초록 ▼

Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body

Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.

대표청구항 ▼

1. A substrate processing apparatus comprising: a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed;a showerhead disposed on an upper portion of the chamber body to close the opened upper side of the chamb

1. A substrate processing apparatus comprising: a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed;a showerhead disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, wherein the showerhead supplies a reaction gas into the inner space; anda chamber lid disposed on an upper portion of the showerhead,wherein the showerhead comprises:a ring-shaped flange contacting a lower surface of the chamber lid and a top surface of the chamber body, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein;a flat plate disposed inside the flange and spaced from the lower surface of the chamber lid, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof; anda sealing member disposed between the chamber lid and the flange, wherein the sealing member is disposed radially inward of the passage. 2. The substrate processing apparatus of claim 1, wherein the showerhead further comprises a passage cover coupled to the flange to close an upper portion of the passage. 3. The substrate processing apparatus of claim 2, wherein the passage cover is welded to the flange. 4. The substrate processing apparatus of claim 1, wherein the passage is disposed inside the chamber body to correspond to the inner space. 5. The substrate processing apparatus of claim 1, wherein a buffer space is defined between the chamber lid and the flat plate. 6. The substrate processing apparatus of claim 5, wherein the chamber lid further comprises a gas supply port communicating with the buffer space to receive the reaction gas from the outside, and the substrate processing apparatus further comprising a block plate having a plurality of diffusion holes and being fixed to the lower portion of the chamber lid to be disposed in the buffer space. 7. The substrate processing apparatus of claim 1, wherein the passage comprises a circulation passage defined along a circumference of the injection hole and inflow and discharge passages respectively connected to both ends of the circulation passage. 8. The substrate processing apparatus of claim 1, wherein the flange has a circular ring shape, and the flange has a thickness greater than that of the flat plate. 9. The substrate processing apparatus of claim 1, wherein the flange has a square ring shape, and the flange has a thickness greater than that of the flat plate. 10. The substrate processing apparatus of claim 1, wherein: the flange, taken from a plan view, includes an inner region surrounded by an inner sidewall of the passage;the flange includes a fixing groove recessed from the top surface of the flange in the inner region; andthe sealing member is disposed on the fixing groove, the sealing member being located to be closer to the center of the showerhead than the inner sidewall of the passage is to the center of the showerhead.