A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passag
A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
대표청구항▼
1. A chemical reactant source vessel comprising; a container body;a lid adapted to engage the container body, the container body and the lid together defining an internal chamber adapted to contain a solid or liquid chemical reactants wherein a width of the lid is greater than an overall height of t
1. A chemical reactant source vessel comprising; a container body;a lid adapted to engage the container body, the container body and the lid together defining an internal chamber adapted to contain a solid or liquid chemical reactants wherein a width of the lid is greater than an overall height of the container body;a first passage extending through the lid, the first passage extending from the internal chamber to outside the container, wherein the lid comprises an inner surface and an outer surface;a second passage extending through the lid, the second passage extending from the internal chamber to outside the container;an outlet valve attached to the outer surface of the lid without any tubing between the outlet valve and the outer surface, thereby conforming a temperature of the outlet valve to that of the lid, the outlet valve adapted to regulate gas flow through the first passage;an inlet valve attached to the outer surface of the lid without any tubing between the inlet valve and the outer surface, thereby conforming a temperature of the inlet valve to that of the lid, the inlet valve adapted to regulate gas flow through the second passage;a serpentine path insert in the internal chamber, wherein the serpentine path insert contacts the lid, thereby defining a serpentine gas flow path,wherein the first and second passages join the serpentine gas flow path at or near opposite ends of the serpentine gas flow path,wherein the serpentine gas flow path is configured for sublimation, vaporization, or sublimation and vaporization of a chemical reactant in the serpentine path at temperatures that facilitates reliability of the inlet valve and outlet valve, andwherein the source vessel is configured to be received in a gas interface assembly positioned such that a heater above said vessel heats said valves and said vessel, andwherein the temperatures of sublimation, vaporization, or sublimation and vaporization and the temperature conformity of the inlet valve, outlet valve, and lid expedite heating of the source vessel and facilitate saturation of the chemical reactant in a carrier gas; anda first filter on the inner surface of the lid, the first filter adapted to prevent particulate matter from flowing through the first passage. 2. The vessel of claim 1, wherein the outlet valve is at least partly integrally formed with the lid. 3. The vessel of claim 1, wherein the inner surface of the lid includes a recess that receives the first filter, the first passage having one end terminating in the recess and another end in fluid communication with the outlet valve, the first filter comprising: a flange having an inner annular wall defining an opening within the flange, the flange being positioned within the recess; anda filter material substantially filling the opening of the flange;wherein gas within the internal chamber cannot flow through the first passage without flowing through the filter material and the opening in the flange. 4. The vessel of claim 3, wherein the filter material comprises a sintered nickel fiber media. 5. The vessel of claim 3, wherein the filter material comprises stainless steel. 6. The vessel of claim 3, wherein the filter material comprises a ceramic. 7. The vessel of claim 6, wherein the filter material comprises alumina. 8. The vessel of claim 3, wherein the filter material comprises quartz. 9. The vessel of claim 1, further comprising a second passage extending through the wall of the container, the second passage extending from the chamber to outside the container;a second valve attached to the wall, the second valve adapted to regulate gas flow through the second passage; anda second filter on the inner surface of the lid, the second filter adapted to prevent particulate matter from flowing from the second passage to the internal chamber. 10. The vessel of claim 9, further comprising: a third passage extending through the lid of the container body, the third passage extending from the internal chamber to outside the container body;a third valve attached to the lid, the third valve adapted to regulate gas flow through the third passage; anda third filter on the inner surface of the lid, the third filter adapted to prevent particulate matter from flowing through the third passage. 11. The chemical reactant source vessel of claim 1, further comprising a heating device beneath a lower surface of the container body. 12. The chemical reactant source vessel of claim 1, further comprising a first roller assembly and a second roller assembly having aligned rollers, wherein the first roller assembly is positioned on a side of the chemical reactant source vessel opposite the second roller assembly. 13. The vessel of claim 1, wherein the serpentine path insert comprises a plurality of stacked trays that collectively define a portion of the serpentine gas flow path. 14. The vessel of claim 1, further comprising a snap ring that biases the first filter against the lid. 15. A vapor phase reactor for vapor processing of substrates, comprising: a vapor phase reaction chamber for processing substrates;a source vessel container comprising a container body and a lid adapted to engage the container body, said container body and lid defining an internal chamber adapted to contain a solid or liquid chemical reactant, wherein a width of the lid is greater than an overall height of the container body;an inlet passage extending through the lid of the container, wherein the lid comprises an inner surface and an outer surface, the inlet passage extending from the internal chamber of the container to outside the container;an inlet valve attached directly to the outer surface of the lid without any intervening tubing, thereby conforming a temperature of the outlet valve to that of the lid, the inlet valve adapted to regulate gas flow through the inlet passage;an outlet passage extending through the lid of the container, the outlet passage extending from the internal chamber of the container to outside the container;an outlet valve attached directly to the outer surface of the lid without any intervening, thereby conforming a temperature of the outlet valve to that of the lid, the outlet valve adapted to regulate gas flow through the outlet passage;an outlet filter on the inner surface of the lid, the outlet filter adapted to prevent particulate matter from flowing through the outlet passage;a serpentine path insert in the internal chamber, wherein the serpentine path insert contacts the lid, thereby defining a serpentine gas flow path, wherein the first and second passages join the serpentine gas flow path at or near opposite ends of the serpentine gas flow path,wherein the serpentine gas flow path is configured for sublimation, vaporization, or sublimation and vaporization of a chemical reactant in the serpentine path at temperatures that facilitates reliability of the inlet valve and outlet valve, andwherein the temperatures of sublimation, vaporization, or sublimation and vaporization and the temperature conformity of the inlet valve, outlet valve, and lid expedite heating of the source vessel and facilitate saturation of the chemical reactant in a carrier gas;a gas interface assembly comprising a heater, said gas interface assembly configured to receive the source vessel container such that the heater is positioned above the source vessel container and heats said valves and said source vessel container; anda gas delivery system configured to deliver reactant gas flow from the outlet valve to the reaction chamber. 16. The reactor of claim 15, further comprising an inlet filter in the lid, the inlet filter adapted to prevent particulate matter from flowing through the inlet passage. 17. The reactor of claim 15, further comprising: a vapor exhaust component downstream of the reaction chamber; anda vent valve passage extending through the lid of the container body, the vent valve passage extending from the internal chamber of the source vessel container to outside the source vessel container;a vent valve attached to the lid, the vent valve adapted to regulate gas flow through the vent valve passage; andone or more conduits configured to deliver gas flow from the vent valve to the exhaust component without flowing through the gas delivery system or the reaction chamber. 18. The reactor of claim 15, wherein the inner surface of the lid includes a recess that receives the outlet filter, the outlet passage having one end terminating in the recess and another end in fluid communication with the outlet valve, the outlet filter comprising: a flange having an inner annular wall defining an opening within the flange, the flange being positioned within the recess; anda filter material substantially filling the opening of the flange;wherein gas within the internal chamber cannot flow through the outlet passage without flowing through the filter material and the opening in the flange. 19. The reactor of claim 15, further comprising a heating device beneath a lower surface of the container body. 20. The reactor of claim 15, wherein the source vessel further comprises a first roller assembly and a second roller assembly having aligned rollers, wherein the first roller assembly is positioned on a side of the chemical reactant source vessel opposite the second roller assembly.
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