최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
DataON 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Edison 바로가기다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0481845 (2014-09-09) |
등록번호 | US-9589091 (2017-03-07) |
발명자 / 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 | 피인용 횟수 : 1 인용 특허 : 559 |
A method is disclosed for defining an integrated circuit. The method includes generating a digital data file that includes both electrical connection information and physical topology information for a number of circuit components. The method also includes operating a computer to execute a layout ge
A method is disclosed for defining an integrated circuit. The method includes generating a digital data file that includes both electrical connection information and physical topology information for a number of circuit components. The method also includes operating a computer to execute a layout generation program. The layout generation program reads the electrical connection and physical topology information for each of the number of circuit components from the digital data file and automatically creates one or more layout structures necessary to form each of the number of circuit components in a semiconductor device fabrication process, such that the one or more layout structures comply with the physical topology information read from the digital data file. The computer is also operated to store the one or more layout structures necessary to form each of the number of circuit components in a digital format on a computer readable medium.
1. A method for defining an integrated circuit, comprising: obtaining a physical layout of the integrated circuit, wherein obtaining the physical layout of the integrated circuit includes generating a digital data file that includes electrical connection information and physical topology information
1. A method for defining an integrated circuit, comprising: obtaining a physical layout of the integrated circuit, wherein obtaining the physical layout of the integrated circuit includes generating a digital data file that includes electrical connection information and physical topology information for transistors that define the integrated circuit, wherein each transistor within the integrated circuit has a corresponding linear-shaped gate electrode structure oriented to extend lengthwise in a first direction,wherein the electrical connection information for each transistor includes an identification of an electrical node to which a gate terminal of the transistor is connected, and an identification of an electrical node to which a source terminal of the transistor is connected, and an identification of an electrical node to which a drain terminal of the transistor is connected, andwherein the physical topology information for each transistor includes a transistor width as measured in the first direction, and a transistor length as measured in a second direction perpendicular to the first direction, and a transistor center horizontal position, and a transistor center vertical position, andwherein obtaining the physical layout of the integrated circuit includes executing a layout generator on a computer to generate a physical layout of the integrated circuit based on the electrical connection information and physical topology information for transistors included in the digital data file, wherein the layout generator is configured to determine which one of multiple interconnect structure options is appropriate for implementation in the physical layout based on switches or parameters in the digital data file, andwherein obtaining the physical layout of the integrated circuit includes recording data defining the physical layout of the integrated circuit on a non-transitory computer readable storage medium in a format suitable for fabrication of the integrated circuit; andutilizing the physical layout of the integrated circuit to fabricate the integrated circuit. 2. A method for defining an integrated circuit as recited in claim 1, wherein the physical topology information for each transistor further includes one or more of a transistor gate connection center vertical position, and a transistor source connection center vertical position, and a transistor drain connection center vertical position. 3. A method for defining an integrated circuit as recited in claim 2, wherein the physical topology information for each transistor further includes a transistor type specification indicating whether or not a diffusion region of the transistor is extended either 1) in a rightward horizontal direction relative to a gate electrode of the transistor, or 2) in a leftward horizontal direction relative to the gate electrode of the transistor, or 3) in both the rightward horizontal direction relative to the gate electrode of the transistor and in the leftward horizontal direction relative to the gate electrode of the transistor, or 4) in neither the rightward horizontal direction relative to the gate electrode of the transistor nor the leftward horizontal direction relative to the gate electrode of the transistor. 4. A method for defining an integrated circuit as recited in claim 2, wherein the transistor gate connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 5. A method for defining an integrated circuit as recited in claim 2, wherein the transistor source connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 6. A method for defining an integrated circuit as recited in claim 2, wherein the transistor drain connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 7. A method for defining an integrated circuit as recited in claim 1, wherein the physical topology information for one or more transistors includes specification of the transistor width in units of metal-1 pitch. 8. A method for defining an integrated circuit as recited in claim 1, wherein the physical topology information includes specification of a cell height in units of metal-1 tracks. 