초록 ▼

An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mi

An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mixed gas easily and highly accurately and displaying the concentration in real time without using an expensive concentration meter, etc.

대표청구항 ▼

1. A raw material vaporizing and supplying apparatus comprising: a raw material concentration detection mechanism, an automatic pressure regulating device, a mass flow meter, a flow-out passage, a source tank, and a constant temperature unit,wherein the raw material vaporizing and supplying apparatu

1. A raw material vaporizing and supplying apparatus comprising: a raw material concentration detection mechanism, an automatic pressure regulating device, a mass flow meter, a flow-out passage, a source tank, and a constant temperature unit,wherein the raw material vaporizing and supplying apparatus is operably arranged to supply a carrier gas GK into the source tank through a mass flow controller to release the carrier gas GK from inside the source tank and also to supply into a process chamber a mixed gas GS composed of the carrier gas GK and saturated vapor G of a raw material produced by keeping the source tank at a constant temperature with the constant temperature unit;wherein the automatic pressure regulating device and the mass flow meter are installed on the flow-out passage of the mixed gas GS from the source tank, the automatic pressure regulating device is controlled so as to open and close a control valve, thereby controlling an internal pressure P0 of the source tank to a predetermined value,wherein individual detection values of a flow rate Q1 of the carrier gas GK by the mass flow controller, the internal pressure P0 of the tank, and a flow rate QS of the mixed gas Gs by the mass flow meter are input into a raw material concentration arithmetic unit, the raw material concentration arithmetic unit is used to compute a raw material flow rate Q2 based on Q2=(QS×PM0)/P0, and a raw material concentration K of the mixed gas GS supplied to the process chamber is computed and displayed in terms of K=Q2/QS with reference to the raw material flow rate Q2, wherein PM0 is a saturated vapor pressure of raw material vapor G at a temperature of t° C. in the source tank. 2. The raw material vaporizing and supplying apparatus according to claim 1, wherein a storage device of saturated steam pressure data of the raw material in the source tank is installed on the raw material concentration arithmetic unit and also detection signals of the internal pressure P0 of the source tank and a temperature t from the automatic pressure regulating device are input into the raw material concentration arithmetic unit. 3. The raw material vaporizing and supplying apparatus according to claim 1, wherein the raw material concentration detection unit, a flow rate arithmetic and control unit of the mass flow controller, a pressure arithmetic and control unit of the automatic control device and a flow rate arithmetic and control unit of the mass flow meter are arranged so as to be assembled in an integrated manner. 4. The raw material vaporizing and supplying apparatus according to claim 1, wherein the mass flow meter is installed on the downstream side of the automatic pressure regulating device. 5. The raw material vaporizing and supplying apparatus according to claim 1, wherein the mass flow meter is installed on the upstream side of the regulating device. 6. The raw material vaporizing and supplying apparatus according to claim 1, wherein the automatic pressure regulating device is a pressure regulating device which has a temperature detector T, a pressure detector P, a control valve installed on the downstream side from the pressure detector P and a pressure arithmetic and control unit. 7. The raw material vaporizing and supplying apparatus according to claim 6, wherein the mass flow meter is installed between the pressure detector P and the control valve. 8. A raw material vaporizing and supplying apparatus comprising: a raw material concentration detection mechanism, an automatic pressure regulating device, a mass flow meter, a flow-out passage, a source tank, and a constant temperature unit,wherein the raw material vaporizing and supply apparatus is connected to supply a carrier gas GK into a source tank through a mass flow controller to release the carrier gas GK from inside the source tank and also to supply, into a process chamber, a mixed gas GS composed of the carrier gas GK and saturated vapor G of a raw material produced by keeping the source tank at a constant temperature with the constant temperature unit;wherein the automatic pressure regulating device and the mass flow meter are installed on the flow-out passage of the mixed gas GS from the source tank, the automatic pressure regulating device is controlled so as to open and close a control valve, thereby controlling an internal pressure P0 of the source tank to a predetermined value,wherein detection values of a flow rate Q1 of the carrier gas GK by the mass flow controller, the internal pressure P0 of the tank and a flow rate QS of the mixed gas GS from the mass flow meter are input into a raw material concentration arithmetic unit, and the raw material concentration arithmetic unit is used to determine a raw material flow rate Q2 based on Q2=(CF×QS′)−Q1, and a raw material concentration K of the mixed gas GS supplied to the process chamber is computed and displayed in terms of K =Q2/(Q1+Q2) with reference to the raw material flow rate Q2, wherein CF is a conversion factor of the mixed gas Q2. 