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특허 상세정보

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) H01J-037/30    H01J-037/10    H01J-037/147    B82Y-010/00    B82Y-040/00    H01J-037/09    H01J-037/28    H01J-037/317    H01J-037/14   
출원번호 US-0975314 (2015-12-18)
등록번호 US-9673024 (2017-06-06)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Morris & Kamlay LLP
인용정보 피인용 횟수 : 1  인용 특허 : 49
초록

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the ...

대표
청구항

1. A particle-optical arrangement, comprising: at least one charged-particle source for generating at least one beam of charged particles;at least one multi-aperture plate having a plurality of apertures formed in the multi-aperture plate, wherein the plurality of apertures being arranged in a first pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture aperture plate;a first focusing lens providing a focusing field in a first region between the charged-particle source and t...

이 특허에 인용된 특허 (49)

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