Process for continuous inline production of coated polymeric substrates or laminates
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B32B-007/12
B32B-037/12
C08F-002/48
C08J-007/04
출원번호
US-0126693
(2012-06-15)
등록번호
US-9630387
(2017-04-25)
우선권정보
DE-10 2011 077 612 (2011-06-16)
국제출원번호
PCT/EP2012/061388
(2012-06-15)
§371/§102 date
20131216
(20131216)
국제공개번호
WO2012/172032
(2012-12-20)
발명자
/ 주소
Kanzler, Waldemar
Hasskerl, Thomas
Seyoum, Ghirmay
Kliem, Patrick
Krebs, Werner
Foerster, Dieter
Dannehl, Manfred
출원인 / 주소
Evonik Roehm GmbH
대리인 / 주소
Oblon, McClelland, Maier & Neustadt, L.L.P.
인용정보
피인용 횟수 :
0인용 특허 :
2
초록
The present invention relates to a method for the continuous inline production of coated polymeric substrates or laminates and also to an apparatus for implementing this method.
대표청구항▼
1. A method for continuous inline production of a coated polymeric substrate or laminate, the method comprising:a. contacting a substrate made of a polymeric material with a curable coating material or adhesive;b. lining the coating material or adhesive with an outer film; andc. curing the coating m
1. A method for continuous inline production of a coated polymeric substrate or laminate, the method comprising:a. contacting a substrate made of a polymeric material with a curable coating material or adhesive;b. lining the coating material or adhesive with an outer film; andc. curing the coating material or adhesive,wherein the curing takes place in at least two curing steps, in which a first curing step is a thermal or a radiation curing step, and a subsequent curing step is a radiation curing step,wherein either the first curing step has delayed initiation, in which an incipient dissolution time is at least 10 s, ora spontaneous thermal initiation of curing on first contact between coating material or adhesive takes place, and consequently the first curing step begins,and wherein a monomer mixture of the coating material or adhesive, method conditions, or both,are selected to obtain a mixed phase of coating material or adhesive and dissolved substrate polymer, in which a thickness of the mixed phase is between 90% and 1% of a total layer thickness of an outer layer or adhesive layer. 2. The method according to claim 1, whereinthe coating material or adhesive comprises at least two photoinitiators which are activatable at different wavelengths,the coating material or adhesive comprises a thermally activatable initiator and a photoinitiator,the coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of more than 3 μm,the coating material has a dynamic viscosity in the range from 50 to 10,000 mPa*s at 25° C.the adhesive has a dynamic viscosity preferably in the range from 100 to 20,000 mPa*s at 25° C., or any combination thereof. 3. The method according to claim 2, whereinthe coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of from 5 to 100 μm. 4. The method according to claim 2, whereinthe coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of from 5 to 80 μm. 5. The method according to claim 2, whereinthe coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of from 7 to 70 μm. 6. The method according to claim 2, whereinthe coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of from 10 to 60 μm. 7. The method according to claim 2, whereinthe coating material layer or adhesive layer has a layer thickness, measured 20 cm after a laminator gap, of from 10 to 40 μm. 8. The method according to claim 1, wherein the substrate polymer is selected from the group consisting of a PMMA-based polymer, a polycarbonate-based polymer, a styrene-acrylonitrile-based copolymer, and a polyvinyl chloride-based polymer, andcontact temperatures of the substrate for the respective substrate polymers are from 70 to 100° C., from 80 to 130° C., from 65 to 110° C., and from 60 to 100° C. 9. The method according to claim 8, whereinincipient dissolution time for the respective substrate polymers are from 15 to 240 s, from 15 to 240 s, from 15 to 240 s, and from 15 to 200 s. 10. The method according to claim 9, whereinthe incipient dissolution time is controlled by a conveying speed of the substrate or by a positioning of a 1st radiation source,the conveying speed of the substrate is within the range from 0.1 to 10 m/min, or both. 11. The method according to claim 8, whereinthe substrate in the contacting a) is attained by extrusion of a moulding composition or by a continuous cast polymerization,the substrate, prior to first contact with the coating material or adhesive, is heated by a suitable heating means, to attain the contact temperature,a surface of the substrate, outer film, or both, facing the coating material or adhesive, prior to first contact with the coating material or adhesive is cleaned,either the coating material or adhesive is first applied to the outer film and then brought into communication with the substrate,the coating material or adhesive is first applied to the substrate and then covered with the outer film, orthe coating material or adhesive is first applied both to the substrate and to the outer film and then the two are brought together,after the substrate, coating material and outer film have been brought together for the first time, a resulting composite is compressed in a laminator or between nip rolls,a sacrificial film is an outer film, which is removed after the first curing c) or a further curing d),an inline optical quality control e) is carried out after the first c) or further curing d) ends,depending whether the outer film is removed or a laminate is produced, after the end of the first curing c), the first c) and further curing d), the first curing c) and the quality control e), or the first c) and further curing d) and quality control e), a surface of a resulting product is coated with a removable protective film f),andthe contacting b) to the first curing c), the contacting a) to the further curing d), or the contacting a) to the quality control e) are carried out under clean-room conditions, controlled-climate conditions, or both. 12. The method according to claim 1, whereinwhen a sacrificial film is an outer film, a radiation curing step, takes place through the sacrificial film, the substrate, or both, and a further radiation curing step, takes place after removal of the sacrificial film. 13. The method according to claim 1, comprisingat least two radiation curing steps. 14. The method according to claim 1, whereinthe substrate is at least one thermoplastic polymer selected from the group consisting of polymethyl methacrylate, poly(meth)acrylimide, polyacrylonitrile, polystyrene, polyether, polyester, polycarbonate, polyvinyl chloride, styrene-acrylonitrile copolymer, acrylonitrile-styrene-butadiene copolymer, styrene-maleic acid copolymer, (meth)acrylate-styrene-maleic anhydride copolymer and polymethyl methacrylate copolymer,the substrate has a thickness in the range from 10 μm to 500 mm or both.
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이 특허에 인용된 특허 (2)
Sakashita Takeshi (Iwakuni JPX) Inagaki Hajime (Ohtake JPX) Todo Akira (Iwakuni JPX) Nakano Takayuki (Ohtake JPX), Curable coating composition containing acryloyl or methacryloyl cyanurate or isocyanurate compound, cured composition th.
McDowell John R. (Erie PA) Howard Dennis D. (Erie PA) Pascarella Vincent J. (Erie PA), Radiation curable compositions containing acyloin urethane compounds.
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