9. A method for defining an integrated circuit as recited in claim 1, further comprising: generating a digital technology file that includes physical dimensions corresponding to a number of variables used for the physical topology information in the digital data file. 10. A method for defining an integrated circuit as recited in claim 9, wherein processing the digital data file to generate the physical layout of the integrated circuit for fabrication includes accessing the physical dimensions from the digital technology file and substituting the physical dimensions for the number of variables in the physical topology information. 11. A method for defining an integrated circuit as recited in claim 1, further comprising: adjusting the physical dimensions within the digital technology file without adjusting the number of variables in the physical topology information in the digital data file. 12. A system for defining a physical layout of an integrated circuit, comprising: a digital data file including electrical connection information and physical topology information for transistors that define the integrated circuit, wherein each transistor within the integrated circuit has a corresponding linear-shaped gate electrode structure oriented to extend lengthwise in a first direction,wherein the electrical connection information for each transistor includes an identification of an electrical node to which a gate terminal of the transistor is connected, and an identification of an electrical node to which a source terminal of the transistor is connected, and an identification of an electrical node to which a drain terminal of the transistor is connected, andwherein the physical topology information for each transistor includes a transistor width as measured in the first direction, and a transistor length as measured in a second direction perpendicular to the first direction, and a transistor center horizontal position, and a transistor center vertical position; anda special purpose computer configured to execute a layout generator to automatically generate the physical layout of the integrated circuit based on the electrical connection information and physical topology information for transistors included in the digital data file, wherein the layout generator is configured to automatically determine which one of multiple interconnect structure options is appropriate for implementation in the physical layout based on switches or parameters in the digital data file, anda non-transitory computer readable storage medium having data recorded thereon defining the physical layout of the integrated circuit in a format suitable for fabrication of the integrated circuit. 13. A system for defining a physical layout of an integrated circuit as recited in claim 12, wherein the physical topology information for each transistor further includes one or more of a transistor gate connection center vertical position, and a transistor source connection center vertical position, and a transistor drain connection center vertical position. 14. A system for defining a physical layout of an integrated circuit as recited in claim 13, wherein the physical topology information for each transistor further includes a transistor type specification indicating whether or not a diffusion region of the transistor is extended either 1) in a rightward horizontal direction relative to a gate electrode of the transistor, or 2) in a leftward horizontal direction relative to the gate electrode of the transistor, or 3) in both the rightward horizontal direction relative to the gate electrode of the transistor and in the leftward horizontal direction relative to the gate electrode of the transistor, or 4) in neither the rightward horizontal direction relative to the gate electrode of the transistor nor the leftward horizontal direction relative to the gate electrode of the transistor. 15. A system for defining a physical layout of an integrated circuit as recited in claim 13, wherein the transistor gate connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 16. A system for defining a physical layout of an integrated circuit as recited in claim 13, wherein the transistor source connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 17. A system for defining a physical layout of an integrated circuit as recited in claim 13, wherein the transistor drain connection center vertical position is specified by a fractional multiple of a higher-level metal structure pitch. 18. A system for defining a physical layout of an integrated circuit as recited in claim 12, wherein the physical topology information for one or more transistors includes specification of the transistor width in units of metal-1 pitch. 19. A system for defining a physical layout of an integrated circuit as recited in claim 12, wherein the physical topology information includes specification of a cell height in units of metal-1 tracks. 20. A system for defining a physical layout of an integrated circuit as recited in claim 12, further comprising: a digital technology file including physical dimensions corresponding to a number of variables used for the physical topology information in the digital data file. 21. A system for defining a physical layout of an integrated circuit as recited in claim 20, wherein the layout generator is configured to access the physical dimensions from the digital technology file and substitute the physical dimensions for the number of variables in the physical topology information. 22. A system for defining a physical layout of an integrated circuit as recited in claim 20, wherein the digital technology file is separate from the digital data file, such that adjustment of the physical dimensions within the digital technology file does not require adjustment of the number of variables in the physical topology information in the digital data file.
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