9. The raw material vaporizing and supplying apparatus according to claim 8, wherein a conversion factor CF of the mixed gas Q2 is 1/CF=C/CFA+(1-C)/CFB wherein, CFA is a conversion factor of the carrier gas GK, CFB is a conversion factor of the raw material gas G and C is a volume ratio of the carrier gas, namely, Q1/(Q1+Q2). 10. The raw material vaporizing and supplying apparatus according to claim 8, wherein the raw material concentration arithmetic unit is provided with a storage device of individual data on conversion factors of the raw material gas G in the source tank and conversion factors of the carrier gas GK. 11. The raw material vaporizing and supplying apparatus according to claim 8, wherein the raw material concentration detection unit, a flow rate arithmetic and control unit of the mass flow controller, a pressure arithmetic and control unit of the automatic control device and a flow rate arithmetic and control unit of the mass flow meter are arranged so as to be assembled in an integrated manner. 12. The raw material vaporizing and supplying apparatus according to claim 8, wherein the mass flow meter is installed on the downstream side of the automatic pressure regulating device. 13. The raw material vaporizing and supplying apparatus according to claim 8, wherein the mass flow meter is installed on the upstream side of the regulating device. 14. The raw material vaporizing and supplying apparatus according to claim 8, wherein the automatic pressure regulating device is a pressure regulating device which has a temperature detector T, a pressure detector P, a control valve installed on the downstream side from the pressure detector P and a pressure arithmetic and control unit. 15. A raw material vaporizing and supplying apparatus, comprising: a source tank for containing source material;a constant temperature unit disposed to keep the source tank at a constant temperature t° C.;a source of carrier gas GK;a mass flow controller disposed to control a flow of carrier gas GK from the source of carrier gas GK into the source tank at a flow rate Q1;an outflow passage disposed to deliver a mixed gas GS, composed of the carrier gas GK and a saturated vapor G of a raw material, from the source tank at a flow rate QS;a raw material concentration detection mechanism;a control valve disposed to control the internal pressure P0 of the source tank;an automatic pressure regulating device disposed and arranged to regulate the internal pressure P0 of the source tank to a predetermined value;a mass flow meter disposed in the outflow passage to measure flow rate Qs of mixed gas GS;a process chamber disposed to receive mixed gas GS composed of the carrier gas GK and the saturated vapor G of the raw material from said outflow passage;a raw material concentration arithmetic unit, configured to receive data and compute (a) a raw material flow rate Q2 based on Q2=(QS×PM0)/P0, wherein PM0 is a saturated vapor pressure of raw material vapor G at a temperature of t° C. in the source tank, and (b) a raw material concentration K of the mixed gas GS supplied to the process chamber of K=Q2/QS with reference to the raw material flow rate Q2. 16. A raw material vaporizing and supplying apparatus, comprising: a source tank for containing source material;a constant temperature unit disposed to keep the source tank at a constant temperature t° C.;a source of carrier gas GK;a mass flow controller disposed to control a flow of carrier gas GK from the source of carrier gas GK into the source tank at a flow rate Q1;an outflow passage disposed to deliver a mixed gas GS, composed of the carrier gas GK and a saturated vapor G of a raw material, from the source tank at a flow rate QS;a raw material concentration detection mechanism;a control valve disposed to control the internal pressure P0 of the source tank;an automatic pressure regulating device disposed and arranged to regulate the internal pressure P0 of the source tank to a predetermined value;a mass flow meter disposed in the outflow passage to measure flow rate QS of mixed gas GS;a process chamber disposed to receive mixed gas Gs composed of the carrier gas GK and the saturated vapor G of the raw material from said outflow passage;a raw material concentration arithmetic unit, configured to receive data and compute (a) a raw material flow rate Q2 based on Q2=(CF×QS′)−Q1, wherein CF is a conversion factor of the mixed gas Q2, and (b) a raw material concentration K of the mixed gas GS supplied to the process chamber based on K=Q2/(Q1+Q2) with reference to the raw material flow rate Q2.