidhar Ranganathan ; Calvert Jeffrey M. ; Crawford Renate J. ; Wynne Kenneth J. ; Vargo Terrence G. ; MacDiarmid Alan G. ; Avlyanov Jamshid K., Conducting substrate, liquid crystal device made therefrom and liquid crystalline composition in contact therewith.
Varaprasad Desaraju V. (Holland MI) Looman Steven D. (Salt Lake City UT) Zhao Mingtang (Holland MI) Habibi Hamid R. (Holland MI) Lynam Niall R. (Holland MI), Electrochemichromic solutions, processes for preparing and using the same, and devices manufactured with the same.
Heuer Helmut-Werner,DEX ; Wehrmann Rolf,DEX, Electrochromic assembly based on poly(3,4-ethylene-dioxythiophene) derivatives with a counterelectrode containing metal oxides from transition group VI or VIII.
Heuer Helmut-Werner,DEX ; Wehrmann Rolf,DEX, Electrochromic assembly based on poly(3,4-ethylenedioxythiophene) derivatives and a UV-stabilized gel electrolyte.
Allemand Pierre M. ; Grimes Randall F. ; Ingle Andrew R. ; Cronin John P. ; Kennedy Steve R. ; Agrawal Anoop ; Boulton Jonathan M., Electrochromic devices.
Allemand Pierre Marc ; Ingle Andrew ; Cronin John P. ; Kennedy Steven R. ; Yao Yongjin ; Tonazzi Juan Carlos Lopez ; Boulton Jonathan M. ; Agrawal Anoop, Electrochromic devices.
Kallman William R. (Portland OR) Williams James D. (Forest Grove OR) Ozias Albert E. (Aumsville OR) Dorfman Leonard M. (Tigard OR) Schaus Christian F. (Wilsonville OR) Russell Geoffrey A. (Beaverton , Electrochromic edge isolation-interconnect system, process, and device for its manufacture.
Varaprasad Desaraju V. (Holland MI) Habibi Hamid (Holland MI) McCabe Ian A. (Holland MI) Lynam Niall R. (Holland MI), Electrochromic mirrors and devices.
Van Dine John E. (Mahwah NJ) Parkhe V. D. (Edison NJ) Klein Lisa C. (Highland Park NJ) Trumbore Forrest A. (Summit NJ), Electrochromic structures and methods.
Chu Wing F. (Frankfurt am Main DEX) Leonhard Volker (Frankfurt am Main DEX) Hartmann Rolf (Kelkheim DEX) Ganson Gertraud (Oberursel DEX) Weppner Werner (Stuttgart DEX), Electrochromic system.
Marchese Luca (Milan ITX) Passerini Stefano (Rome ITX) Andrei Maria (Berceto ITX) Scrosati Bruno (Rome ITX) Roggero Arnaldo (San Donato Milanese ITX), Electrochromic window, based on a polymeric polyepoxy electrolyte.
Passerini Stefano (Rome ITX) De Angelis Lucio (Rome ITX), Electrode of nickel oxide intercalated with lithium ions and electrochromic devices which incorporate such an electrode.
Krauss Alan R. (Plainfield IL) Gruen Dieter M. (Downers Grove IL granted to U.S. Department of Energy under the provisions of 42 U.S.C. 2182), First wall and limiter surfaces for plasma devices.
Greenberg Charles B. (Murrysville PA) Rukavina Thomas G. (Lower Burrell PA) Singleton David E. (Natrona Heights PA), Laminated and sealed electrochromic window.
Cronin John P. (Tucson AZ) Tarico Daniel J. (Tucson AZ) Agrawal Anoop (Tucson AZ) Zhang Raymond L. (Tucson AZ), Method for depositing high performing electrochromic layers.
Mueller John J. (Hilliard OH) Stellrecht David E. (Columbus OH), Method of bonding a sputter target-backing plate assembly assemblies produced thereby.
Gordon Roy G. (22 Highland St. Cambridge MA 02138), Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide.
Gordon Roy G. (22 Highland St. Cambridge MA 02138), Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide.
Sawayama Yutaka,JPX ; Taniguchi Koji,JPX ; Yamakawa Shinya,JPX ; Ban Atsushi,JPX ; Okada Yoshihiro,JPX ; Murai Atsuhito,JPX ; Shimada Takayuki,JPX, Method of making a reflective type LCD including providing a protective metal film over a connecting electrode during at least one portion of the manufacturing process.
Arntz Floyd O. (Newton MA) Goldner Ronald B. (Lexington MA) Haas Terry E. (Sudbury MA) Wei Guang (Somerville MA) Wong Kwok-Keung (Watertown MA), Methods for manufacturing solid state ionic devices.
Burchill, Michael Timothy; Despotopoulou, Marina M., Narrow composition distribution polyvinylidene fluoride RECLT films, processes, articles of manufacture and compositions.
Kobayashi, Hideo; Kakinuma, Takeo; Koshimizu, Minoru; Harada, Haruo; Arisawa, Hiroshi, Photoconductive switching element, device using it, and apparatus, recording apparatus, and recording method in which the device is incorporated.
Cronin John P. (Tucson AZ) Agrawal Anoop (Tucson AZ) Tarico Daniel J. (Tucson AZ) Tonazzi Juan Carlos L. (Tucson AZ), Precursor solutions for forming coatings.
Yoshida Gohei,JPX ; Minamigawa Toshio,JPX ; Matsumura Johji,JPX, Process for production of glass substrate coated with finely patterned nesa glass membrane.
Campet Guy (Canejan FRX) Bourrel Maurice (Pau FRX) Delmas Claude (Talence FRX) Portier Joesph (Gradignan FRX) Salardenne Jean (Pessac FRX), Process for the preparation of a target component for cathode sputtering.
Campet Guy (Canejan FRX) Chabagno Jean-Michel (Pau FRX) Delmas Claude (Talence FRX) Portier Joseph (Gradignan FRX) Salardenne Jean (Pessac FRX), Target component for cathode sputtering.
Goldner Ronald B. (Lexington MA) Haas Terry (Sudbury MA) Wong Kwok-Keung (Watertown MA) Seward George (Arlington MA), Thin film ion conducting coating.
Omote,Ryoumei; Inako,Yoshihide; Matsukawa,Yosuke; Sakane,Masayasu; Nishikawa,Kazuhiro, Transparent conductive film for transparent touch panel, transparent touch panel using transparent conductive film, and method of manufacturing transparent conductive film.
Bandettini Steven P. ; Brown Lindsey ; Hichwa Bryant P. ; Cumbo Michael J. ; Mathew J. Gordon H. ; O'Brien Nada A., Variably adjustable contrast enhancement electrochromic panel adapted for curved display screens and methods of making.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.